Array substrate assembly, method of manufacturing array substrate assembly, display panel and display apparatus

1. An array substrate assembly, comprising:

a substrate;

a first conducting wire on the substrate;

a first insulating layer on the first conducting wire;

a second conducting wire on the first insulating layer, wherein orthogonal projections of the first conducting wire and the second conducting wire on the substrate at least partly overlap, and the first conducting wire comprises a first conducting segment and a second conducting segment which are arranged discontinuously and which are adjacent to each other;

a second insulating layer on the second conducting wire and an exposed surface of the first insulating layer;

a first via hole and a second via hole which pass through the first insulating layer and the second insulating layer;

a third via hole passing through the second insulating layer and exposing the second conducting wire, wherein an orthogonal projection of the third via hole on the substrate is located within an area where the orthogonal projections of the first conducting wire and the second conducting wire on the substrate overlap;

a fourth via hole passing through the first insulating layer and the second insulating layer and exposing the first conducting segment of the first conducting wire, an orthogonal projection of the first conducting segment on the substrate and the orthogonal projection of the second conducting wire on the substrate overlapping;

a connection part on a surface of the second insulating layer, wherein the connection part electrically connects the first conducting segment and the second conducting segment of the first conducting wire to each other through the first via hole and the second via hole; and

a third conducting wire on the surface of the second insulating layer, wherein the third conducting wire electrically connects the second conducting wire and the first conducting wire to each other through the third via hole and the fourth via hole.

2. The array substrate assembly of claim 1 , wherein:

the second conducting wire is continuous.

3. The array substrate assembly of claim 1 , wherein:

the first conducting wire is located in the same layer as a gate line of the array substrate assembly, and the second conducting wire is located in the same layer as a data line of the array substrate assembly.

4. The array substrate assembly of claim 3 , wherein:

the first conducting wire, the second conducting wire, the third conducting wire, and the connection part are located in a peripheral region of the array substrate assembly.

5. The array substrate assembly of claim 4 , wherein:

the first conducting wire is formed of a chromium, a chromium alloy material, a molybdenum tantalum alloy, an aluminum, or an aluminum alloy material,

the second conducting wire is formed of a chromium, an aluminum, or an aluminum alloy material,

the third conducting wire is formed of an indium tin oxide,

the connection part is formed of an indium tin oxide,

the first insulating layer is formed of a silicon oxide, a silicon nitride, or an aluminum oxide, and

the second insulating layer is formed of a silicon nitride.

6. A method of manufacturing the array substrate assembly of claim 1 , the method comprising:

forming the first conducting wire on the substrate;

forming the first insulating layer on the first conducting wire;

forming the second conducting wire on the first insulating layer;

forming the second insulating layer on the second conducting wire and the exposed surface of the first insulating layer;

forming the first via hole and the second via hole which pass through the first insulating layer and the second insulating layer, wherein the first via hole and the second via hole expose the first conducting segment and the second conducting segment of the first conducting wire, respectively;

forming the third via hole and the fourth via hole;

forming a conducting layer on the surface of the second insulating layer and in the first via hole, the second via hole, the third via hole and the fourth via hole; and

patterning the conducting layer to form the connection part and the third conducting wire.

7. The method of claim 6 , wherein:

the second conducting wire is formed to be continuous.

8. The method of claim 6 , wherein:

the first conducting wire and a gate line of the array substrate assembly are formed in the same layer, and the second conducting wire and a data line of the array substrate assembly are formed in the same layer.

9. The method of claim 8 , wherein:

the first conducting wire, the second conducting wire, the third conducting wire, and the connection part are formed in a peripheral region of the array substrate assembly.

10. The method of claim 9 , wherein:

the first conducting wire is formed of a chromium, a chromium alloy material, a molybdenum tantalum alloy, an aluminum, or an aluminum alloy material,

the second conducting wire is formed of a chromium, an aluminum, or an aluminum alloy material,

the third conducting wire is formed of an indium tin oxide,

the connection part is formed of an indium tin oxide,

the first insulating layer is formed of a silicon oxide, a silicon nitride, or an aluminum oxide, and

the second insulating layer is formed of a silicon nitride.

11. A display panel comprising:

the array substrate assembly according to claim 1 .

12. A display apparatus comprising:

the display panel according to claim 11 .

13. The array substrate assembly of claim 1 , wherein:

the first conducting wire and the second conducting wire cross each other.

14. The array substrate assembly of claim 1 , wherein:

the first conducting segment and the second conducting segment of the first conducting wire, and the connection part extend in the same direction.