Organic light-emitting diode display and method of manufacturing the same with no cladding process
An organic light-emitting diode (OLED) display and a method of manufacturing an OLED display are disclosed. In one aspect, the method includes forming a data electrode layer and patterning the data electrode layer so as to form a source electrode, a drain electrode, and a pad electrode. The method can also include forming a first organic insulating layer over the source, drain and pad electrodes and forming a via hole corresponding to the source electrode or the drain electrode in the first organic insulating layer via a one tone mask. The method can further include forming an OLED including an anode electrically connected to the source electrode or the drain electrode, an organic emission layer, and a cathode, and etching a first portion of the first organic insulating layer formed over the pad electrode and a second portion of the organic emission layer formed over the pad electrode.
1. A method of manufacturing an organic light-emitting diode (OLED) display, comprising:
forming a data electrode layer;
patterning the data electrode layer so as to form a source electrode, a drain electrode, and a pad electrode;
forming a first organic insulating layer over the source, drain and pad electrodes,
wherein the first organic insulating layer includes a first portion over the pad electrode and a second portion over the source electrode and the drain electrode;
forming a separation region in the first organic insulating layer between the pad electrode, and the source and drain electrodes;
forming a via hole corresponding to the source electrode or the drain electrode in the first organic insulating layer via a one tone mask;
forming an OLED including i) an anode electrically connected to the source electrode or the drain electrode, ii) an organic emission layer and iii) a cathode; and
etching the first portion of the first organic insulating layer formed over the pad electrode and portion of the organic emission layer formed over the pad electrode after forming the OLED and after forming the separation region so that at least a whole of an upper horizontal surface of the pad electrode is exposed and the pad electrode is electrically connected to a driving integrated circuit (IC),
wherein the first portion of the first organic insulating layer is etched such that the height of the first portion of the first organic insulating layer around the pad electrode is less than the height of the pad electrode.
2. The method of claim 1 ,
wherein the forming of the OLED includes:
forming the anode;
forming a second organic insulating layer;
etching a portion of the second organic insulating layer so that the anode is exposed via the etched portion;
forming the organic emission layer over the anode; and
forming the cathode over the organic emission layer and the second organic insulating layer.
3. The method of claim 1 ,
wherein the forming of the via hole includes maintaining the first portion.
4. The method of claim 3 ,
wherein the forming of the OLED includes forming the portion of the organic emission layer over a seal line region and the first portion, and
wherein the seal line region is disposed in the separation region.
5. The method of claim 4 ,
wherein the difference between the height of the first organic insulating layer around the pad electrode and the height of the pad electrode is about 1.5 μm or less.
6. The method of claim 1 ,
wherein the etching includes dry etching.
7. The method of claim 6 ,
wherein the dry etching includes plasma etching.
8. The method of claim 1 , further comprising forming the driving IC over the pad electrode and the first portion.
9. A method of manufacturing an organic light-emitting diode (OLED) display, comprising:
forming source, drain and pad electrodes;
forming a first organic insulating layer over the source, drain and pad electrodes;
forming a separation region in the first organic insulating layer between the pad electrode, and the source and drain electrodes;
forming a via hole corresponding to the source or drain electrode in the first organic insulating layer via a one tone mask;
forming an organic emission layer over the first organic insulating layer, wherein the organic emission layer includes a first portion disposed in the separation region and a second portion formed over the electrode; and
etching a first portion of the first organic insulating layer formed over the pad electrode the first portion of the organic emission layer and the portion of the organic emission layer after forming the organic emission layer so that at least a whole of an upper horizontal surface of the pad electrode is exposed and the pad electrode is electrically connected to a driving IC,
wherein the first organic insulating layer is etched such that the height of the first organic insulating layer around the pad electrode is less than the height of the pad electrode.
10. The method of claim 9 , further comprising:
forming an anode;
forming a second organic insulating layer;
etching a portion of the second organic insulating layer so the anode is exposed via the etched portion;
forming an organic emission layer over the anode; and
forming a cathode over the organic emission layer and the second organic insulating layer.
11. The method of claim 9 ,
wherein the forming of the via hole includes maintaining the first portion.
12. The method of claim 11 ,
wherein the first portion of the organic emission layer is formed over a seal line region disposed in the separation region and the first portion, and
wherein the forming of the OLED includes forming the first portion of the organic emission layer over the seal line region and the first portion.
13. The method of claim 12 ,
wherein the difference between the height of the first organic insulating layer around the pad electrode and the height of the pad electrode is about 1.5 μm or less.