Plasmonic ultrasensitive multiplex analysis platform for hyperspectral molecular sensing
Plasmonic gratings, along with methods of creating devices using width-graded plasmonic gratings are described. Plasmonic gratings may be transmission-type or closed-ended plasmonic gratings, and may be disposed on detectors to enhance the spectral range detection of the detectors or in further device architectures.
1. A device comprising:
a detector operable to detect photons, the detector comprising a complementary metal-oxide-semiconductor (CMOS) comprising pixels or a charge-coupled device (CCD) comprising pixels;
a plasmonic grating comprising at least two walls, wherein adjacent walls are separated by a cavity, each wall has a thickness, and each cavity has a depth and a width, wherein the plasmonic grating is transparent, wherein the plasmonic grating is disposed on the detector, and wherein the wall thickness, the cavity depth, and the cavity width of the plasmonic grating are each tuned to absorb electromagnetic radiation and excite surface plasmons; and
a sample holder comprising a bin configured to contain an analyte, an entirety of the plasmonic grating being positioned within the bin such that the plasmonic grating is configured to come into contact with the analyte during the operation of the device.
2. The device of claim 1 , wherein the plasmonic grating is metallic.
3. The device of claim 2 , wherein the metallic material of the plasmonic grating is selected from the group consisting of gold, silver, aluminum, and combinations thereof.
4. The device of claim 1 , wherein the plasmonic grating is tuned to the infrared electromagnetic radiation range.
5. The device of claim 1 , wherein the plasmonic grating is about 2 μm to 10 μm in length.
6. The device of claim 1 , wherein the cavity width of the plasmonic grating ranges from about 10 nm to about 300 nm.
7. The device of claim 1 , wherein the cavity depth of the plasmonic grating ranges from about 500 nm to about 20 μm.
8. The device of claim 1 , wherein the plasmonic grating comprises at least three walls, and wherein the cavity depths the plasmonic grating are approximately uniform.
9. The device of claim 1 , wherein the wall thickness of the plasmonic grating ranges from about 10 nm to about 300 nm.
10. The device of claim 1 , wherein the detector comprises a low frequency infrared pixel, a medium frequency infrared pixel and a high frequency infrared pixel,
wherein the low frequency infrared pixel is tuned to absorb electromagnetic radiation in about the λ≥10 μm spectral region,
wherein the medium frequency infrared pixel is tuned to absorb electromagnetic radiation in about the 5 μm≤λ≤10 μm spectral region, and
wherein the high frequency infrared pixel is tuned to absorb electromagnetic radiation in about the λ≤5 μm spectral region.
11. The device of claim 1 , wherein the plasmonic grating is rectangular or cylindrical.
12. The device of claim 1 , further comprising a light source, wherein the light source is configured to direct light to the plasmonic grating.
13. The device of claim 1 , wherein the plasmonic grating covers about 10 pixels of the detector.