Semiconductor device and manufacturing method thereof

1. A semiconductor device comprising:

a stack structure;

a first source connection structure penetrating the stack structure;

a second source connection structure adjacent to the first source connection structure and penetrating the stack structure;

a third source connection structure adjacent to the first source connection structure and penetrating the stack structure;

n first channel rows located between the first source connection structure and the second source connection structure, the n first channel rows including channel patterns; and

n+k second channel rows located between the first source connection structure and the third source connection structure, at least one channel row among the n+k second channel rows including dummy channel patterns,

wherein the n and k are integers.

2. The semiconductor device of claim 1 , wherein n channel rows among the second channel rows include channel patterns, and k channel rows among the second channel rows include dummy channel patterns.

3. The semiconductor device of claim 2 , wherein, in an erase operation, an erase bias is applied through the dummy channel patterns.

4. The semiconductor device of claim 2 , further comprising:

first pads located over the channel patterns, the first pads including an impurity of a first type; and

second pads located over the dummy channel patterns, the second pads including an impurity of a second type different from the first type.

5. The semiconductor device of claim 1 , further comprising connection patterns located under the stack structure, the connection patterns coupling the first and second channel rows and the first to third source connection structures.

6. The semiconductor device of claim 5 , wherein each of the first to third source connection structures includes:

a first conductive pattern connected to the connection pattern; and

a second conductive pattern connected to the first conductive pattern, the second conductive pattern having a resistance lower than that of the first conductive pattern.

7. The semiconductor device of claim 6 , wherein the first conductive pattern includes poly-silicon, and the second conductive pattern includes a metal.

8. The semiconductor device of claim 1 , wherein the stack structure includes:

at least one first select line;

a plurality of word lines formed over the at least one first select line;

at least one second select line formed over the plurality of word lines; and

separation insulating patterns penetrating the at least one select line, the separation insulating patterns overlapping with the channel row including dummy channel patterns.

9. The semiconductor device of claim 8 , wherein the first select lines have a width narrower than that of the word lines.

10. The semiconductor device of claim 1 , wherein the semiconductor device includes a plurality of memory blocks, and a first memory block and a second memory block among the plurality of memory blocks include different numbers of channel rows.

11. The semiconductor device of claim 10 , wherein the first memory block includes n first channel rows and n second channel rows, and the second memory block includes n first channel rows and n+k second channel rows.

12. A semiconductor device comprising:

a first memory block including a first stack structure, first source connection structures adjacent to each other and first channel rows between the first source connection structures and penetrating the first stack structure; and

a second memory block including a second stack structure, second source connection structures adjacent to each other and second channel rows between the second source connection structures and penetrating the second stack structure,

wherein a number of the first channel rows is different from that of the second channel rows.

13. The semiconductor device of claim 12 , wherein the first channel rows include channel patterns, and at least one channel row among the second channel rows includes dummy channel patterns.

14. The semiconductor device of claim 13 , further comprising:

first pads located over the channel patterns, the first pads including an impurity of a first type; and

second pads located over the dummy channel patterns, the second pads including an impurity of a second type different from the first type.

15. A semiconductor device comprising:

a stack structure;

a first source connection structure penetrating the stack structure;

a second source connection structure adjacent to the first source connection structure and penetrating the stack structure;

a third source connection structure adjacent to the first source connection structure and penetrating the stack structure;

first channel rows formed in the stack structure and between the first source connection structure and the second source connection structure, the first channel rows including channel patterns; and

second channel rows formed in the stack structure and between the first source connection structure and the third source connection structure, the second channel rows including dummy channel patterns,

wherein a number of first channel rows is less than a number of second channel rows.