Hot spot and process window monitoring
Metrology overlay targets are provided, as well as method of monitoring process shortcomings. Targets comprise periodic structures, at least one of which comprising repeating asymmetric elements along a corresponding segmentation direction of the periodic structure. The asymmetry of the elements may be designed in different ways, for example as repeating asymmetric sub-elements along a direction perpendicular to the segmentation direction of the elements. The asymmetry of the sub-elements may be designed in different ways, according to the type of monitored process shortcomings, such as various types of hot spots, line edge shortening, process windows parameters and so forth. Results of the measurements may be used to improve the process and/or increase the accuracy of the metrology measurements.
1. A method comprising:
using an overlay tool with a metrology target, wherein the metrology target includes a wafer and at least two periodic structures disposed on the wafer, wherein at least one of the periodic structures comprises repeating asymmetric elements along a corresponding segmentation direction of the periodic structure, wherein the repeating asymmetric elements are internally periodic along a direction perpendicular to the segmentation direction, wherein the repeating asymmetric elements comprise repeating sub-elements along the perpendicular direction, the sub-elements being asymmetric in the segmentation direction, wherein the sub-elements comprise lines which are broken at least once, and wherein at least some of the sub-elements comprise vertical lines along the perpendicular direction connected to the sub-elements; and
deriving metrology signals from the metrology target using the overlay tool.
2. The method of claim 1 , wherein the sub-elements comprise at least two parallel line segments.
3. The method of claim 2 , wherein at least some of the parallel line segments are interconnected.
4. The method of claim 1 , wherein at least some of the lines or line segments are interconnected to at least some of the vertical lines.
5. The method of claim 1 , wherein at least some of the sub-elements are interconnected along the perpendicular direction.
6. The method of claim 1 , wherein at least some of the sub-elements are spaced from each other along the perpendicular direction.
7. The method of claim 1 , wherein the asymmetric elements comprise at least one asymmetrically positioned line which is perpendicular to the segmentation direction.
8. The method of claim 1 , wherein at least one of the sub-elements is a polygon with at least six sides.
9. The method of claim 1 , further comprising monitoring hot spots using the metrology signals.
10. The method of claim 1 , further comprising monitoring a process window using the metrology signals.
11. An apparatus comprising:
an overlay tool that includes a processor and a computer readable storage medium, wherein the processor is configured to derive metrology signals from a metrology target, wherein the metrology target includes a wafer and at least two periodic structures disposed on the wafer, wherein at least one of the periodic structures comprises repeating asymmetric elements along a corresponding segmentation direction of the periodic structure, wherein the repeating asymmetric elements are internally periodic along a direction perpendicular to the segmentation direction, wherein the repeating asymmetric elements comprise repeating sub-elements along the perpendicular direction, the sub-elements being asymmetric in the segmentation direction, wherein the sub-elements comprise lines which are broken at least once, and wherein at least some of the sub-elements comprise vertical lines along the perpendicular direction connected to the sub-elements.
12. The apparatus of claim 11 , wherein the sub-elements comprise at least two parallel line segments.
13. The apparatus of claim 12 , wherein at least some of the parallel line segments are interconnected.
14. The apparatus of claim 11 , wherein at least some of the lines or line segments are interconnected to at least some of the vertical lines.
15. The apparatus of claim 11 , wherein at least some of the sub-elements are interconnected along the perpendicular direction.
16. The apparatus of claim 11 , wherein at least some of the sub-elements are spaced from each other along the perpendicular direction.
17. The apparatus of claim 11 , wherein the asymmetric elements comprise at least one asymmetrically positioned line which is perpendicular to the segmentation direction.
18. The apparatus of claim 11 , wherein at least one of the sub-elements is a polygon with at least six sides.
19. The apparatus of claim 11 , wherein the overlay tool is further configured to monitor hot spots.
20. The apparatus of claim 11 , wherein the overlay tool is further configured to monitor a process window.