Method of transfer printing and articles manufactured therefrom
Disclosed herein is a method comprising disposing on a first substrate a two-dimensional exfoliatable material; patterning an exfoliatable material using a photoresist in a manner such that a portion of the photoresist remains in contact with the two-dimensional exfoliatable material after the patterning; disposing a polymer layer on the two-dimensional exfoliatable material to form a printing block; contacting a substrate with the printing block; and removing the polymer layer and the photoresist from the printing block to leave behind the patterned exfoliatable material on the substrate.
1. A method comprising:
patterning a two-dimensional exfoliatable material using a first photoresist in a manner such that a portion of the first photoresist remains in contact with the two-dimensional exfoliatable material after the patterning;
patterning the two-dimensional exfoliatable material using a second photoresist in a manner such that a portion of the second photoresist remains in contact with the two-dimensional exfoliatable material after the patterning;
disposing a polymer layer on the two-dimensional exfoliatable material to form a printing block;
contacting a substrate with the printing block; and
removing the polymer layer, the first photoresist and the second photoresist from the printing block to leave behind the patterned exfoliatable material on the substrate.
2. The method of claim 1 , where the two-dimensional exfoliatable material comprises graphene, graphite, molybdenum disulfide, graphite intercalation compounds, clays, black phosphorus, or a combination thereof.
3. The method of claim 1 , where the first photoresist is a polymer that is a thermoplastic polymer or is a crosslinked polymer.
4. The method of claim 3 , where the crosslinked polymer is obtained by crosslinking an acrylate or a silane.
5. The method of claim 3 , where the thermoplastic polymer is a polymethylmethacrylate.
6. The method of claim 1 , where the patterning of the exfoliatable material using a photoresist is accomplished via e-beam lithography and reactive ion etching.
7. The method of claim 1 , where the polymer layer comprises a polyvinylalcohol.
8. The method of claim 1 , where the disposing of the polymer layer on the exfoliatable material to form a printing block is accomplished via spin casting.
9. The method of claim 1 , where the exfoliatable material has a cross-sectional area measured parallel to a substrate of up to 10 6 square micrometers and a thicknesses of at least 5 nanometers.
10. The method of claim 1 , wherein the removing of the polymer layer, the first photoresist and the second photoresist from the printing block are accomplished via dissolution and/or degradation.
11. An article comprising:
a patterned exfoliatable material; wherein the patterned two-dimensional exfoliatable material is obtained by a method comprising:
patterning a two-dimensional exfoliatable material using a first photoresist in a manner such that a portion of the photoresist remains in contact with the two-dimensional exfoliatable material after the patterning;
patterning the two-dimensional exfoliatable material using a second photoresist in a manner such that a portion of the second photoresist remains in contact with the two-dimensional exfoliatable material after the patterning;
disposing a polymer layer on the two-dimensional exfoliatable material to form a printing block;
contacting a substrate with the printing block; and
removing the polymer layer, the first photoresist and the second photoresist from the printing block to leave behind the patterned exfoliatable material on the substrate.