Semiconductor memory device

1. A semiconductor memory device comprising:

a first interconnect layer provided above a semiconductor substrate;

a first insulating layer and a second interconnect layer stacked in order on the first interconnect layer; and

a memory pillar penetrating the first insulating layer and the second interconnect layer so that a bottom surface of the memory pillar reaches an inner portion of the first interconnect layer, and including a second insulating layer, a charge storage layer, and a third insulating layer, which are stacked on a part of a side surface including an area in contact with the second interconnect layer and on the bottom surface of the memory pillar, and a first silicide layer in contact with the first interconnect layer, a semiconductor layer, and a second silicide layer, which are stacked in order along a first direction perpendicular to the semiconductor substrate,

wherein, in the first direction, a height position of a bottom surface of the first silicide layer is lower than a top surface of the first interconnect layer, and a height position of a top surface of the first silicide layer is higher than a bottom surface of the second interconnect layer.

2. The semiconductor memory device according to claim 1 , wherein the first and second silicide layers are nickel disilicide (NiSi 2 ).

3. The semiconductor memory device according to claim 1 , wherein the semiconductor layer is a monocrystal silicon.

4. The semiconductor memory device according to claim 1 , further comprising a third interconnect layer provided above the second interconnect layer and penetrated by the memory pillar,

wherein, in the first direction, a height position of a top surface of the second silicide layer is higher than a top surface of the third interconnect layer, and a height position of a bottom surface of the second silicide layer is lower than the top surface of the third interconnect layer.

5. The semiconductor memory device according to claim 1 , wherein the first interconnect layer includes a silicon layer including an impurity and in contact with the first silicide layer.

6. The semiconductor memory device according to claim 5 , wherein the impurity is phosphorus or arsenic.

7. The semiconductor memory device according to claim 1 , wherein the first interconnect layer includes:

a first silicon layer including a first impurity;

a third silicide layer provided on the first silicon layer;

a second silicon layer including a second impurity, provided on the third silicide layer, and in contact with the first silicide layer; and

a fourth silicide layer provided on the second silicon layer.

8. The semiconductor memory device according to claim 7 , wherein the third and fourth silicide layers are NiSi 2 .

9. The semiconductor memory device according to claim 7 , wherein the first and second impurities are phosphorus or arsenic.

10. The semiconductor memory device according to claim 1 , wherein the first interconnect layer includes a metal material.

11. The semiconductor memory device according to claim 1 , wherein, in the first direction, the height position of the top surface of the first silicide layer is lower than a top surface of the second interconnect layer.

12. The semiconductor memory device according to claim 1 , further comprising:

a fourth insulating layer provided on the second interconnect layer; and

a third interconnect layer provided on the fourth insulating layer and penetrated by the memory pillar,

wherein, in the first direction, the height position of the top surface of the first silicide layer is higher than the top surface of the second interconnect layer, and is lower than a bottom surface of the third interconnect layer.

13. The semiconductor memory device according to claim 1 , further comprising a plurality of third interconnect layers separated and stacked above the second interconnect layer in the first direction and penetrated by the memory pillar.

14. The semiconductor memory device according to claim 13 , wherein the plurality of third interconnect layers are in contact with the second insulating layer.

15. The semiconductor memory device according to claim 1 , wherein the memory pillar is such that a part of the second insulating layer, charge storage layer, and the third insulating layer provided on a side surface of the memory pillar is removed in the inner portion of the first interconnect layer.

16. The semiconductor memory device according to claim 1 , wherein the memory pillar includes a first memory pillar including the first silicide layer and a second memory pillar including the second silicide layer, which are stacked along the first direction.

17. The semiconductor memory device according to claim 1 , further comprising:

a source line driver to which the first interconnect layer is coupled; and

a row decoder to which the second interconnect layer is coupled.

18. The semiconductor memory device according to claim 17 , wherein, in an erase operation, the source line driver applies a first voltage to the first interconnect layer in a first period, and applies a second voltage lower than the first voltage to the first interconnect layer in a second period after the first period, and the row decoder applies a third voltage lower than the first voltage and higher than the second voltage to the second interconnect layer in the first period, and applies the second voltage to the second interconnect layer in the second period.

19. The semiconductor memory device according to claim 1 is a NAND flash memory.