Organic light-emitting display apparatus and method of manufacturing the same
Provided are an organic light-emitting display apparatus and a method of manufacturing the same. The organic light-emitting display apparatus includes: a substrate on which a display area is defined, wherein an image is displayed on the display area; a thin film transistor arranged on the display area of the substrate; a via-insulating layer covering the thin film transistor; a pixel electrode arranged on the via-insulating layer and electrically connected to the thin film transistor; a pixel-defining layer including an opening exposing a central portion of the pixel electrode, and covering an edge of the pixel electrode; a counter electrode facing the pixel electrode; an organic emission layer arranged between the pixel electrode and the counter electrode; a wire arranged on the via-insulating layer to be spaced apart from the pixel electrode and including a spacer area and a non-spacer area; and a spacer arranged on the spacer area.
1. A method of manufacturing an organic light-emitting display apparatus, the method comprising:
providing a substrate on which a display area is defined, wherein the display area is configured to display an image;
forming a thin film transistor on the display area of the substrate;
forming a via-insulating layer covering the thin film transistor;
forming a conductive material on the via-insulating layer;
forming a second insulating material on the conductive material;
exposing the conductive material by irradiating light onto the second insulating material and removing a portion of the second insulating material;
forming a pixel electrode and a wire that is spaced apart from the pixel electrode by etching an exposed portion of the conductive material;
forming a pixel-defining layer covering an edge area of the pixel electrode, and a spacer covering the wire, by reflowing the second insulating material;
forming an organic emission layer on the pixel electrode; and
forming a counter electrode on the organic emission layer;
wherein a height between the via-insulating layer and a top of the spacer is greater than a height between the via-insulating layer and a top of the pixel defining layer.
2. The method of claim 1 , wherein the wire comprises a spacer area on which the spacer is formed, and a non-spacer area, and the wire in the spacer area has a greater width than the wire in the non-spacer area.
3. The method of claim 1 , wherein the wire comprise a contact hole, and the contact hole is spaced apart from the spacer area.
4. The method of claim 1 , further comprising:
forming a wire-protection layer completely covering the non-spacer area of the wire and patterned to correspond to the non-spacer area.
5. The method of claim 1 , further comprising:
irradiating light onto the second insulating material,
wherein the irradiating light onto the second insulating material comprises irradiating light onto the second insulating material by using a half-tone mask comprising a transmissive portion, a semi-transmissive portion, and a light shielding portion.
6. The method of claim 1 , further comprising, after forming the counter electrode, forming a thin film encapsulation layer comprising at least one inorganic layer and at least one organic layer.