IP Library › Granted Patent US 10,859,450
Granted Patent B2
US 10,859,450 · App. 16/564,198 · Granted Dec 8, 2020

Strain sensor and method of fabricating the same

Inventors: Soong Ju Oh (Seoul, KR); Woo Seok Lee (Seoul, KR); Dong Gyu Kim (Namyangju-si, KR)
Assignee: Korea University Research and Business Foundation
G01L1/2287G01L1/18
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 10,859,450
App. No.
16/564,198
Granted
Dec 8, 2020
Kind
B2
Abstract

The present disclosure discloses a strain sensor and a method of fabricating the same. The strain sensor according to an embodiment of the present disclosure includes an X-axis sensor formed on a flexible insulating substrate and responsible for sensing X-axis strain; a Y-axis sensor formed on the flexible insulating substrate to be orthogonal to the X-axis sensor and responsible for sensing Y-axis strain; a metal electrode formed on a region of the flexible insulating substrate where the X-axis sensor and the Y-axis sensor are not formed; and an encapsulation layer formed on the X-axis sensor, the Y-axis sensor, and the metal electrode. In this case, the X-axis sensor and the Y-axis sensor have a metal-insulator heterostructure.

Claims (37)

1. A strain sensor, comprising:

an X-axis sensor formed on a flexible insulating substrate and responsible for sensing X-axis strain;

a Y-axis sensor formed on the flexible insulating substrate to be orthogonal to the X-axis sensor and responsible for sensing Y-axis strain;

a metal electrode formed on a region of the flexible insulating substrate where the X-axis sensor and the Y-axis sensor are not formed; and

an encapsulation layer formed on the X-axis sensor, the Y-axis sensor, and the metal electrode,

wherein the X-axis sensor and the Y-axis sensor have a metal-insulator heterostructure, and

wherein the X-axis sensor and the Y-axis sensor each comprise cracks therein.

2. The strain sensor according to claim 1 , wherein the metal-insulator heterostructure comprises first nanocrystals used as a metallic material and second nanocrystals used as an insulating material.

3. The strain sensor according to claim 2 , wherein a volume ratio of the first nanocrystals to the second nanocrystals is 38 to 18:62 to 82.

4. The strain sensor according to claim 2 , wherein the first nanocrystals or the second nanocrystals have a diameter of 5 nm to 15 nm.

5. The strain sensor according to claim 2 , wherein the first nanocrystals or the second nanocrystals comprise an organic ligand containing 1 to 3 carbon chains or an inorganic ligand.

6. The strain sensor according to claim 5 , wherein the organic ligand containing 1 to 3 carbon chains comprises at least one of 3-mercaptopropionic acid (MPA) and 1,2-ethanedithiol (EDT).

7. The strain sensor according to claim 5 , wherein the inorganic ligand comprises at least one of sulfide ion (S 2− ), chloride ion (Cl − ), bromide ion (Br − ), thiocyanate ion (SCN − ), iodide ion (I − ), disulfide ion (HS − ), telluride ion (Te 2− ), hydroxide ion (OH − ), tetrafluoroborate ion (BF 4 − ), and hexafluorophosphate ion (PF 6 − ).

8. The strain sensor according to claim 1 , wherein the encapsulation layer comprises at least one of SU-8, polydimethylsiloxane (PDMS), Ecoflex, poly(methyl methacrylate) (PMMA), and polyimide.

9. The strain sensor according to claim 1 , wherein the cracks are formed in the X-axis sensor and the Y-axis sensor so that the cracks are orthogonal to each other.

10. The strain sensor according to claim 2 , wherein the first nanocrystals comprise at least one of indium tin oxide (ITO), fluorine-doped tin oxide (FTO), and aluminum-doped zinc oxide (AZO).

11. The strain sensor according to claim 2 , wherein the second nanocrystals comprise at least one of zinc oxide (ZnO), silicon oxide (SiO 2 ), and aluminum oxide (Al 2 O 3 ).

12. The strain sensor according to claim 1 , wherein the metal electrode comprises at least one of a silver (Ag) nanowire, a copper (Cu) nanowire, an aluminum (Al) nanowire, a gold (Au) nanowire, a platinum (Pt) nanowire, a nickel (Ni) nanowire, a tungsten (W) nanowire, an iron (Fe) nanowire, a carbon nanotube (CNT), and graphene.

13. A strain sensor, comprising:

an X-axis sensor formed on a flexible insulating substrate and responsible for sensing X-axis strain;

a Y-axis sensor formed on the flexible insulating substrate to be orthogonal to the X-axis sensor and responsible for sensing Y-axis strain;

a metal electrode formed on a region of the flexible insulating substrate where the X-axis sensor and the Y-axis sensor are not formed; and

an encapsulation layer formed on the X-axis sensor, the Y-axis sensor, and the metal electrode,

wherein the X-axis sensor and the Y-axis sensor have a metal-insulator heterostructure, and

wherein the metal electrode comprises at least one of a silver (Ag) nanowire, a copper (Cu) nanowire, an aluminum (Al) nanowire, a gold (Au) nanowire, a platinum (Pt) nanowire, a nickel (Ni) nanowire, a tungsten (W) nanowire, an iron (Fe) nanowire, a carbon nanotube (CNT), and graphene.

14. A method of fabricating a strain sensor, comprising:

dispersing first nanocrystals and second nanocrystals in a solvent to prepare a sensing solution;

performing patterning using the sensing solution to form an X-axis sensor and a Y-axis sensor on a flexible insulating substrate so that the X-axis sensor and the Y-axis sensor are orthogonal to each other;

forming a metal electrode on a region of the flexible insulating substrate where the X-axis sensor and the Y-axis sensor are not formed;

forming cracks in the X-axis sensor and the Y-axis sensor; and

forming an encapsulation layer on the X-axis sensor in which cracks are formed, the Y-axis sensor in which cracks are formed, and the metal electrode.

15. The method according to claim 14 , wherein the X-axis sensor and the Y-axis sensor have a metal-insulator heterostructure.

16. The method according to claim 14 , wherein a volume ratio of the first nanocrystals to the second nanocrystals is 38 to 18:62 to 82.

17. The method according to claim 14 , wherein the performing further comprises replacing a first organic ligand formed on surfaces of the first nanocrystals and the second nanocrystals with a second organic ligand or an inorganic ligand.

18. The method according to claim 17 , wherein the first organic ligand contains 8 to 18 carbon chains.

19. The method according to claim 17 , wherein the second organic ligand contains 1 to 3 carbon chains.

20. The method according to claim 17 , wherein the inorganic ligand comprises at least one of sulfide ion (S 2− ), chloride ion (Cl − ), bromide ion (Br − ), thiocyanate ion (SCN − ), iodide ion (I − ), disulfide ion (HS − ), telluride ion (Te 2− ), hydroxide ion (OH − ), tetrafluoroborate ion (BF 4 − ), and hexafluorophosphate ion (PF 6 − ).

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 9, 2019
From: OH, SOONG JU; LEE, WOO SEOK; KIM, DONG GYU
To: KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION
Reel/Frame 050311/0941 →
Priority Claims (1)
KR 10-2019-0014455 · Feb 7, 2019 · national
Continuity (1)
Related Publication 20200256748A1 · Aug 13, 2020
Cited By (1)
US 12,487,135