IP Library Granted Patent US 10,756,069
Granted Patent B2
US 10,756,069 · App. 16/465,770 · Granted Aug 25, 2020

Display device manufacturing method, display device and electronics apparatus

Inventor: Quanbo Zou (Weifang, CN)
Assignee: Goertek Inc.
H01L25/0753H01L22/22H01L33/0093H01L33/385H01L33/06H01L33/40H01L2933/0016
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Quick Facts
Patent No.
US 10,756,069
App. No.
16/465,770
Granted
Aug 25, 2020
Kind
B2
Abstract

A display device manufacturing method, display device and electronics apparatus are provided. The display device manufacturing method comprises: forming the vertical micro-LEDs on a growth substrate: forming a first electrode on top of each of the vertical micro-LEDs; forming a second electrode on side surface of each of the vertical micro-LEDs; and transferring the vertical micro-LEDs from the growth substrate to a display substrate of a display device. An embodiment of this invention can reduce the back-end fabrication process on a display substrate after transfer.

Claims (22)

1. A method for manufacturing a display device with vertical micro-LEDs, comprising:

forming the vertical micro-LEDs on a growth substrate;

forming a first electrode on a top surface of each of the vertical micro-LEDs;

forming a second electrode on a side surface of each of the vertical micro-LEDs; and

transferring the vertical micro-LEDs from the growth substrate to a display substrate of a display device

wherein the forming the second electrode includes:

depositing the second electrode on the top surface and the side surface of each of the vertical micro-LEDs;

coating a photoresist on the second electrode;

etching at least a portion of the photoresist to expose a multiple quantum well region therein and a first type doped region and cover the second electrode on the side surface of the vertical micro-LED;

etching the exposed second electrode; and

removing any remaining photoresist.

2. The method according to claim 1 , wherein the first electrode is a P electrode and the second electrode is an N electrode.

3. The method according to claim 1 , wherein each of the vertical micro-LEDs includes a second type doped region provided above the growth substrate, a multiple quantum well region provided above the second type doped region and a first type doped region provided above the multiple quantum well region, and the second electrode is formed on side surface of the second type doped region.

4. The method according to claim 3 , wherein the first type doped region is a P doped region, the second type doped region is an N doped region and includes an N heavily doped region, and the second electrode is formed on side surface of the N doped region and is Ohmic contact with the N heavily doped region.

5. The method according to claim 1 , further comprising:

testing the vertical micro-LEDs on the growth substrate through the first electrode and second electrode to determine known good dies of the vertical micro-LEDs on the growth substrate,

wherein the transferring the vertical micro-LEDs includes:

transferring known good dies of the vertical micro-LEDs from the growth substrate to the display substrate.

6. The method according to claim 1 , wherein the out layer of the first electrode is Au.

7. The method according to claim 1 , wherein the second electrode is a stack of metal layers including Cr, Al, ITO, Ni, Au, Ag, Ti and TiN.

8. A display device, which is manufactured by using the method for manufacturing a display device with vertical micro-LEDs according to claim 1 .

9. An electronics apparatus, comprising a display device according to claim 8 .

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 31, 2019
From: ZOU, QUANBO
To: GOERTEK, INC.
Reel/Frame 049331/0054 →
Continuity (1)
Related Publication 20200083197A1 · Mar 12, 2020