Memory cell structure of a three-dimensional memory device
Various embodiments disclose a 3D memory device, including a substrate; a plurality of conductor layers disposed on the substrate; a plurality of NAND strings disposed on the substrate; and a plurality of slit structures disposed on the substrate. The plurality of NAND strings can be arranged perpendicular to the substrate and in a hexagonal lattice orientation including a plurality of hexagons, and each hexagon including three pairs of sides with a first pair perpendicular to a first direction and parallel to a second direction. The second direction is perpendicular to the first direction. The plurality of slit structures can extend in the first direction.
1. A three-dimensional (3D) memory device, comprising:
a substrate;
a plurality of conductor layers disposed on the substrate;
a plurality of NAND strings disposed on the substrate; and
a plurality of slit structures disposed on the substrate, wherein
the plurality of NAND strings are arranged perpendicular to the substrate and in a hexagonal lattice orientation comprising a plurality of hexagons,
each hexagon comprising three pairs of sides, wherein a first pair is perpendicular to a first direction and parallel to a second direction, and wherein the second direction is perpendicular to the first direction, and
the plurality of slit structures extend in the first direction.
2. The 3D memory device of claim 1 , wherein the plurality of slit structures comprises a plurality of gate line slits, wherein the gate line slits are parallel to a second and a third pair of sides of each hexagon of the hexagonal lattice, forming a zigzag pattern extending in the first direction.
3. The 3D memory device of claim 1 , wherein
the plurality of NAND strings intersect with each conductor layer of the plurality of conductor layers forming a plurality of intersections, and the plurality of intersections form a hexagonal lattice; and
the slit structure is parallel to the second and the third pair of sides of each hexagon of the hexagonal lattice, forming a zigzag pattern extending in the first direction.
4. The 3D memory device of claim 1 , wherein the slit structures further comprise a plurality of through holes.
5. The 3D memory device of claim 4 , wherein the conductor layer comprises tungsten.
6. The 3D memory device of claim 1 , further comprising a top select gate, wherein the top select gate is parallel to the slit structures and forms a zigzag pattern extending in the first direction.
7. The 3D memory device of claim 1 , further comprising a 3D memory drive circuit on the substrate configured to supplying a voltage source to the 3D memory device.
8. The 3D memory device of claim 1 , further comprising a plurality of bit lines, wherein the plurality of bit lines form a 30-degree angle with respect to the second direction.
9. The 3D memory device of claim 8 , further comprising a plurality of bit line contacts, wherein;
a spacing between two neighboring bit lines is D nm,
a spacing between two neighboring bit line contacts is about 1.15*D nm, and
D is between about 10 nm and about 60 nm.