Titanium-containing film forming compositions for vapor deposition of titanium-containing films
Titanium-containing film forming compositions comprising titanium halide-containing precursors are disclosed. Also disclosed are methods of synthesizing and using the disclosed precursors to deposit Titanium-containing films on one or more substrates via vapor deposition processes.
1. A titanium-containing film forming composition comprising a titanium halide-containing precursor having the following formula:
TiX b :A c
with b=3 or 4; c=1-3; X=Br or I; A=SRR′, SeRR′, or TeRR′, and R and R′ are independently H or a C1-C5 hydrocarbon, wherein the Ti halide-containing precursor is a liquid at standard temperature and pressure.
2. The titanium-containing film forming composition of claim 1 , further comprising greater than 0% w/w and no more than 0.2% w/w of a mixture of oxyhalide (TiX 2 (═O)), hydroxyhalide (TiX 3 (OH)), and oxides (TiO 2 ).
3. The titanium-containing film forming composition of claim 1 , further comprising greater than 0% w/w and no more than 0.1% w/w of hydrogen halide (HX).
4. The titanium-containing film forming composition of claim 1 , further comprising greater than 0% w/w and no more than 5% w/w of a hydrocarbon solvent or of free adduct.
5. The titanium-containing film forming composition of claim 1 , further comprising greater than 0% w/w and no more than 5 ppmw of H 2 O.
6. The titanium-containing film forming composition of claim 1 , wherein X is Br.
7. The titanium-containing film forming composition of claim 1 , wherein X is I.
8. The titanium-containing film forming composition of claim 1 , wherein A is SRR′.
9. The titanium-containing film forming composition of claim 8 , wherein the Ti halide-containing precursor being TiBr 4 :S(nPr) 2 .
10. The titanium-containing film forming composition of claim 8 , wherein R≠R′.
11. The titanium-containing film forming composition of claim 10 , wherein the Ti halide-containing precursor is TiBr 4 :SEt(nPr).
12. The titanium-containing film forming composition of claim 1 , wherein A is SeRR′.
13. The titanium-containing film forming composition of claim 1 , wherein A is TeRR′.