Method for producing frame-equipped vapor deposition mask, stretching apparatus, apparatus for producing organic semiconductor device and method for producing organic semiconductor device
A method for producing a frame-equipped vapor deposition mask sequentially includes preparing a vapor deposition mask including a metal mask having a slit and a resin mask having an opening corresponding to a pattern to be produced by vapor deposition at a position overlapping the slit, the metal mask and the resin mask being stacked, retaining a part of the vapor deposition mask by a retainer and stretching the vapor deposition mask retained by the retainer outward, and fixing the vapor deposition mask in a state of being stretched to a frame having a through hole. During stretching, any one or both adjustments of a rotating adjustment and a moving adjustment of the vapor deposition mask are performed with respect to the vapor deposition mask in the state of being stretched or with the vapor deposition mask being stretched.
1. A stretching apparatus for stretching a vapor deposition mask, comprising:
a retainer configured to retain a part of the vapor deposition mask; and
a stretching mechanism for stretching the vapor deposition mask retained by the retainer,
wherein the retainer includes at least one mechanism of
a first rotating mechanism rotatable with a first rotational axis intersecting a surface of the vapor deposition mask being as an axis,
a second rotating mechanism rotatable with a second rotational axis not intersecting the surface of the vapor deposition mask being as an axis, and
a linearly movable moving mechanism, and
wherein the vapor deposition mask is fixed to a frame, and the stretching apparatus further comprises a drive stage for driving the frame, and the drive stage includes a moving mechanism movable in a direction intersecting an installation plane of the stretching apparatus on which the vapor deposition mask is retained.
2. The stretching apparatus according to claim 1 , further comprising a locking mechanism for maintaining a state of the vapor deposition mask having undergone any of rotation and movement with respect to the vapor deposition mask in a state of being stretched by the stretching mechanism or with the vapor deposition mask being stretched by the stretching mechanism by any mechanism of the first rotating mechanism, the second rotating mechanism and the moving mechanism of the retainer.
3. The stretching apparatus according to claim 1 , wherein the retainer includes a moving mechanism movable in a direction intersecting an installation plane of the stretching apparatus.
4. An apparatus for producing an organic semiconductor device, wherein the stretching apparatus according to claim 1 is implemented.
5. The stretching apparatus according to claim 1 , wherein the apparatus includes said second rotating mechanism.
6. The stretching apparatus according to claim 1 , wherein the apparatus includes said first rotating mechanism and said second rotating mechanism.
7. The stretching apparatus according to claim 1 , wherein the stretching mechanism is movable linearly in a first direction and the linearly movable moving mechanism is movable in a direction perpendicular to the first direction.