Ferroelectric memories
A ferroelectric memory is provided. The ferroelectric memory includes a first electrode, a second electrode opposite to the first electrode, at least one ferroelectric layer disposed between the first electrode and the second electrode, and at least one antiferroelectric layer disposed between the first electrode and the second electrode, wherein the antiferroelectric layer is in contact with the ferroelectric layer.
1. A ferroelectric memory, comprising:
a first electrode;
a second electrode opposite to the first electrode;
at least one ferroelectric layer disposed between the first electrode and the second electrode; and
at least one antiferroelectric layer disposed between the first electrode and the second electrode, wherein the antiferroelectric layer is in contact with the ferroelectric layer, wherein the at least one ferroelectric layer comprises a plurality of ferroelectric layers, the at least one antiferroelectric layer comprises a plurality of antiferroelectric layers, and the plurality of ferroelectric layers and the plurality of antiferroelectric layers are disposed between the first electrode and the second electrode and the one ferroelectric layer and the one antiferroelectric layer are alternately arranged in a horizontal direction.
2. The ferroelectric memory as claimed in claim 1 , wherein the at least one ferroelectric layer comprises one ferroelectric layer, the at least one antiferroelectric layer comprises one antiferroelectric layer, the ferroelectric layer is disposed between the first electrode and the second electrode, and the antiferroelectric layer is disposed between the first electrode and the ferroelectric layer.
3. The ferroelectric memory as claimed in claim 2 , wherein one ferroelectric layer and one antiferroelectric layer have a total thickness which is in a range from 5 nm to 15 nm.
4. The ferroelectric memory as claimed in claim 1 , wherein the at least one ferroelectric layer comprises one ferroelectric layer, the at least one antiferroelectric layer comprises a first antiferroelectric layer and a second antiferroelectric layer, the ferroelectric layer is disposed between the first electrode and the second electrode, the first antiferroelectric layer is disposed between the first electrode and the ferroelectric layer, and the second antiferroelectric layer is disposed between the second electrode and the ferroelectric layer.
5. The ferroelectric memory as claimed in claim 4 , wherein one ferroelectric layer, the first antiferroelectric layer and the second antiferroelectric layer have a total thickness which is in a range from 5 nm to 15 nm.
6. The ferroelectric memory as claimed in claim 1 , wherein the ferroelectric layer and the antiferroelectric layer respectively has a thickness which is in a range from 5 nm to 15 nm.
7. The ferroelectric memory as claimed in claim 1 , wherein the at least one ferroelectric layer comprises one ferroelectric layer, the at least one antiferroelectric layer comprises one antiferroelectric layer, the ferroelectric layer is disposed between the first electrode and the second electrode, and the antiferroelectric layer is disposed between the second electrode and the ferroelectric layer.
8. The ferroelectric memory as claimed in claim 7 , wherein one ferroelectric layer and one antiferroelectric layer have a total thickness which is in a range from 5 nm to 15 nm.
9. The ferroelectric memory as claimed in claim 1 , wherein the at least one ferroelectric layer comprises a first ferroelectric layer and a second ferroelectric layer, the at least one antiferroelectric layer comprises one antiferroelectric layer, the antiferroelectric layer is disposed between the first electrode and the second electrode, the first ferroelectric layer is disposed between the first electrode and the antiferroelectric layer, and the second ferroelectric layer is disposed between the second electrode and the antiferroelectric layer.
10. The ferroelectric memory as claimed in claim 9 , wherein the first ferroelectric layer, the second ferroelectric layer and one antiferroelectric layer have a total thickness which is in a range from 5 nm to 15 nm.
11. The ferroelectric memory as claimed in claim 1 , wherein the first electrode and the second electrode comprise semiconductor, conductive dielectric or metal.
12. The ferroelectric memory as claimed in claim 11 , wherein the first electrode and the second electrode comprise zirconium (Zr), hafnium (Hf), titanium oxide (TiO x ), titanium nitride (TiN), titanium (Ti), titanium oxynitride (TiON), tantalum (Ta), tantalum nitride (TaN), tantalum silicide (TaSi), tantalum carbonitride (TaCN), titanium aluminum nitride (TiAlN), zinc (Zn), zinc oxide (ZnO), nickel (Ni), nickel silicide (NiSi), carbon (C), silicon (Si), silicon oxide (SiO x ), silicon nitride (SiN x ), silicon oxynitride (SiON x ), germanium (Ge), platinum (Pt), aluminum (Al), aluminum nitride (AlN), yttrium (Y), gadolinium (Gd), strontium (Sr), tungsten (W), tungsten silicide (WSi), tungsten nitride (WN), gallium (Ga), or gallium nitride (GaN).
13. The ferroelectric memory as claimed in claim 1 , wherein the ferroelectric layer comprises hafnium zirconium oxide (HfZrO x ), hafnium silicon oxide (HfSiO x ), hafnium oxide (HfO x ), hafnium yttrium oxide (HfYO x ), hafnium gadolinium oxide (HfGdO x ), hafnium strontium oxide (HfSrO x ), strontium titanium oxide (SrTiO x ), strontium calcium titanate (SrCaTiO 3 ), Ag(Nb 1-x Ta x )O 3 , barium strontium titanate (BaSrTiO 3 ), or barium titanate (BaTiO 3 ), wherein, in hafnium zirconium oxide (HfZrO x ), hafnium has a content higher than that of zirconium.
14. The ferroelectric memory as claimed in claim 13 , wherein when the ferroelectric layer is hafnium zirconium oxide (HfZrO x ), hafnium has a content which is higher than that of zirconium.
15. The ferroelectric memory as claimed in claim 1 , wherein the antiferroelectric layer comprises hafnium zirconium oxide (HfZrO x ), zirconium oxide (ZrO x ), hafnium silicon oxide (HfSiO x ), hafnium aluminum oxide (HfAlO x ), strontium titanium oxide (SrTiO x ), strontium calcium titanate (SrCaTiO 3 ), Ag(Nb 1-x Ta x )O 3 , barium strontium titanate (BaSrTiO 3 ), or barium titanate (BaTiO 3 ), wherein, in hafnium zirconium oxide (HfZrO x ), zirconium has a content higher than that of hafnium.
16. The ferroelectric memory as claimed in claim 15 , wherein when the antiferroelectric layer is hafnium zirconium oxide (HfZrO x ), zirconium has a content which is higher than that of hafnium.