IP Library › Granted Patent US 10,618,622
Granted Patent B2
US 10,618,622 · App. 15/555,443 · Granted Apr 14, 2020

Pollutant reduction device and method

Inventors: Seung Jae Lee (Gyeongsangnam-do, KR); Hee Jun Park (Gyeongsangnam-do, KR); Gun IL Park (Gyeongsangnam-do, KR); Jae Woong Choi (Gyeongsangnam-do, KR)
Assignee: SAMSUNG HEAVY INDUSTRIES CO., LTD.
B63H21/32B01D53/60B63J4/00C02F1/008C02F1/66F01N3/04F01N3/08F01N3/085F01N3/0842B01D2251/102B01D2251/108B01D2252/1035B01D2258/012B01D2259/4566B01D2259/818B63J4/002C02F1/001C02F1/32C02F1/38C02F1/4674C02F1/686C02F1/70C02F1/722C02F1/76C02F1/78C02F2001/007C02F2103/008C02F2103/18C02F2201/001C02F2201/005C02F2201/46115C02F2201/782C02F2209/003C02F2209/005C02F2209/06C02F2209/40C02F2301/043C02F2301/046C02F2303/04C02F2303/18C02F2307/14F01N3/0814
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Quick Facts
Patent No.
US 10,618,622
App. No.
15/555,443
Granted
Apr 14, 2020
Kind
B2
Abstract

A pollutant reduction device and method are provided. The pollutant reduction device comprises: an exhaust gas pipe for discharging exhaust gas of a combustion engine; a cleaning water supply pipe for supplying cleaning water; a scrubber for spraying the cleaning water, which is supplied through the cleaning water supply pipe, at the exhaust gas flowing in through the exhaust gas pipe; and a cleaning water discharge pipe for discharging the cleaning water inside the scrubber and supplying the same to a ballast water tank.

Claims (23)

1. A pollutant reduction device comprising:

an exhaust gas pipe which discharges exhaust gas of a combustion engine;

a cleaning water supply pipe which supplies cleaning water;

a scrubber which sprays the cleaning water supplied through the cleaning water supply pipe to the exhaust gas introduced through the exhaust gas pipe; and

a cleaning water discharge pipe which discharges the cleaning water inside the scrubber and supplies the cleaning water to a ballast water tank.

2. The device of claim 1 , wherein a pH value of the cleaning water flowing in the cleaning water discharge pipe is lower than that of the cleaning water flowing in the cleaning water supply pipe.

3. The device of claim 1 , further comprising a purification unit which is connected to the exhaust gas pipe or the scrubber to oxidize nitrogen-based oxides, neutralize acidified cleaning water, or kill microorganisms present in cleaning water.

4. The device of claim 3 , further comprising a seawater supply pipe which receives seawater from the outside and supplies ballast water to the ballast water tank, wherein the cleaning water supply pipe branches from the seawater supply pipe.

5. The device of claim 4 , further comprising:

a control valve which controls the amount of seawater introduced to the scrubber through the cleaning water supply pipe; and

a control unit which controls the control valve according to the concentration or the degree of contamination of the exhaust gas or the pH value of the cleaning water that passes through the scrubber.

6. The device of claim 5 , wherein the concentration or the degree of contamination of the exhaust gas is determined based on the amount of at least one of sulfur oxides and nitrogen oxides in the exhaust gas.

7. The device of claim 5 , wherein the control valve comprises a three-way valve which connects the seawater supply pipe and the cleaning water supply pipe and adjusts the amount or proportion of seawater supplied to the cleaning water supply pipe.

8. The device of claim 1 , further comprising a circulation pipe which connects the cleaning water discharge pipe and the cleaning water supply pipe, wherein the cleaning water discharged through the cleaning water discharge pipe is recirculated to the cleaning water supply pipe through the circulation pipe.

9. The device of claim 8 , further comprising:

a recirculation tank which is disposed between the cleaning water discharge pipe and the circulation pipe;

a filter unit which is connected to the recirculation tank and separates sold-phase particles from the discharged cleaning water; and

a sludge tank which is connected to the filter unit and in which the solid-phase particles filtered out by the filter unit are collected.

10. The device of claim 3 , wherein the purification unit is connected to the exhaust gas pipe, the seawater supply pipe or the scrubber to supply an oxidizing agent for oxidizing nitrogen-based oxides, a neutralizing agent for neutralizing acidified cleaning water, or a sterilizing agent for killing microorganisms present in seawater by electrolyzing seawater.

11. The device of claim 10 , wherein the oxidizing agent is sodium hypochlorite or hypochlorous acid produced by the electrolysis of the seawater, the sterilizing agent is sodium hypochlorite or hypochlorous acid produced by the electrolysis of the seawater or nitric acid and sulfuric acid produced by the reaction of the sodium hypochlorite or the hypochlorous acid with the exhaust gas and the seawater, and the neutralizing agent is sodium hypochlorite produced by the electrolysis of the seawater or a diluted solution of the sodium hypochlorite.

12. The device of claim 1 , further comprising a plasma purification unit which is connected to the exhaust gas pipe, performs pulse corona discharge to oxide the exhaust gas, and generates ozone and oxidative radicals to sterilize the cleaning water.

13. The device of claim 12 , wherein the plasma purification unit comprises a reaction module comprising a first electrode which is shaped like a container or a pair of plates disposed parallel to each other and second electrodes which are shaped like wires, arranged at intervals inside the first electrode or between the plates of the first electrode, and extend in a direction perpendicular to a direction of flow of the exhaust gas.

14. The device of claim 12 , further comprising a neutralizing agent supply unit which supplies a neutralizing agent to the scrubber or a rear part of a mixing pipe.

Assignments (2)
CORRECTIVE ASSIGNMENT TO CORRECT THE ASSIGNEE ADDRESS PREVIOUSLY RECORDED AT REEL: 043475 FRAME: 0141. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT . Recorded Sep 11, 2017
From: LEE, SEUNG JAE; PARK, HEE JUN; PARK, GUN IL; CHOI, JAE WOONG
To: SAMSUNG HEAVY INDUSTRIES CO., LTD.
Reel/Frame 043811/0310 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 1, 2017
From: LEE, SEUNG JAE; PARK, HEE JUN; PARK, GUN IL; CHOI, JAE WOONG
To: SAMSUNG HEAVY INDUSTRIES CO., LTD.
Reel/Frame 043475/0141 →
Priority Claims (6)
KR 10-2015-0030232 · Mar 4, 2015 · national
KR 10-2015-0107367 · Jul 29, 2015 · national
KR 10-2015-0123160 · Aug 31, 2015 · national
KR 10-2015-0128595 · Sep 10, 2015 · national
KR 10-2015-0128602 · Sep 10, 2015 · national
KR 10-2015-0129290 · Sep 11, 2015 · national
Continuity (1)
Related Publication 20180037308A1 · Feb 8, 2018