Support pin and film deposition device

1. A support pin disposed in a reaction chamber of a film deposition device forming a film on a substrate, comprising:

a head supporting the substrate;

a support cylinder supporting the head; and

a coupling member connecting the head and the support cylinder, wherein

the support cylinder is provided with

(i) a pair of grooves symmetrical with respect to an axis of the support cylinder, the grooves extending from an edge of the support cylinder along the axis of the support cylinder, and

(ii) a pair of first through-holes symmetrical with respect to the axis of the support cylinder,

the pair of grooves and the pair of first through-holes are alternately provided around the axis of the support cylinder,

the head comprises

(i) a placing part on which the substrate is placed, and

(ii) an insertion part protruding from the placing part along the axis of the support cylinder and engaged with the support cylinder,

the insertion part has

(i) a pair of first portions that are received by end portions of the pair of grooves, and

(ii) a second portion that is located inside the support cylinder and is continuous with the pair of first portions,

the second portion is provided with a second through-hole,

the coupling member passes through the support cylinder and the insertion part via the pair of first through-holes and the second through-hole, and

with respect to the cross section perpendicular to the axis of the support cylinder around the second through-hole, outer surfaces of the pair of first portions of the insertion part are located radially outward with respect to an inner surface of the support cylinder and a dimension between the outer surfaces of the pair of first portions of the insertion part is longer than a dimension of the insertion part in a direction in which the coupling member passes through the support cylinder and the insertion part.

2. The support pin according to claim 1 , wherein

with respect to a cross section perpendicular to the axis of the support cylinder, a shape and a size of the second portion is substantially the same as those of inside of the support cylinder, and

the pair of first portions protrude radially outward from the second portion.

3. The support pin according to claim 1 , wherein

the insertion part further having a third portion that protrudes from the second portion along the axis of the support cylinder,

with respect to a cross section perpendicular to the axis of the support cylinder, a shape and a size of the third portion is substantially the same as those of inside of the support cylinder.

4. The support pin according to claim 1 , wherein

the pair of first through-holes are elongated holes which extend along the axis of the support cylinder.

5. A film deposition device, comprising:

a support pin according to claim 1 ; and

a reaction chamber housing the support pin.

6. The film deposition device according to claim 5 , wherein

with respect to a cross section perpendicular to the axis, a shape and a size of the second portion is substantially the same as those of inside of the support cylinder, and

the pair of first portions protrude radially outward from the second portion.

7. The film deposition device according to claim 5 , wherein

the insertion part further having a third portion that protrudes from the second portion along the axis of the support cylinder,

with respect to a cross section perpendicular to the axis, a shape and a size of the third portion is substantially the same as those of inside of the support cylinder.

8. The film deposition device according to claim 5 , wherein

the pair of first through-holes are elongated holes which extend along the axis of the support cylinder.

9. The support pin according to claim 1 , wherein a dimension of the insertion part in the axial direction of the support cylinder is substantially same as a dimension of the pair of grooves along the axis of the support cylinder.

10. The support pin according to claim 1 , wherein the insertion part is in the shape of plate.

11. The support pin according to claim 1 , wherein the second portion is shaped in a column with a diameter substantially same as an inner diameter of the support cylinder, and the pair of first portions are formed in a rectangular parallelepiped shape protruding radially outward from the circumference surface of the second portion.

12. The support pin according to claim 3 , wherein the insertion part has an engagement part engaging with the pair of grooves, the engagement part is in the shape of plate and includes the pair of first portions and the second portion, and the third portion is in the shape of a column protruding from the second portion of the engagement part along the axis of the support cylinder.

13. The film deposition device according to claim 5 , wherein a dimension of the insertion part in the axial direction of the support cylinder is substantially same as a dimension of the pair of grooves along the axis of the support cylinder.

14. The film deposition device according to claim 5 , wherein the insertion part is in a shape of plate.

15. The film deposition device according to claim 5 , wherein the second portion is shaped in a column with a diameter substantially same as the inner diameter of the support cylinder, and the pair of first portions are formed in a rectangular parallelepiped shape protruding radially outward from the circumference surface of the second portion.

16. The film deposition device according to claim 7 , wherein the insertion part has an engagement part engaging with the pair of grooves, the engagement part is in the shape of plate and includes the pair of first portions and the second portion, and the third portion is in the shape of a column protruding from the second portion of the engagement part along the axis of the support cylinder.