Solid-state imaging device and method of manufacturing solid-state imaging device
A solid-state imaging device includes: a semiconductor substrate having a light incident surface; a photoelectric converter for each of the pixels; a charge accumulation section for each of the pixels; a first transfer transistor; a wiring layer on side opposite to the light incident surface; a first vertical electrode and a second vertical electrode extending from the surface opposite to the light incident surface to the photoelectric converter; a first light-blocking film in a thickness direction of the semiconductor substrate on at least a portion of a periphery of the photoelectric converter; and a second light-blocking film in a surface direction of the semiconductor substrate between the photoelectric converter and the charge accumulation section. The first vertical electrode and the second vertical electrode are disposed adjacently with a distance therebetween, and the distance is a half or less of a length of one side of the pixel.
1. A solid-state imaging device comprising:
a semiconductor substrate having a light incident surface;
a photoelectric converter provided for each of a plurality of pixels on a side of the light incident surface in the semiconductor substrate;
a charge accumulation section provided for each of the pixels on a side closer to a side opposite to the light incident surface than the photoelectric converter in the semiconductor substrate;
a first transfer transistor that transfers a signal charge accumulated in the photoelectric converter to the charge accumulation section;
a wiring layer provided on a surface on the side opposite to the light incident surface of the semiconductor substrate;
a first vertical electrode and a second vertical electrode extending from the surface on the side opposite to the light incident surface of the semiconductor substrate to the photoelectric converter;
a first light-blocking film provided in a thickness direction of the semiconductor substrate on at least a portion of a periphery of the photoelectric converter; and
a second light-blocking film provided in a surface direction of the semiconductor substrate between the photoelectric converter and the charge accumulation section,
the first vertical electrode and the second vertical electrode being disposed adjacently with a distance therebetween, the distance being a half or less of a length of one side of any of the pixels.
2. The solid-state imaging device according to claim 1 , wherein the first vertical electrode and the second vertical electrode are provided in a same pixel.
3. The solid-state imaging device according to claim 1 , wherein the first vertical electrode and the second vertical electrode are provided in mutually different pixels.
4. The solid-state imaging device according to claim 1 , further comprising:
a second transfer transistor; and
a charge-voltage converter to which the signal charge is transferred from the charge accumulation section by the second transfer transistor.
5. The solid-state imaging device according to claim 1 , wherein the first light-blocking film surrounds the photoelectric converter.
6. The solid-state imaging device according to claim 1 , wherein the first light-blocking film is provided also on a periphery of the charge accumulation section.
7. The solid-state imaging device according to claim 1 , wherein the first vertical electrode and the second vertical electrode are provided in an opening of the second light-blocking film.
8. The solid-state imaging device according to claim 1 , further comprising an image plane phase detection pixel using the second light-blocking film.
9. The solid-state imaging device according to claim 1 , further comprising a color filter on side of an incident surface of the semiconductor substrate.
10. The solid-state imaging device according to claim 2 , wherein
the first vertical electrode serves as a gate electrode of the first transfer transistor,
the second vertical electrode serves as a gate electrode of a discharging transistor that discharges an unnecessary charge accumulated in the photoelectric converter.
11. The solid-state imaging device according to claim 3 , wherein both the first vertical electrode and the second vertical electrode serve as gate electrodes of the first transfer transistor.
12. The solid-state imaging device according to claim 4 , further comprising a reset transistor that resets a potential of the charge-voltage converter.
13. The solid-state imaging device according to claim 4 , further comprising an amplification transistor that outputs a signal corresponding to magnitude of a potential of the charge-voltage converter.
14. The solid-state imaging device according to claim 13 , further comprising a select transistor that controls an output of the amplification transistor.
15. The solid-state imaging device according to claim 7 , further comprising, in the opening of the second light-blocking film, an embedded material having a refractive index different from a refractive index of a constituent material of the second light-blocking film.
16. A method of manufacturing a solid-state imaging device, the method comprising:
forming a photoelectric converter for each of a plurality of pixels on a side of a light incident surface in a semiconductor substrate;
forming a charge accumulation section for each of the pixels on a side closer to a side opposite to the light incident surface than the photoelectric converter in the semiconductor substrate;
forming a wiring layer on a surface on the side opposite to the light incident surface of the semiconductor substrate, and forming a vertical electrode extending from the surface on the side opposite to the light incident surface of the semiconductor substrate to the photoelectric converter;
forming a first light-blocking film in a thickness direction of the semiconductor substrate on at least a portion of a periphery of the photoelectric converter; and
forming a second light-blocking film along a surface direction of the semiconductor substrate between the photoelectric converter and the charge accumulation section,
the second light-blocking film being formed through forming a first portion and a second portion of the second light-blocking film in a stepwise manner.
17. The method of manufacturing the solid-state imaging device according to claim 16 , wherein the second light-blocking film is formed through forming a first cavity for formation of the first portion on a periphery of the vertical electrode and filling the first cavity with a light-blocking material, and thereafter forming a second cavity for formation of the second portion and filling the second cavity with the light-blocking material.
18. The method of manufacturing the solid-state imaging device according to claim 17 , wherein the first light-blocking film is provided in a first slit coupled to the first portion and a second slit coupled to the second portion.
19. The method of manufacturing the solid-state imaging device according to claim 18 , wherein the first light-blocking film and the second light-blocking film are formed through forming the first slit and the first cavity and filling the first slit and the first cavity with the light-blocking material, and thereafter forming the second slit and the second cavity and filling the second slit and the second cavity with the light-blocking material.
20. A solid-state imaging device comprising:
a semiconductor substrate having a light incident surface;
a photoelectric converter provided for each of a plurality of pixels on a side of the light incident surface in the semiconductor substrate;
a charge accumulation section provided for each of the pixels on a side closer to a side opposite to the light incident surface than the photoelectric converter in the semiconductor substrate;
a wiring layer provided on a surface on the side opposite to the light incident surface of the semiconductor substrate;
a vertical electrode extending from the surface on the side opposite to the light incident surface of the semiconductor substrate to the photoelectric converter;
a first light-blocking film provided in a thickness direction of the semiconductor substrate on at least a portion of a periphery of the photoelectric converter; and
a second light-blocking film provided in a surface direction of the semiconductor substrate between the photoelectric converter and the charge accumulation section and including a first portion and a second portion that are continuously provided,
a level difference being provided between the first portion and the second portion.