Lithographic apparatus and device manufacturing method
A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
1. A substrate support for an immersion lithographic apparatus configured to project a radiation beam, using a projection system, onto a substrate via liquid supplied to a space between the projection system and the substrate, the substrate support comprising:
a body configured to support the substrate and configured to be removably supported on a movable substrate stage structure in the immersion lithographic apparatus; and
an extractor arrangement located at least partly in the body, the extractor arrangement configured to remove fluid and extraction piping of the extractor arrangement having a hydrophobic wall inside the body.
2. The substrate support of claim 1 , wherein a trench is formed adjacent an edge of the substrate when the substrate is supported by the substrate support, and the extraction piping is in fluid communication with the trench.
3. The substrate support of claim 1 , wherein the extraction piping is configured such that fluid is extracted by suitable under-pressure.
4. A substrate support for an immersion lithographic apparatus configured to project a patterned beam, using a projection system, onto a substrate via liquid supplied to a space between the projection system and the substrate, the substrate support comprising:
a body configured to support the substrate on a support plane defined by a plurality of projections, the body configured to be removably supported on a movable substrate stage structure in the immersion lithographic apparatus; and
an extractor arrangement located at least partly in the body with at least part of extraction piping of the extractor arrangement located at or below the support plane, the extractor arrangement having an opening in or on the body, the opening sized so as to remove fluid and at least part of the extractor piping having a hydrophobic wall inside the body.
5. The substrate support of claim 4 , wherein the extraction piping is configured such that fluid is extracted by suitable under-pressure.
6. The substrate support of claim 4 , wherein the body has a hydrophilic wail.
7. The substrate support of claim 4 , wherein the opening and the extraction piping are configured to remove, through a pressure differential across the opening and/or the extraction piping, substantially only liquid into the extraction piping.
8. The substrate support of claim 4 , wherein the extractor arrangement is configured to extract liquid using an underpressure and further, in the absence of liquid adjacent the opening, a meniscus substantially prevents entry of gas into the extraction piping.
9. The substrate support of claim 1 , wherein the body has a hydrophilic wall.
10. The substrate support of claim 1 , wherein an opening of the extraction piping and the extraction piping are configured to remove, through a pressure differential across the opening and/or the extraction piping, substantially only liquid into the extraction piping.
11. The substrate support of claim 1 , wherein the extractor arrangement is configured to extract liquid using an underpressure and further, in the absence of liquid adjacent an entrance of the extraction piping, a meniscus substantially prevents entry of gas into the extraction piping.
12. A substrate support for an immersion lithographic apparatus configured to project a patterned beam, using a projection system, onto a substrate via liquid supplied to a space between the projection system and the substrate, the substrate support comprising:
a body configured to support the substrate and configured to be removably supported on a movable substrate stage structure in the immersion lithographic apparatus; and
extraction piping located at least partly in the body, at least part of the extraction piping in or on the body is in fluid communication with the space and configured to remove liquid via a capillary action.
13. The substrate support of claim 12 , wherein the extraction piping is configured such that the liquid is extracted by suitable under-pressure.
14. The substrate support of claim 12 , wherein a trench is formed adjacent an edge of the substrate when the substrate is supported by the substrate support, and the extraction piping is in fluid communication with the trench.
15. The substrate support of claim 12 , wherein a portion of the body below a top surface of the body comprises a hydrophobic surface.
16. The substrate support of claim 12 , wherein a portion of the body below a top of the body comprises a hydrophilic surface.
17. The substrate support of claim 12 , wherein the extraction piping is configured to extract the liquid using an underpressure and further, in the absence of liquid adjacent an entrance of the extraction piping, a meniscus substantially prevents entry of gas into the extraction piping.
18. The substrate support of claim 12 , wherein the body comprises a plurality of projections protruding from a surface of the body.
19. The substrate support of claim 1 , wherein the extraction piping comprises a conduit with an opening in a surface of the body and a channel with a larger cross--section than the conduit, the conduit opening into the channel.
20. The substrate support of claim 4 , wherein the extraction piping comprises a conduit having the opening in a surface of the body and a channel with a larger cross-section than the conduit, the conduit opening into the channel.