Bragg gratings with airgap cladding
Structures that include a Bragg grating and methods of fabricating a structure that includes a Bragg grating. Bragg elements are positioned adjacent to a waveguide. The Bragg elements are separated by grooves that alternate with the Bragg elements. A dielectric layer includes portions positioned to close the grooves to define airgaps. The airgaps are respectively arranged between adjacent pairs of the Bragg elements. The Bragg elements may be used to form the Bragg grating.
1. A structure comprising:
a waveguide;
a plurality of Bragg elements positioned adjacent to the waveguide, the plurality of Bragg elements separated by a plurality of grooves that alternate with the plurality of Bragg elements; and
a dielectric layer including first portions positioned to close the plurality of grooves to define a plurality of airgaps, the plurality of airgaps respectively arranged between adjacent pairs of the plurality of Bragg elements,
wherein each of the plurality of Bragg elements has a sidewall, and the dielectric layer includes second portions that are respectively positioned on the sidewall of each of the plurality of Bragg elements.
2. The structure of claim 1 further comprising:
a photodetector positioned adjacent to the plurality of Bragg elements.
3. A structure comprising:
a waveguide;
a first plurality of Bragg elements positioned adjacent to the waveguide, the first plurality of Bragg elements separated by a first plurality of grooves that alternate with the first plurality of Bragg elements;
a second plurality of Bragg elements positioned adjacent to the waveguide, the second plurality of Bragg elements separated by a second plurality of grooves that alternate with the second plurality of Bragg elements, the second plurality of Bragg elements laterally positioned between the first plurality of Bragg elements and the waveguide; and
a first dielectric layer including first portions positioned to close the first plurality of grooves to define a first plurality of airgaps and second portions positioned to close the second plurality of grooves to define a second plurality of airgaps, the first plurality of airgaps respectively arranged between adjacent pairs of the first plurality of Bragg elements, and the second plurality of airgaps respectively arranged between adjacent pairs of the second plurality of Bragg elements.
4. The structure of claim 3 wherein each of the first plurality of Bragg elements has a top surface, each of the first plurality of grooves has an entrance that is coplanar with the top surface of each adjacent pair of the first plurality of Bragg elements, and each of the first portions of the first dielectric layer is positioned at or above the entrance to one of the first plurality of grooves.
5. The structure of claim 3 further comprising:
a photodetector positioned adjacent to the first plurality of Bragg elements.
6. The structure of claim 5 further comprising:
a second dielectric layer; and
a semiconductor layer having a section over the second dielectric layer,
wherein the first plurality of airgaps and the photodetector are positioned over the second dielectric layer, and the photodetector is positioned in a trench located partially in the section of the semiconductor layer and partially in the first dielectric layer.
7. The structure of claim 3 further comprising:
a photodetector laterally positioned between the second plurality of Bragg elements and the first plurality of Bragg elements.
8. The structure of claim 7 further comprising:
a second dielectric layer; and
a semiconductor layer having a section located over the second dielectric layer,
wherein the first plurality of airgaps, the second plurality of airgaps, and the photodetector are positioned over the second dielectric layer, and the photodetector is positioned in a trench located partially in the section of the semiconductor layer and partially in the first dielectric layer.
9. The structure of claim 3 wherein each of the first plurality of grooves has a width, and each of the first plurality of Bragg elements has a height that is greater than the width.
10. The structure of claim 3 wherein the first portions of the first dielectric layer at least partially surround each of the first plurality of grooves.
11. The structure of claim 3 wherein each of the first plurality of Bragg elements has a top surface, each of the first plurality of grooves has an entrance that is coplanar with the top surface of each adjacent pair of the first plurality of Bragg elements, and further comprising:
a plurality of spacers, each spacer positioned over the entrance to one of the first plurality of grooves.
12. The structure of claim 3 wherein each of the first plurality of Bragg elements has a sidewall, and further comprising:
a plurality of spacers, each spacer including a first portion positioned inside one of the first plurality of grooves on the sidewall of a respective one of the first plurality of Bragg elements.
13. The structure of claim 12 wherein each of the first plurality of Bragg elements has a top surface, each spacer further includes a second portion over the first portion, and the second portion of each spacer is positioned above the top surface of the respective one of the first plurality of Bragg elements.
14. The structure of claim 3 further comprising:
a hardmask including a plurality of sections, each section of the hardmask positioned over a respective one of the first plurality of Bragg elements.
15. The structure of claim 14 wherein each section of the hardmask includes a sidewall, and further comprising:
a plurality of spacers, each spacer arranged on the sidewall of a respective one of the plurality of sections of the hardmask and over the respective one of the first plurality of Bragg elements.
16. The structure of claim 3 wherein each of the first plurality of Bragg elements has a sidewall, and the first dielectric layer includes third portions that are respectively positioned on the sidewall of each of the first plurality of Bragg elements.
17. A method comprising:
patterning a semiconductor layer to form a plurality of Bragg elements positioned adjacent to a waveguide;
depositing a dielectric layer over the plurality of Bragg elements; and
forming a photodetector positioned between the plurality of Bragg elements and the waveguide,
wherein the photodetector is positioned in part in a trench in the dielectric layer, the plurality of Bragg elements are separated by a plurality of grooves that alternate with the plurality of Bragg elements, and the dielectric layer includes portions positioned to close the plurality of grooves to define a plurality of airgaps.
18. The method of claim 17 further comprising:
forming portions of a sacrificial layer in each of the plurality of grooves; and
patterning a hardmask including a plurality of sections,
wherein each of the plurality of sections of the hardmask is positioned over a respective one of the plurality of Bragg elements.
19. The method of claim 18 further comprising:
forming a plurality of spacers; and
after forming the plurality of spacers, removing the portions of the sacrificial layer,
wherein each spacer is arranged above a respective one of the portions of the sacrificial layer, and the dielectric layer is deposited on the plurality of Bragg elements after removing the portions of the sacrificial layer.
20. The method of claim 17 further comprising:
forming a plurality of spacers,
wherein each spacer is arranged on a sidewall of a respective one of the plurality of Bragg elements, and the dielectric layer is deposited on the plurality of Bragg elements after forming the plurality of spacers.