IP Library › Granted Patent US 10,866,507
Granted Patent B2
US 10,866,507 · App. 16/125,864 · Granted Dec 15, 2020

Pellicle and reticle including the same

Inventors: Yongseung Moon (Yongin-si, KR); Heebom Kim (Hwaseong-si, KR); Changyoung Jeong (Yongin-si, KR)
Assignee: Samsung Electronics Co., Ltd.
G03F1/62G03F1/22
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Quick Facts
Patent No.
US 10,866,507
App. No.
16/125,864
Granted
Dec 15, 2020
Kind
B2
Abstract

Provided is a pellicle to be used in a photolithography process. The pellicle a film, at least a portion of which includes carbon allotropes. The film has a first surface and a second surface facing the first surface, the film comprises a doped region including dopants, the doped region adjacent to the first surface, the dopants include least one of boron or nitrogen, and the doped region comprises a bond between an atom of at least one of the dopants and a carbon atom.

Claims (41)

1. A pellicle comprising:

a film, at least a portion of which includes carbon allotropes,

wherein the film has a first surface and a second surface facing the first surface,

the film comprises a doped region including dopants, the doped region adjacent to the first surface,

the dopants include at least one of boron or nitrogen, and

the doped region comprises a bond between an atom of at least one of the dopants and a carbon atom.

2. The pellicle of claim 1 , wherein the film includes

a two-dimensional carbon atomic layer, wherein at least a portion of the two-dimensional carbon layer includes one of the carbon allotropes.

3. The pellicle of claim 1 , wherein a concentration of the dopants in the doped region increases from the first surface to a middle point of the doped region and decreases from the middle point to the second surface.

4. The pellicle of claim 1 , wherein the dopants include boron.

5. The pellicle of claim 1 , wherein an atomic percent of the dopants ranges from about 1 at % to about 3 at %.

6. The pellicle of claim 1 , wherein at least some of the dopants are bonded with each other.

7. The pellicle of claim 1 , wherein the film has a thickness ranging from 5 nm to 100 nm.

8. The pellicle of claim 1 , wherein both the first surface and the second surface are exposed to air.

9. A pellicle comprising:

a film, at least a portion of which includes a carbon allotrope,

wherein the film has a first surface and a second surface facing the first surface,

the film comprises a doped region including dopants, the doped region being adjacent to the first surface,

the dopants include boron, and

a concentration of the boron in the doped region increases from the first surface to a middle point of the doped region and decreases from the middle point to the second surface.

10. The pellicle of claim 9 , wherein the carbon allotrope includes at least one of graphene, graphite, porous carbon, carbon nanowire, carbon nanotube, or diamond.

11. The pellicle of claim 9 , wherein the doped region comprises:

at least one B—C bond between a boron atom and a carbon atom; and

at least one of B—B bond between boron atoms, wherein

a ratio of the at least one B—C bond to a sum of the at least one B—B bond and the at least one B—C bond in the doped region is greater than a ratio of the at least one B—B bond to a sum of the at least one B—B bond and the at least one B—C bond.

12. The pellicle of claim 9 , wherein an atomic percent of the boron in the doped region ranges from about 1 at % to about 3 at %.

13. The pellicle of claim 9 , wherein the film has a thickness ranging from 5 nm to 100 nm.

14. The pellicle of claim 9 , wherein both the first surface and the second surface are exposed to air.

15. A reticle, comprising:

a photomask including a mask substrate and a mask pattern on the mask substrate;

a pellicle including a first surface and a second surface opposite to the first surface, the first surface being exposed to an outside and the second surface facing the photomask; and

a frame between the photomask and the pellicle, wherein

the pellicle includes a film, at least a portion of the film including a carbon allotrope,

the pellicle comprises a doped region including dopants, the doped region being adjacent to the first surface,

the dopants include at least one of boron or nitrogen, and

a concentration of the dopants in the doped region increases from the first surface to a middle point of the doped region and decreases from the middle point to the second surface.

16. The reticle of claim 15 , wherein the doped region comprises a bond between an atom of at least one of the dopants and a carbon atom.

17. The reticle of claim 15 , wherein the doped region comprises a bond between at least two atoms of the dopants.

18. The reticle of claim 15 , wherein the carbon allotrope include at least one of graphene, graphite, porous carbon, carbon nanowire, carbon nanotube, or diamond.

19. The reticle of claim 15 , wherein the pellicle is configured to be transparent to extreme ultraviolet (EUV) light.

20. The reticle of claim 15 , wherein a depth of the doped region is between 4 nm and 10 nm.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 10, 2018
From: MOON, YONGSEUNG; KIM, HEEBOM; JEONG, CHANGYOUNG
To: SAMSUNG ELECTRONICS CO., LTD.
Reel/Frame 046829/0197 →
Priority Claims (1)
KR 10-2018-0014337 · Feb 6, 2018 · national
Continuity (1)
Related Publication 20190243234A1 · Aug 8, 2019
Cited By (1)
US 12,699,315