Organic light emitting diode substrate, method for manufacturing the same, and display panel

1. An organic light emitting diode substrate, comprising:

a base substrate;

a pixel defining layer on the base substrate; and

an anode, an organic light emitting diode functional layer and a cathode in a pixel region,

wherein the pixel defining layer comprises a first pixel defining layer, an auxiliary cathode and a second pixel defining layer sequentially stacked, the auxiliary cathode being connected to the cathode, and

wherein the anode and the auxiliary cathode are formed in one same process.

2. The organic light emitting diode substrate according to claim 1 , wherein a thickness of the cathode is less than a thickness of the auxiliary cathode.

3. The organic light emitting diode substrate according to claim 1 , wherein the cathode has a thickness of 6 to 10 nm.

4. The organic light emitting diode substrate according to claim 1 , wherein the auxiliary cathode comprises a first transparent electrically conductive layer, a metal layer, and a second transparent electrically conductive layer sequentially stacked.

5. The organic light emitting diode substrate according to claim 4 , wherein the first transparent electrically conductive layer has a thickness of 5 to 20 nm, the metal layer has a thickness of 130 to 170 nm, and the second transparent electrically conductive layer has a thickness of 5 to 20 nm.

6. The organic light emitting diode substrate according to claim 4 , wherein the organic light emitting diode functional layer comprises a red organic light emitting diode functional layer having a thickness of d R , a green organic light emitting diode functional layer having a thickness of d G , and a blue organic light emitting diode functional layer having a thickness of d B , and d B >d P1 -d A1 -d A2 -d A3 -d Y ; d R <d P1 ; d R >d G >d B ,

where d P1 is a thickness of the first pixel defining layer, d A1 is a thickness of the first transparent electrically conductive layer, d A2 is a thickness of the metal layer, d A3 is a thickness of the second transparent electrically conductive layer, and d Y is a thickness of the cathode.

7. The organic light emitting diode substrate according to claim 1 , wherein the auxiliary cathode is formed from a transparent electrically conductive layer.

8. The organic light emitting diode substrate according to claim 7 , wherein the transparent electrically conductive layer has a thickness of 160 to 170 nm.

9. The organic light emitting diode substrate according to claim 7 , wherein the organic light emitting diode functional layer comprises a red organic light emitting diode functional layer having a thickness of d R , a green organic light emitting diode functional layer having a thickness of d G , and a blue organic light emitting diode functional layer having a thickness of d B , and d B >d P1 -d Z -d Y ; d R <d P1 ; d R >d G >d B ,

where d P1 is a thickness of the first pixel defining layer, d Z is a thickness of the transparent electrically conductive layer, and d Y is a thickness of the cathode.

10. The organic light emitting diode substrate according to claim 1 , wherein the first pixel defining layer has a thickness of 300 to 350 nm, and a slope angle of an edge of the first pixel defining layer and a slope angle of an edge of the second pixel defining layer are 85° to 90°.

11. A display panel, comprising the organic light emitting diode substrate according to claim 1 .

12. A method for manufacturing an organic light emitting diode substrate, comprising:

forming a first pixel defining layer on a base substrate;

forming an auxiliary cathode on the first pixel defining layer and forming an anode in a pixel region defined by the first pixel defining layer;

forming a second pixel defining layer on the auxiliary cathode; and

forming an organic light emitting diode functional layer and a cathode on the anode, the cathode being connected to the auxiliary cathode,

wherein the anode and the auxiliary cathode are formed by one same process.

13. The method according to claim 12 , wherein the formed cathode has a thickness less than a thickness of the auxiliary cathode.

14. The method according to claim 12 , wherein forming the first pixel defining layer on the base substrate comprises: depositing a pixel defining film on the base substrate; and exposing, developing and etching the pixel defining film to form the first pixel defining layer, and

wherein the first pixel defining layer has a thickness of 300 nm to 350 nm, and an edge of the first pixel defining layer has a slope angle of 85° to 90°.

15. The method according to claim 12 , wherein forming the auxiliary cathode on the first pixel defining layer and forming the anode in the pixel region defined by the first pixel defining layer comprises:

depositing a first transparent electrically conductive layer, a metal layer, and a second transparent electrically conductive layer sequentially on the first pixel defining layer and the pixel region defined by the first pixel defining layer to form the auxiliary cathode on the first pixel defining layer and the anode in the pixel region defined by the first pixel defining layer.

16. The method according to claim 15 , wherein forming the organic light emitting diode functional layer and the cathode on the anode comprises:

forming a red organic light emitting diode functional layer having a thickness of d R , a green organic light emitting diode functional layer having a thickness of d G , and a blue organic light emitting diode functional layer having a thickness of d B respectively on the anode in different pixel regions, and d B >d P1 -d A1 -d A2 -d A3 -d Y ; d R <d P1 ; d R >d G >d B ,

where d P1 is a thickness of the first pixel defining layer, d A1 is a thickness of the first transparent electrically conductive layer, d A2 is a thickness of the metal layer, d A3 is a thickness of the second transparent electrically conductive layer, and d Y is a thickness of the cathode.

17. The method according to claim 12 , wherein forming the auxiliary cathode on the first pixel defining layer and forming the anode in the pixel region defined by the first pixel defining layer comprises:

depositing a transparent electrically conductive layer on the first pixel defining layer and the pixel region defined by the first pixel defining layer to form the auxiliary cathode on the first pixel defining layer and the anode in the pixel region defined by the first pixel defining layer.

18. The method according to claim 17 , wherein forming the organic light emitting diode functional layer and the cathode on the anode comprises:

forming a red organic light emitting diode functional layer having a thickness of d R , a green organic light emitting diode functional layer having a thickness of d G , and a blue organic light emitting diode functional layer having a thickness of d B respectively on the anode in different pixel regions, and d B >d P1 -d Z -d Y ; d R <d P1 ; d R >d G >d B ,

where d P1 is a thickness of the first pixel defining layer, d Z is a thickness of the transparent electrically conductive layer, and d Y is a thickness of the cathode.