Polymer containing antimicrobial hard surface cleaning compositions
The need for a fast acting and broad spectrum antimicrobial composition which does not reduce surface shine and does not leave visible residues on the surface, while also providing greater residuality of the actives can be met by formulating antimicrobial compositions as described herein.
1. An antimicrobial hard surface cleaning composition comprising:
a. from about 0.03% to about 10%, by weight of the composition, of a detersive surfactant;
b. from about 0.05% to about 8%, by weight of the composition, of an antimicrobial agent;
c. from about 0.1% to about 2.0%, by weight of the composition, of an amide of formula I:
R 1 —CO—NR 2 R 3 (I)
wherein R 1 is selected from the group consisting of linear or branched, substituted or unsubstituted C 6 -C 12 , each of R 2 and R 3 is independently selected from H, OH, a halogen, or C 1 -C 6 linear or branched, substituted or unsubstituted hydrocarbyl groups;
d. from about 0.2% to about 2.0%, by weight of the total composition, of a surface modification polymer, wherein the surface modification polymer is selected from the group consisting of: hydrophobically modified cationic polymer; oxazoline homopolymer; oxazoline copolymer; vinylpyrrolidone homopolymer (PVP); polyethyleneglycol dimethylether (DM-PEG); a vinylpyrrolidone/dialkylaminoalkyl acrylate or methacrylate copolymers; a polystyrenesulphonate polymer (PSS); a poly vinyl pyridine-N-oxide (PVNO); a polyvinylpyrrolidone/vinylimidazole copolymer (PVP-VI); a polyvinylpyrrolidone/polyacrylic acid copolymer (PVP-AA); a polyvinylpyrrolidone/vinylacetate copolymer (PVP-VA); a polyacrylic polymer or polyacrylicmaleic copolymer; and a polyacrylic or polyacrylic maleic phosphono end group copolymer; and mixtures thereof;
e. water; and
said composition has a pH from about 1.0 to about 6.0, wherein the antimicrobial agent is hydrogen peroxide.
2. The composition according to claim 1 , wherein the surface modification polymer is a hydrophobically modified cationic polymer comprising:
(a) from about 5 to about 99.9 wt % of at least one non-ionic hydrophilic monomer;
(b) from about 0.1 to about 30 wt % of at least one non-ionic monomer having at least one pendant C 8-30 alkyl group;
(c) from about 0 to about 50 wt %, cationic monomer comprising a primary, secondary, tertiary or quaternary ammonium group; and
(d) from about 0 to about 99 wt % of an ethylenically unsaturated anionic monomer.
3. The composition according to claim 2 , wherein the surface modification polymer has the formula:
wherein:
n, m, p, and s are the mole percent of the respective monomers, such that:
n is from about 80 to about 99.5;
m is from about 0 to about 10;
p is from about 0.25 to about 20;
s is from about 0 to about 10;
m+s is at least about 0.01;
with the proviso that the sum of the mole percentages add up to 100%;
R 1 , R 2 , R 3 , and R 4 are independently H or CH 3 ;
R 5 is an alkyl group from C7 to C21;
R 6 , R 7 , R 8 , are independently selected from the group consisting of:
hydrogen and C1 to C4 alkyl;
Y is independently O or NH;
Z is silicone or a derivative thereof;
k is independently from 1 to 18;
X − is an anion.
4. The composition according to claim 1 , wherein the amide of formula I is selected from the group consisting of N,N-dimethyl octanamide, N,N-dimethyl decanamide, N,N-dimethyl 9-decenamide, N,N-dimethyl 7-octenamide, octanohydroxamic acid, and mixtures thereof.
5. The composition according to claim 1 , wherein the detersive surfactant comprises from 6 to 12 carbon atoms in the primary carbon chain.
6. The composition according to claim 1 , wherein the composition further comprises amine oxide surfactant at a level of from about 0.01% to about 9.5% by weight of the composition.
7. The composition according to claim 6 , wherein the composition further comprises amine oxide surfactant at a level of from about 0.01% to about 2.0% by weight of the composition.
8. The composition according to claim 1 , wherein the composition further comprises an acidifying agent selected from the group consisting of: organic acid, inorganic acid, and mixtures thereof.
9. A method for cleaning a hard surface, comprising the steps of:
a. optionally diluting the hard surface cleaning composition according to claim 1 ;
b. applying the hard surface cleaning composition according to claim 1 or the diluted hard surface cleaning composition obtained from step a. to a hard surface;
c. leaving the hard surface to dry without rinsing the surface.