IP Library › Granted Patent US 10,804,632
Granted Patent B2
US 10,804,632 · App. 16/338,224 · Granted Oct 13, 2020

Connection terminal and method for producing connection terminal

Inventor: Hajime Watanabe (Yokkaichi, JP)
Assignees: AUTONETWORKS TECHNOLOGIES, LTD.; SUMITOMO WIRING SYSTEMS, LTD.; SUMITOMO ELECTRIC INDUSTRIES, LTD.
H01R13/03C23F1/00C25D3/30C25D3/50C25D5/10C25D5/48C25D7/00H01B1/02H01R43/16
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Quick Facts
Patent No.
US 10,804,632
App. No.
16/338,224
Granted
Oct 13, 2020
Kind
B2
Abstract

A connection terminal in which alloy particles made of an intermetallic compound containing tin and palladium are exposed on an outermost surface of a contact configured to electrically contact a mating conductor and distributed on a surface of a base material at least in the contact, wherein: a tin part made of pure tin or an alloy having a higher ratio of tin to palladium than the intermetallic compound is not exposed on a plane passing through a point where a height of the alloy particles from the surface of the base material is highest.

Claims (17)

1. A connection terminal in which alloy particles made of an intermetallic compound containing tin and palladium are exposed on an outermost surface of a contact configured to electrically contact a mating conductor and distributed on a surface of a base material at least in the contact, wherein:

a tin part made of pure tin or an alloy having a higher ratio of tin to palladium than the intermetallic compound is not exposed on a plane passing through a point where a height of the alloy particles from the surface of the base material is highest.

2. A connection terminal according to claim 1 , wherein the tin part is not present around the alloy particles.

3. A connection terminal according to claim 1 , wherein the surface of the base material is exposed between the alloy particles.

4. A connection terminal according to claim 1 , wherein:

the base material includes a layer of nickel or nickel alloy; and

the intermetallic compound has a composition of (Ni 0.4 Pd 0.6 )Sn 4 .

5. A connection terminal according to claim 1 , wherein a ratio of an area occupied by the alloy particles in the contact is 30% or higher.

6. A connection terminal according to claim 1 , wherein a dynamic friction coefficient between the contact and the mating conductor having a tin layer exposed on an outermost surface is 0.4 or lower.

7. A connection terminal according to claim 1 , wherein an average thickness of a layer occupied by the alloy particles is 0.1 μm or larger and 5.0 μm or smaller.

8. A method for producing a connection terminal, comprising:

fabricating a laminated structure in which a palladium layer and a tin layer are laminated in this order on a surface of a base material;

heating the laminated structure to form alloy particles made of an intermetallic compound containing tin and palladium; and

removing a tin part made of pure tin or an alloy having a higher ratio of tin to palladium than the intermetallic compound, the pure tin or the alloy deriving from excess tin having not formed the intermetallic compound.

9. A method for producing a connection terminal according to claim 8 , wherein removing the tin part is performed by chemically dissolving tin.

10. A method for producing a connection terminal according to claim 8 , wherein a ratio of palladium to the total amount of tin and palladium in the laminated structure is 2 atom % or higher.

11. A method for producing a connection terminal according to claim 8 , wherein a ratio of palladium to the total amount of tin and palladium in the laminated structure is below 20 atom %.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 29, 2019
From: WATANABE, HAJIME
To: AUTONETWORKS TECHNOLOGIES, LTD.; SUMITOMO WIRING SYSTEMS, LTD.; SUMITOMO ELECTRIC INDUSTRIES, LTD.
Reel/Frame 048742/0800 →
Priority Claims (1)
JP 2016-205742 · Oct 20, 2016 · national
Continuity (1)
Related Publication 20200036125A1 · Jan 30, 2020
Cited By (1)
US 12,573,778