Composite substrate and method of manufacturing composite substrate
An object of the present invention is to provide a method of manufacturing a composite substrate including a piezoelectric layer with less Li amount variation and a support substrate. A method of manufacturing a composite substrate of the present invention includes a step of performing ion implantation into a piezoelectric substrate, a step of bonding the piezoelectric substrate and the support substrate, a step of separating the bonded substrate, at an ion-implanted portion of the piezoelectric substrate, into the piezoelectric layer bonded to the support substrate and the remaining piezoelectric substrate after the step of bonding the piezoelectric substrate and the support substrate, and a step of diffusing Li into the piezoelectric layer after the separating step.
1. A method of manufacturing a composite substrate including a piezoelectric layer and a support substrate, the method comprising:
performing ion implantation into a piezoelectric substrate;
bonding the piezoelectric substrate and the support substrate to form a bonded substrate;
separating the bonded substrate, at an ion-implanted portion of the piezoelectric substrate, into a piezoelectric layer bonded to the support substrate and a remaining piezoelectric substrate after the bonding of the piezoelectric substrate and the support substrate; and
diffusing Li into the piezoelectric layer after the separating.
2. The method of manufacturing a composite substrate according to claim 1 , the method further comprising:
increasing a temperature of the piezoelectric substrate to a temperature equal to or higher than a Curie temperature and decreasing the temperature of the piezoelectric substrate to a temperature equal to or lower than the Curie temperature while an electric field is applied after the bonding of the piezoelectric substrate and the support substrate.
3. The method of manufacturing a composite substrate according to claim 1 , the method further comprising:
increasing a temperature of the piezoelectric substrate to recover a piezoelectric property, after the bonding of the piezoelectric substrate and the support substrate.
4. The method of manufacturing a composite substrate according to claim 1 , wherein the piezoelectric layer is set to have a quasi-stoichiometric composition in the diffusing Li into the piezoelectric layer.
5. The method of manufacturing a composite substrate according to claim 1 , wherein the piezoelectric substrate has a range in which Li concentration differs in a thickness direction.
6. The method of manufacturing a composite substrate according to claim 1 , wherein the piezoelectric substrate is lithium tantalate or lithium niobate.
7. The method of manufacturing a composite substrate according to claim 1 , wherein an intervening layer is provided between the piezoelectric layer and the support substrate.
8. The method of manufacturing a composite substrate according to claim 1 , wherein the support substrate contains at least one material selected from silicon, sapphire, silicon carbide, and spinel.
9. The method of manufacturing a composite substrate according to claim 1 , wherein the bonding of the piezoelectric substrate and the support substrate is performed by a surface activation normal temperature bonding method.
10. The method of manufacturing a composite substrate according to claim 1 , wherein ion species is at least one type of ion selected from a hydrogen ion, a hydrogen molecular ion, and a helium ion, in the performing ion implantation into a piezoelectric substrate.