IP Library › Granted Patent US 10,777,475
Granted Patent B2
US 10,777,475 · App. 15/775,825 · Granted Sep 15, 2020

Semiconductor chip, semiconductor device, and electronic device

Inventor: Kazuhiro Fukuchi (Tokyo, JP)
Assignee: Renesas Electronics Corporation
H01L23/28H01L21/823487H01L23/3142H01L23/48H01L23/482H01L23/49503H01L23/49562H01L23/5389H01L24/02H01L24/03H01L24/05H01L24/06H01L24/19H01L24/32H01L24/96H01L25/07H01L25/18H01L27/088H01L29/7813H01M10/44H02J7/0031H02J7/0072H03K17/6874H01L23/49827H01L24/48H01L24/73H01L2224/0345H01L2224/0346H01L2224/03831H01L2224/04026H01L2224/04042H01L2224/04105H01L2224/05551H01L2224/05557H01L2224/0603H01L2224/06181H01L2224/24137H01L2224/24195H01L2224/2518H01L2224/32014H01L2224/32245H01L2224/48095H01L2224/48247H01L2224/73265H01L2224/92144H01L2224/94H01L2924/00014H01L2924/13055H01L2924/13091H01L2924/181H01L2924/19105H01L2924/3511
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Quick Facts
Patent No.
US 10,777,475
App. No.
15/775,825
Granted
Sep 15, 2020
Kind
B2
Abstract

In order to improve reliability of a semiconductor device, in a semiconductor chip according to one embodiment, an uneven shape is formed on an exposed surface of a back surface electrode formed on a back surface of the semiconductor chip.

Claims (96)

1. A semiconductor chip comprising:

a semiconductor substrate in which a first power transistor is formed;

a first front surface electrode formed on a first surface of the semiconductor substrate and electrically connected to the first power transistor;

a second front surface electrode formed on the first surface of the semiconductor substrate and electrically connected to the first power transistor; and

a back surface electrode formed on a second surface on a side opposite to the first surface of the semiconductor substrate and electrically connected to the first power transistor,

wherein an uneven shape formed on a front surface or the back surface electrode, and

wherein a surface roughness of the front surface of the back surface electrode on which the uneven shape is formed is rougher than a surface roughness of a front surface of the first front surface electrode.

2. The semiconductor chip according to claim 1 ,

wherein a thickness of the back surface electrode is larger than a thickness of each of the first front surface electrode and the second front surface electrode.

3. The semiconductor chip according to claim 2 ,

wherein an external size of the back surface electrode is equal to or less than an external size of the semiconductor substrate.

4. The semiconductor chip according to claim 1 ,

wherein the first power transistor is a first power MOSFET,

wherein the first front surface electrode is electrically connected to a first source of the first power MOSFET,

wherein the second front surface electrode is electrically connected to a first gate of the first power MOSFET, and

wherein the back surface electrode is electrically connected to a first drain of the first power MOSFET.

5. The semiconductor chip according to claim 4 ,

wherein the semiconductor chip includes:

the semiconductor substrate in which a second power MOSFET reversely connected in series with the first power MOSFET is formed;

a third front surface electrode formed on the first surface of the semiconductor substrate and electrically connected to a second source of the second power MOSFET;

a fourth front surface electrode formed on the first surface of the semiconductor substrate and electrically connected to a second gate of the second power MOSFET; and

the back surface electrode electrically connected to a drain of the second power MOSFET.

6. The semiconductor chip according to claim 5 ,

wherein a thickness of the back surface electrode is larger than a thickness of each of the first front surface electrode, the second front surface electrode, the third front surface electrode, and the fourth front surface electrode.

7. The semiconductor chip according to claim 6 ,

wherein an external size of the back surface electrode is equal to or less than an external size of the semiconductor substrate.

8. A semiconductor device comprising:

a first semiconductor component; and

a sealing member sealing the first semiconductor component,

wherein the first semiconductor component includes:

a semiconductor substrate in which a first power transistor is formed;

a first front surface electrode formed on a first surface of the semiconductor substrate and electrically connected to the first over transistor;

a second front surface electrode formed on the first surface of the semiconductor substrate and electrically connected to the first power transistor; and

a back surface electrode formed on a second surface on a side or to the first surface of the semiconductor substrate and electrically connected to the first power transistor,

wherein a first uneven shape is formed on a front surface of the back surface electrode in contact with the sealing member,

wherein the semiconductor device includes a wiring substrate,

wherein the wiring substrate includes:

a substrate;

the first semiconductor component mounted on the substrate;

the sealing member sealing the first semiconductor component; and

a wiring electrically connected with the first semiconductor component, and

wherein a surface roughness of the surface, which is in contact with the sealing member, of the back surface electrode in which the first uneven shape is formed is rougher than a surface roughness of a front surface of the wiring formed on the wiring substrate.

