Semiconductor device and manufacturing method of the semiconductor device
A semiconductor device includes: a first stack structure; a second stack structure adjacent to the first stack structure in a first direction; a first insulating layer including protrusion parts protruding in a second direction intersecting the first direction and including a concave part defined between the protrusion parts; and a second insulating layer located between the first stack structure and the second stack structure, the second insulating layer inserted into the concave part and the second insulating layer in contact with at least one protrusion part among the protrusion parts.
1. A semiconductor device comprising:
a first stack structure;
a second stack structure adjacent to the first stack structure in a first direction;
a first insulating layer including protrusion parts protruding in a second direction intersecting the first direction and including a concave part defined between the protrusion parts; and
a second insulating layer located between the first stack structure and the second stack structure, the second insulating layer inserted into the concave part and the second insulating layer in contact with at least one protrusion part among the protrusion parts,
wherein each of the first stack structure and the second stack structure includes conductive layers and third insulating layers, which are alternately stacked in a third direction intersecting the first direction and the second direction, and
wherein each of the protrusion parts penetrates the conductive layers and the third insulating layers in the third direction.
2. The semiconductor device of claim 1 , wherein the second insulating layer has a width wider than a width of the concave part.
3. The semiconductor device of claim 1 ,
wherein the first insulating layer and the second insulating layer have inclined sidewalls,
wherein an upper surface of the second insulating layer has a width wider than a width of the concave part, and
wherein a lower surface of the second insulating layer has a width narrower than the width of the concave part.
4. The semiconductor device of claim 3 ,
wherein the second insulating layer includes protrusion patterns formed at a sidewall of the second insulating layer, and
wherein the protrusion patterns protrude toward the protrusion parts.
5. The semiconductor device of claim 1 ,
wherein the first insulating layer and the second insulating layer have inclined sidewalls,
wherein an upper portion of the second insulating layer is in contact with the protrusion parts, and
wherein a gap exists between a lower portion of the second insulating layer and at least one protrusion part among the protrusion parts.
6. The semiconductor device of claim 1 , further comprising a dummy stack structure located in the concave part, the dummy stack structure being isolated by the first and second insulating layers.
7. The semiconductor device of claim 6 ,
wherein an upper portion of the dummy stack structure is isolated by the first and second insulating layers, and
wherein a lower portion of the dummy stack structure is connected to one of the first and second stack structures.
8. The semiconductor device of claim 1 ,
wherein the first stack structure belongs to a first memory block,
wherein the second stack structure belongs to a second memory block, and
wherein the first stack structure and the second stack structure are separated from each other by the first and second insulating layers.
9. The semiconductor device of claim 1 , wherein the first insulating layer includes a line pattern extending in the first direction and the protrusion parts protruding in the second direction from the line pattern.
10. The semiconductor device of claim 1 , wherein a first region of the second insulating layer, which overlaps with the protrusion parts, has a width wider than a width of a second region of the second insulating layer, which does not overlap with the protrusion parts.
11. The semiconductor device of claim 10 , wherein the protrusion parts have a shape bent to surround the first region of the second insulating layer.
12. The semiconductor device of claim 1 , wherein the first insulating layer includes a line pattern extending in the first direction and the protrusion parts, and
wherein the protrusion parts include first protrusion parts protruding in the second direction from the line pattern, and at least one second protrusion part protruding in the opposite direction to the protrusion parts from the line pattern.
13. The semiconductor device of claim 1 , wherein the first insulating layer includes a void.
14. A semiconductor device comprising:
a first stack structure including first conductive layers and first insulating layers, which are alternately stacked;
a second stack structure adjacent to the first stack structure in a first direction, the second stack structure including second conductive layers and second insulating layers, which are alternately stacked;
a first slit insulating structure including a first line pattern that extends in a second direction intersecting the first direction and penetrates the first stack structure and including a second line pattern that extends in the second direction and penetrates the second stack structure;
a second slit insulating structure inserted between the first line pattern and the second line pattern, the second slit insulating structure being in contact with at least one of the first and second line patterns; and
a dummy stack structure located between the first stack structure and the second stack structure, the dummy stack structure being isolated by the first slit insulating structure and the second slit insulating structure.
15. The semiconductor device of claim 14 , wherein the first slit insulating structure includes a third line pattern that connects the first line pattern and the second line pattern to each other and extends in the first direction.
16. The semiconductor device of claim 14 ,
wherein the first slit insulating structure includes a third line pattern that connects the first line pattern and the second line pattern to each other and extends in the first direction, and
wherein the first slit insulating structure includes a fourth line pattern extending in the opposite direction to the first and second line patterns from the third line pattern.
17. The semiconductor device of claim 14 , wherein the second slit insulating structure includes:
a third line pattern extending in the second direction, the third line pattern overlapping with one end of at least one of the first and second line patterns; and
a fourth line pattern extending in the second direction, the fourth line pattern overlapping with the other end of at least one of the first and second line patterns.
18. The semiconductor device of claim 17 , wherein the dummy stack structure is located between the third line pattern and the fourth line pattern.
19. A semiconductor device comprising:
a first stack structure;
a second stack structure adjacent to the first stack structure in a first direction;
a first slit insulating structure including a line pattern extending in the first direction and protrusion parts protruding in a second direction intersecting the first direction from the line pattern, the first slit insulating structure having a concave part defined between the protrusion parts;
a second slit insulating structure located between the first stack structure and the second stack structure, the second slit insulating structure inserted into the concave part and the second slit insulating structure in contact with at least one protrusion part among the protrusion parts; and
a dummy stack structure located in the concave part, the dummy stack structure being isolated by the first and second slit insulating structures.