System and method for optimally forming gratings of diffracted optical elements
Optical grating components and methods of forming are provided. In some embodiments, a method includes providing an optically transparent substrate, and forming an optical grating layer on the substrate. The method includes forming an optical grating in the optical grating layer, wherein the optical grating comprises a plurality of angled components, disposed at a non-zero angle of inclination with respect to a perpendicular to a plane of the substrate. A first sidewall of the optical grating may have a first angle, and a second sidewall of the grating has a second angle different than the first angle. Modifying process parameters, including selectivity and beam angle spread, has an effect of changing a shape or dimension of the plurality of angled components.
1. A method of forming an optical grating component, comprising:
providing an optical grating layer atop a substrate;
providing a patterned hardmask atop the optical grating layer; and
etching the optical grating layer and the hardmask to form an optical grating in the optical grating layer, wherein the optical grating comprises a plurality of angled components disposed at a non-zero angle of inclination with respect to a perpendicular to a plane of the substrate, and wherein the etching results in a width of the patterned hardmask being reduced faster than a height to form first and second sidewalls of the optical grating having different angles.
2. The method of claim 1 , wherein forming the optical grating comprises etching into the optical grating layer.
3. The method of claim 1 , wherein the etching comprises an angled reactive ion etch.
4. The method of claim 3 , wherein the angled reactive ion etch is performed by a ribbon reactive ion beam, wherein the substrate is scanned along a scan direction with respect to the ribbon reactive ion beam using a processing recipe, and wherein the ribbon reactive ion beam has a beam angle mean and a beam spread, the beam spread being one of: converging or diverging.
5. The method of claim 4 , wherein the processing recipe comprises a plurality of process parameters having an effect of changing a shape or dimension of the plurality of angled components.
6. The method of claim 5 , wherein the plurality of process parameters includes one or more of the following: a material of the optical grating layer, a chemistry of the ribbon reactive ion beam relative to a chemistry of the optical grating layer and to a hardmask formed atop the optical grating layer, an etch stop layer formed below the optical grating layer, a ribbon reactive ion beam intensity, a relative pressure of different gasses used to form the ribbon reactive ion beam, a temperature to form the ribbon reactive ion beam, a ribbon reactive ion beam angle, and a ribbon reactive ion beam spread.
7. The method of claim 1 , wherein the etching causes the patterned hardmask to be removed before the optical grating layer is removed to a top surface of an etch stop layer.
8. The method of claim 1 , wherein the etching results in the first sidewall and the second sidewall having a curved geometry.
9. The method of claim 1 , further comprising forming the optical grating by:
forming a pattern into a wafer; and
transferring the pattern to the optical grating layer using a nano imprint lithography process.
10. A method of forming an optical grating component, comprising:
providing an optical grating layer atop a substrate;
providing a patterned hardmask atop the optical grating layer; and
etching the optical grating layer and the hardmask to form an optical grating in the optical grating layer, wherein the optical grating comprises a plurality of angled components disposed at a non-zero angle of inclination with respect to a perpendicular to a plane of the substrate, and wherein the etching results in a width of the patterned hardmask being reduced faster than a height to form first and second sidewalls of the plurality of angled components having different angles.
11. The method of claim 10 , wherein forming the optical grating comprises etching into the optical grating layer using an angled reactive ion etch.
12. The method of claim 11 , wherein the angled reactive ion etch is performed by a ribbon reactive ion beam, wherein the substrate is scanned along a scan direction with respect to the ribbon reactive ion beam using a processing recipe, and wherein the ribbon reactive ion beam has a beam angle mean and a beam spread, the beam spread being one of: converging or diverging.
13. The method of claim 12 , wherein the processing recipe comprises a plurality of process parameters having an effect of changing a shape or dimension of the plurality of angled components.
14. The method of claim 13 , wherein the plurality of process parameters includes one or more of the following: a material of the optical grating layer, a chemistry of the ribbon reactive ion beam relative to a chemistry of the optical grating layer and to a hardmask formed atop the optical grating layer, an etch stop layer formed below the optical grating layer, a ribbon reactive ion beam intensity, a relative pressure of different gasses used to form the ribbon reactive ion beam, a temperature to form the ribbon reactive ion beam, a ribbon reactive ion beam angle, and a ribbon reactive ion beam spread.
15. The method of claim 10 , wherein the etching causes the patterned hardmask to be removed before the optical grating layer is removed to a top surface of an etch stop layer.
16. The method of claim 10 , wherein the etching results in the first sidewall and the second sidewall having a curved geometry.
17. A method for forming an augmented reality/virtual reality device, the method comprising:
providing a hardmask atop an optical grating layer; and
etching the optical grating layer and the hardmask to form an optical grating in the optical grating layer, wherein the optical grating comprises a plurality of angled components disposed at a non-zero angle of inclination with respect to a perpendicular to a plane of the optical grating layer, and wherein the etching results in a width of the patterned hardmask being reduced faster than a height to form first and second sidewalls of the plurality of angled components having different angles.
18. The method of claim 17 , wherein forming the optical grating comprises etching into the optical grating layer using an angled reactive ion etch.
19. The method of claim 18 , wherein the angled reactive ion etch is performed by a ribbon reactive ion beam, wherein the optical grating layer is scanned along a scan direction with respect to the ribbon reactive ion beam using a processing recipe, and wherein the ribbon reactive ion beam has a beam angle mean and a beam spread, the beam spread being one of: converging or diverging.
20. The method of claim 17 , wherein the etching results in the first sidewall and the second sidewall having a curved geometry.