9. The semiconductor device according to claim 8 ,

wherein the wiring of the wiring substrate has a second uneven shape formed thereon, and

wherein a surface roughness of a surface, which is in contact with the wiring substrate, of the back surface electrode on which the first uneven shape is formed is equivalent to a surface roughness of a front surface of the wiring on which the second uneven shape is formed.

10. The semiconductor device according to claim 8 ,

wherein a thickness of the back surface electrode is equal to a thickness of the wiring.

11. The semiconductor device according to claim 8 ,

wherein the back surface electrode is made of the same material as a material of the wiring.

12. The semiconductor device according to claim 8 ,

wherein the wiring substrate includes an electronic component mounted on the substrate and electrically connected with the first semiconductor component, and

wherein the electronic component is sealed with the sealing member.

13. The semiconductor device according to claim 8 ,

wherein the semiconductor device includes:

a component mounting portion mounting the first semiconductor component; and

the sealing member sealing the first semiconductor component, and

wherein, in a plan view, the component mounting portion is disposed inside the first semiconductor component.

14. The semiconductor device according to claim 8 ,

wherein an external size of the back surface electrode is equal to or less than an external size of the semiconductor substrate.

15. An electronic device comprising:

a secondary battery capable of being charged and discharged; and

a semiconductor device controlling the secondary battery,

wherein the semiconductor device includes:

a control unit controlling charge and discharge of the secondary battery; and

a bidirectional connection unit electrically connected to the control unit and through which charge and discharge currents flow,

wherein the semiconductor device includes:

a wiring substrate;

a control chip embedded in the wiring substrate and in which the control unit is formed; and

a semiconductor chip embedded in the wiring substrate and in which the bidirectional connection unit is formed,

wherein the semiconductor chip is formed with:

a semiconductor substrate having a first power transistor and a second power transistor reversely connected in series with the first power transistor formed therein;

a first source electrode formed on a first surface of the semiconductor substrate and electrically connected to a first source of the first power transistor;

a second source electrode formed on the first surface of the semiconductor substrate and electrically connected to a second source of the second power transistor;

a first gate electrode formed on the first surface of the semiconductor substrate and electrically connected to a first gate of the first power transistor;

a second gate electrode formed on the first surface of the semiconductor substrate and electrically connected to a second gate of the second power transistor; and

a back surface electrode formed on a second surface on a side opposite to the first surface of the semiconductor substrate and electrically connected to a drain of the first power transistor and a drain of the second power transistor, and

wherein an uneven shape is formed on a front surface of the back surface electrode in contact with the wiring substrate.

16. The electronic device according to claim 15 ,

wherein a size of the semiconductor chip is larger than a size of the control chip.

17. The electronic device according to claim 15 ,

wherein the electronic device is a battery pack.

18. The electronic device according to claim 15 ,

wherein a surface roughness of the front surface of the back surface electrode on which the uneven shape is formed is rougher than a surface roughness of a front surface of the first front surface electrode.

19. The electronic device according to claim 18 ,

wherein the first power transistor is a first power MOSFET,

wherein the first front surface electrode is electrically connected to a first source of the first power MOSFET,

wherein the second front surface electrode is electrically connected to a first gate of the first power MOSFET,

wherein the back surface electrode is electrically connected to a first drain of the first power MOSFET,

wherein the semiconductor chip includes:

the semiconductor substrate in which a second power MOSFET reversely connected in series with the first power MOSFET is formed;

a third front surface electrode formed on the first surface of the semiconductor substrate and electrically connected to a second source of the second power MOSFET;

a fourth front surface electrode formed on the first surface of the semiconductor substrate and electrically connected to a second gate of the second power MOSFET; and

the back surface electrode electrically connected to a drain of the second power MOSFET, and

wherein a thickness of the back surface electrode is larger than a thickness of each of the first front surface electrode, the second front surface electrode, the third front surface electrode, and the fourth front surface electrode.

20. The electronic device according to claim 19 ,

wherein an external size of the back surface electrode is equal to or less than an external size of the semiconductor substrate.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 12, 2018
From: FUKUCHI, KAZUHIRO
To: RENESAS ELECTRONICS CORPORATION
Reel/Frame 045790/0893 →
Continuity (1)
Related Publication 20180331005A1 · Nov 15, 2018
Cited By (2)
US 12,243,808 US 12,638,514