Vapor deposition device
A vapor deposition device includes: a retaining portion, which is configured to retain a substrate; a basket filament-type heater, which is formed of a linear heat-generating element, which is configured to generate heat through application of a current, and which includes an accommodating portion formed so as to allow a vapor deposition material to be accommodated by bending the linear heat-generating element, the filament-type heater being arranged so that the accommodating portion is positioned at a predetermined distance in a horizontal direction of the basket filament-type heater from the substrate retained on the retaining portion; and a reflective plate, which is arranged on a rear side of the vapor deposition material accommodated in the accommodating portion, when viewed from the substrate retained on the retaining portion, and which is constructed so as to receive heat from the basket filament-type heater.
1. A vapor deposition device, comprising:
a retaining portion, which is configured to retain a substrate;
a heater, including a heat-generating element which is configured to generate heat through application of a current, and including an accommodating portion to allow a vapor deposition material to be accommodated, the heater being arranged so that the accommodating portion is positioned at a predetermined distance in a horizontal direction of the heater from the substrate retained on the retaining portion; and
a reflective plate, which is arranged in the accommodating portion on a rear side of the vapor deposition material accommodated in the accommodating portion, when viewed from the substrate retained on the retaining portion, and which is constructed so as to receive heat from the heater,
wherein the accommodating portion has a conical shape having a contour that protrudes downward by winding the heat-generating element into a helical shape, and
wherein the reflective plate has a semi-conical shape and is arranged in the accommodating portion to protrude downward.
2. A vapor deposition device according to claim 1 , wherein the reflective plate includes a rear surface plate arranged on a rear side of the accommodating portion when viewed from the substrate retained on the retaining portion.
3. A vapor deposition device according to claim 2 , wherein the reflective plate includes an upper plate arranged on an upper side of the accommodating portion and a lower plate arranged on a lower side of the accommodating portion.