IP Library › Granted Patent US 10,875,951
Granted Patent B2
US 10,875,951 · App. 16/091,658 · Granted Dec 29, 2020

Propylene-diene copolymer resin having excellent melt tension

Inventors: Byung Hun Chae (Daejeon, KR); Hyun Yul Woo (Daejeon, KR); Rai Ha Lee (Suwon-si, KR); Joon Keun Min (Daejeon, KR); Sung Won Jung (Seoul, KR); Youn Jin Hong (Daejeon, KR); Eun Hye Shin (Daejeon, KR)
Assignee: LOTTE CHEMICAL CORPORATION
C08F236/06C08F2/44C08F2/60C08F10/06C08F210/06C08F232/06C08F236/22C08F4/65912C08F2420/01C08F2500/11C08F2500/12C08F2800/10
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Quick Facts
Patent No.
US 10,875,951
App. No.
16/091,658
Granted
Dec 29, 2020
Kind
B2
Abstract

Disclosed is a propylene-diene copolymer resin having excellent melt tension, with improved melt strength, high molecular weight and broad molecular weight distribution by using a specific metallocene catalyst system. The present invention provides a propylene-diene copolymer resin produced by polymerizing propylene and a diene compound of C4-C20 by using a metallocene catalyst system, wherein the propylene-diene copolymer resin has the melt index (2.16 kg load at 230° C.) of 0.1-100 g/10 min and the melt tension (advanced rheometric expansion system (ARES)) of 5-100 g.

Claims (23)

1. A propylene-diene copolymer resin produced by a method comprising the step of polymerizing propylene and a diene compound of C4-C20 by using a catalyst system,

wherein the catalyst system comprises: a metallocene compound represented by the following Chemical Formula 1; and at least one cocatalyst compound selected from the group consisting of a boron compound represented by the following Chemical Formulae 2 to 4 and an aluminum compound represented by the following Chemical Formulae 5 to 9, and

the propylene-diene copolymer resin has the melt index (2.16 kg load at 230° C.) of 0.1-100 g/10 min and the melt tension (advanced rheometric expansion system (ARES)) of 5-100 g:

B(R 11 ) 3   [Chemical Formula 2]

[R 12 ] + [B(R 11 ) 4 ] −   [Chemical Formula 3]

[(R 13 ) r ZH] + [B(R 11 ) 4 ] −   [Chemical Formula 4]

—[Al(R 14 )—O] s —  [Chemical Formula 5]

(R 14 ) 2 Al—[O(R 14 )] t —(R 14 ) 2   [Chemical Formula 6]

(R 15 ) u Al(E) 3-u   [Chemical Formula 7]

(R 16 ) 2 AlOR 17   [Chemical Formula 8]

R 16 Al(OR 17 ) 2   [Chemical Formula 9]

in Chemical Formula 1, M is a tetravalent or divalent group 4 transition metal of the periodic table, and m is 2 and n is 0 when M is a tetravalent transition metal of group 4 of the periodic table, and m is 0 and n is 1 when M is a divalent transition metal of group 4 of the periodic table; Cp is a cyclopentadienyl ring which may be η 5 -bonded to M and the cyclopentadienyl ring may be further substituted by at least one selected from the group consisting of (C1-C20) alkyl, (C3-C20) cycloalkyl, (C6-C20) aryl, tri(C1-C20) alkylsilyl, tri(C6-C20) arylsilyl, (C1-C20) alkyldi (C6-C20) arylsilyl, (C6-C20) aryldi (C1-C20) alkylsilyl and (C2-C20) alkenyl; D is SiR 3 R 4 or (C2-C20) alkenylene; R 3 and R 4 are each independently hydrogen, (C1-C20) alkyl, (C3-C20) cycloalkyl or (C6-C20) aryl, or R 3 and R 4 may be linked by (C4-C7) alkylene to form a ring; R 1 is (C1-C20) alkyl; Ar is (C6-C20) aryl; R 2 is hydrogen, (C1-C20) alkyl, (C3-C20) cycloalkyl or (C6-C20) aryl; the Ar and R 2 may be linked by (C1-C7) alkylene, (C2-C7) alkenylene or (C4-C7) alkane dienylene to form a fused ring; X 1 is halogen, (C1-C20) alkyl, (C1-C20) alkoxy, (C3-C20) cycloalkyl, (C6-C20) aryl, (C6-C20) aryloxy, —OSiR a R b R c , —SR d , —NR e R f , or —PR g R h ; R a to R h are each independently (C1-C20) alkyl, (C6-C20) aryl or (C3-C20) cycloalkyl; X 2 is a neutral, conjugated or nonconjugated (C4-C20) diene; the alkyl in R 1 , the aryl in Ar, the alkyl, cycloalkyl, and aryl in R 2 , R 3 , and R 4 may be each independently further substitute by at least one substituent selected from the group consisting of halogen, (C1-C20) alkyl, halo (C1-C20) alkyl, (C3-C20) cycloalkyl, (C6-C20) aryl, (C1-C20) alkoxy and (C6-C20) aryloxy;

