Hollow cathode plasma source
The present invention relates to a hollow cathode plasma source and to methods for surface treating or coating using such a plasma source, comprising first and second electrodes ( 1, 2 ), each electrode comprising an elongated cavity ( 4 ), wherein dimensions for at least one of the following parameters is selected so as to ensure high electron density and/or low amount of sputtering of plasma source cavity surfaces, those parameters being cavity cross section shape, cavity cross section area cavity distance ( 11 ), and outlet nozzle width ( 12 ).
1. A hollow cathode plasma source comprising a first electrode and a second electrode each electrode comprising an elongated cavity,
wherein the electrodes extend substantially parallel to each other,
wherein the first and second electrodes are both provided with a gas inlet for a plasma forming gas and with a gas outlet which leads to an outlet nozzle which is directed towards a substrate,
wherein first and second electrodes are electrically connected to a power source supplying the electrodes with alternatingly opposing voltages, and
wherein the following parameter's dimension are selected
i. the cavity cross section is of rectangular, rounded rectangular or circular shape or of a shape intermediary of these shapes,
ii. the cavity cross section area is comprised between 500 mm 2 and 4000 mm 2 ,
iii. the cavity distance is comprised between 85 mm and 160 mm, and
iv. the outlet nozzle width is comprised between 1 mm and 25 mm.
2. The hollow cathode plasma source according to claim 1 , wherein the cavity cross section shape is circular.
3. The hollow cathode plasma source according to claim 1 , wherein the cavity cross section area is comprised between 500 mm 2 and 1000 mm 2 .
4. The hollow cathode plasma source according to claim 1 , wherein the cavity cross section area is comprised between 1000 mm 2 and 4000 mm 2 .
5. The hollow cathode plasma source according to claim 1 , wherein the cavity cross section area is comprised between 750 mm 2 and 1500 mm 2 .
6. The hollow cathode plasma source according to claim 1 , wherein the cavity distance is comprised between 100 mm and 145 mm.
7. The hollow cathode plasma source according to claim 1 , wherein the outlet nozzle width is comprised between 3.5 mm and 25 mm.