Electrolyte for electroplating

1. An electrolyte for the electrodeposition of chromium comprising:

(A) less than 50 wt % water;

(B) at least one chromium salt; and

(C) at least one complexing agent selected from the group consisting of acetamide, urea, ethylene glycol, 1,3-propanediol, 1,4-butanediol, 1,5-pentanediol, 1,6-hexanediol and glycerol,

wherein the molar ratio of components B:C is in the range of 1:1 to 1:50.

2. The electrolyte according to claim 1 , wherein the chromium salt comprises at least one salt selected from the group consisting of CrCl 3 .6H 2 O, KCr(SO 4 ) 2 .12H 2 O and Cr 2 (SO 4 ) 3 .10H 2 O.

3. The electrolyte according to claim 1 further comprising an additive comprising at least one selected from the group consisting of boric acid, lactic acid, citric acid, ethylene diamine, sodium borate, sodium citrate, sodium phosphate, nicotinic acid, dimethyl hydantoin and methyl nicotinate.

4. The electrolyte according to claim 3 wherein the concentration of the additive is in the range of from 0.05 to 0.5 mol dm −3 .

5. The electrolyte according to claim 1 further comprising at least one bromide or iodide salt.

6. The electrolyte according to claim 5 wherein the salt is present is in a concentration of from 0.05 to 0.2 mol dm −3 .

7. The electrolyte according to claim 5 , wherein the salt is sodium iodide or lithium iodide.

8. A method comprising the steps of:

(i) contacting a conductive substrate and a counter electrode with the electrolyte as defined in claim 1 ; and

(ii) passing a current through the electrolyte to electrodeposit chromium metal onto the conductive substrate.

9. The method according to claim 8 wherein the conductive substrate comprises a material selected from the group consisting of mild steel, copper, aluminium, stainless steel, brass, cobalt and alloys thereof.

10. The method according to claim 8 wherein the current has a density in the range 50 to 300 mAcm −2 .

11. The method according to claim 8 wherein the electrodeposition is carried out at a temperature of between 30 and 60° C.

12. The method according to claim 8 further comprising the step of:

moving the conductive substrate through the electrolyte either by

(i) rotation, wherein the rotation frequencies are in the range 0.1 to 10 Hz; or

(ii) oscillating horizontal motion, wherein the oscillation frequencies are in the range 0.1 to 10 Hz.

13. The method according to claim 8 wherein the chromium metal electrodeposited during the passing step has a thickness of 5 to 500 μm.

14. The method according to claim 8 wherein the chromium metal electrodeposited during the passing step has a hardness greater than 600 HV.

15. The electrolyte according to claim 1 , wherein the electrolyte comprises from 10 to 25 wt % water.