in Chemical Formulae 2 to 4, B is a boron atom; R 11 is phenyl, and the phenyl may be further substituted by three to five substituents selected from a fluorine atom, (C1-C20) alkyl, (C1-C20) alkyl substituted by a fluorine atom, (C1-C20) alkoxy, and (C1-C20) alkoxy substituted by a fluorine atom; R 12 is a (C5-C7) aromatic radical or a (C1-C20) alkyl (C6-C20) aryl radical or a (C6-C20) aryl (C1-C20) alkyl radical; Z is a nitrogen or phosphorus atom; R 13 is a (C1-C20) alkyl radical or an anilinium radical substituted by two (C1-C10) alkyls together with a nitrogen atom; r is an integer of 2 or 3;

in Chemical Formulae 5 to 9, R 14 is (C1-C20) alkyl; s and t are each independently an integer of 5 to 20; R 15 and R 16 are each independently (C1-C20) alkyl; E is a hydrogen atom, a halogen atom or (C1-C20) alkyl; u is an integer of 1 to 3; R 17 is (C1-C20) alkyl or (C6-C20) aryl, and

the propylene-diene copolymer resin comprises two melting peaks at 140 to 154° C. and 129 to 135° C. respectively.

2. The propylene-diene copolymer resin of claim 1 ,

wherein in the step of polymerizing, the content of the diene compound is prepared in 0.001 to 3 mol % based on the propylene.

3. The propylene-diene copolymer resin of claim 1 ,

wherein the diene compound is at least one selected from the group consisting of linear or branched C4-C20 diene or C5-C20 cyclodiene.

4. The propylene-diene copolymer resin of claim 3 ,

wherein the diene compound is at least one selected from the group consisting of 1,3-butadiene, 1,4-pentadiene, 2-methyl-1,3-butadiene, 1,4-hexadiene, 1,5-hexadiene, 1,5-heptadiene, 1,6-heptadiene, 1,6-octadiene, 1,7-octadiene, 1,7-nonadiene, 1,8-nonadiene, 1,8-decadiene, 1,9-decadiene, 1,12-tetradecadiene, 1,13-tetradecadiene, 3-methyl-1,4-hexadiene, 3-methyl-1,5-hexadiene, 3-ethyl-1,4-hexadiene, 3-ethyl-1,5-hexadiene, 3,3-dimethyl-1,4-hexadiene, 3,3-dimentyl-1,5-hexadiene, cyclopentadiene, cyclohexadiene, cycloheptadiene, and cyclooctadiene.

5. The propylene-diene copolymer resin of claim 1 ,

wherein the propylene-diene copolymer resin has the gel content of 10% by weight or less.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 4, 2018
From: CHAE, BYUNG HUN; WOO, HYUN YUL; LEE, RAI HA; MIN, JOON KEUN; JUNG, SUNG WON; HONG, YOUN JIN; SHIN, EUN HYE
To: LOTTE CHEMICAL CORPORATION
Reel/Frame 047720/0832 →
Priority Claims (1)
KR 10-2016-0042125 · Apr 6, 2016 · national
Continuity (1)
Related Publication 20190119427A1 · Apr 25, 2019