Metal oxide and semiconductor device
A novel metal oxide is provided. The metal oxide has a plurality of energy gaps, and includes a first region having a high energy level of a conduction band minimum and a second region having an energy level of a conduction band minimum lower than that of the first region. The second region comprises more carriers than the first region. A difference between the energy level of the conduction band minimum of the first region and the energy level of the conduction band minimum of the second region is 0.2 eV or more. The energy gap of the first region is greater than or equal to 3.3 eV and less than or equal to 4.0 eV and the energy gap of the second region is greater than or equal to 2.2 eV and less than or equal to 2.9 eV.
1. A semiconductor device comprising:
a metal oxide, a pair of electrodes in contact with the metal oxide, an insulator in contact with the metal oxide, and a gate electrode overlapping with the metal oxide with the insulator therebetween,
wherein the metal oxide is a composite material which comprises:
a plurality of first regions; and
a second region,
wherein the plurality of first regions are dispersed in the second region,
wherein each of the plurality of first regions has a size of greater than or equal to 0.5 nm and less than or equal to 10 nm,
wherein an energy level of a conduction minimum of the second region is lower than an energy level of the conduction band minimum of the plurality of first regions,
wherein a difference between the energy level of the conduction band minimum of the plurality of first regions and the energy level of the conduction band minimum of the second region is greater than or equal to 0.2 eV,
wherein an energy gap of each of the plurality of first regions is greater than or equal to 3.3 eV and less than or equal to 4.0 eV, and
wherein an energy gap of the second region is greater than or equal to 2.2 eV and less than or equal to 2.9 eV.
2. The semiconductor device according to claim 1 ,
wherein the second region comprises more carriers than the plurality of first regions.
3. The semiconductor device according to claim 1 ,
wherein the metal oxide is a single layer.
4. The semiconductor device according to claim 1 ,
wherein the metal oxide has a periodic atomic arrangement in a region with a size greater than or equal to 1 nm and less than or equal to 10 nm.
5. The semiconductor device according to claim 1 ,
wherein a plurality of spots in a region with high luminance in a ring pattern are observed in the case where the metal oxide is analyzed by electron diffraction.
6. A display device comprising:
a display portion comprising a pixel,
wherein the pixel comprises the semiconductor device according to claim 1 .
7. A display device comprising:
a display portion and a gate driver,
wherein the gate driver comprises the semiconductor device according to claim 1 .
8. A semiconductor device comprising:
a metal oxide, a pair of electrodes in contact with the metal oxide, an insulator in contact with the metal oxide, and a gate electrode overlapping with the metal oxide with the insulator therebetween,
wherein the metal oxide is a composite material which comprises:
a plurality of first regions; and
a second region,
wherein the plurality of first regions and the second region are dispersed in the second region,
wherein each of the plurality of first regions has a size of greater than or equal to 0.5 nm and less than or equal to 10 nm,
wherein an energy level of a conduction minimum of the second region is lower than an energy level of the conduction band minimum of the plurality of first regions,
wherein each of the plurality of first regions comprises one of an M oxide, an M nitride, and an In-M-Zn oxide,
wherein M is at least two kinds of elements selected from Al, Ga, Si, Mg, Zr, Be, and B, and
wherein the second region comprises one of an In oxide and an In—Zn oxide.
9. The semiconductor device according to claim 8 ,
wherein the metal oxide is a single layer.
10. The semiconductor device according to claim 8 ,
wherein the metal oxide has a periodic atomic arrangement in a region with a size greater than or equal to 1 nm and less than or equal to 10 nm.
11. The semiconductor device according to claim 8 ,
wherein a plurality of spots in a region with high luminance in a ring pattern are observed in the case where the metal oxide is analyzed by electron diffraction.
12. A display device comprising:
a display portion comprising a pixel,
wherein the pixel comprises the semiconductor device according to claim 8 .
13. A display device comprising:
a display portion and a gate driver,
wherein the gate driver comprises the semiconductor device according to claim 8 .
14. A semiconductor device comprising:
a metal oxide, a pair of electrodes in contact with the metal oxide, an insulator in contact with the metal oxide, and a gate electrode overlapping with the metal oxide with the insulator therebetween,
wherein the metal oxide is a composite material which comprises:
a plurality of first regions having a first energy gap; and
a second region having a second energy gap,
wherein the plurality of first regions are dispersed in the second region,
wherein each of the plurality of first regions has a size of greater than or equal to 0.5 nm and less than or equal to 10 nm,
wherein each of the plurality of first regions has an energy level of a conduction band minimum higher than an energy level of a conduction band minimum of the second region,
wherein each of the plurality of first regions comprises a first oxide of a first metal element,
wherein the second region comprises a second oxide of a second metal element,
wherein each of the plurality of first regions comprises at least one third element different from the first metal element to increase an energy gap, and
wherein a concentration of the at least one third element in the plurality of first regions is higher than a concentration of the at least one third element in the second region.
15. The semiconductor device according to claim 14 ,
wherein the first metal element is Ga,
wherein the second metal element is In, and
wherein the at least one third element is at least two kinds of elements selected from Al, Si, Mg, Zr, Be, and B.
16. The semiconductor device according to claim 15 ,
wherein each of the plurality of first regions further comprises In and Zn, and
wherein the second region further comprises Zn.
17. The semiconductor device according to claim 14 ,
wherein the metal oxide is a single layer.
18. The semiconductor device according to claim 14 ,
wherein the metal oxide has a periodic atomic arrangement in a region with a size greater than or equal to 1 nm and less than or equal to 10 nm.
19. The semiconductor device according to claim 14 ,
wherein a plurality of spots in a region with high luminance in a ring pattern are observed in the case where the metal oxide is analyzed by electron diffraction.
20. A display device comprising:
a display portion comprising a pixel,
wherein the pixel comprises the semiconductor device according to claim 14 .
21. A display device comprising:
a display portion and a gate driver,
wherein the gate driver comprises the semiconductor device according to claim 14 .