Vapor delivery device, methods of manufacture and methods of use thereof

1. A method comprising:

transporting a first stream of a carrier gas to a delivery device, the delivery device containing a liquid precursor compound, the first stream of carrier gas being at a temperature greater than or equal to 20° C., where the liquid precursor compound is in a liquid state in the delivery device;

transporting a second stream of the carrier gas to a point downstream of the delivery device, wherein a flow direction of the first stream and a flow direction of the second stream are not opposed to each other;

combining the first stream after emanating from the delivery device and the second stream to form a third stream;

where a dew point of a vapor of the liquid precursor compound in the third stream is lower than an ambient temperature;

analyzing chemical contents of the third fluid stream by disposing a physical-chemical sensor downstream of the delivery device;

providing the physical-chemical sensor is in communication with a first proportional valve; and

providing a first controller in operative communication with the physical-chemical sensor and with the first proportional valve;

providing a pressure sensor in fluid communication with the delivery device;

providing a second controller in operative communication with the pressure sensor and in electrical communication with a second proportional valve; and

delivering a substantially constant number of moles of a liquid precursor compound vapor per unit volume of the carrier gas from the delivery system to a plurality of reactors that are in communication with the delivery system.

2. The method of claim 1 , further comprising transmitting a signal from the physical-chemical sensor that is disposed in the third stream to the first controller, where the first controller is operative to control a flow rate of a carrier gas in the first stream, and where the second controller is operative to control a flow rate of a carrier gas in the second stream.

3. The method of claim 2 , further comprising:

providing the delivery device with an inlet port and an outlet port;

providing the liquid precursor compound in a liquid state in the delivery device;

providing the first proportional valve in electrical communication with the first controller; and

providing the first proportional valve to be operative to control the flow of the carrier gas based on an applied voltage.

4. The method of claim 3 , providing the first controller, the first proportional valve, the delivery device and the physical-chemical sensor to lie in a first closed loop.

5. The method of claim 3 , providing the second controller, the second proportional valve and the pressure sensor to lie in a second closed loop.

6. The method of claim 3 , further comprising: delivering vapor of the liquid precursor compound from the delivery system at a rate greater than or equal to 0.1 grams per minute at a carrier gas flow rate of greater than or equal to 0.2 standard liters per minute at a temperature of minus 10° C. to 200° C. and a pressure of greater than or equal to 100 kilopascals.

7. The method of claim 3 , further comprising maintaining a precise vapor concentration within ±0.5 wt % from a set point and delivering the precursor vapor to the plurality of reactors.

8. The method of claim 3 , further comprising providing all flows in the delivery system are unidirectional and none of the flows are opposed to each other.

9. The method of claim 3 , further comprising: disposing the first proportional valve upstream of the delivery device.

10. The method of claim 3 , further comprising: facilitating an adjustable drop in pressure in a needle valve to adjust the flow of the carrier gas through the first proportional valve and the delivery device.