Semiconductor device including silicon carbide body and method of manufacturing
A silicon carbide body includes a drift structure having a first conductivity type, a body region, and a shielding region. The body and shielding regions, of a second conductivity type, are located between the drift structure and a first surface of the silicon carbide body. First and second trench gate stripes extend into the silicon carbide body. The body region is in contact with a first sidewall of the first trench gate stripe. The shielding region is in contact with a second sidewall of the second trench gate stripe. The second sidewall has a first length in a lateral first direction parallel to the first surface. A supplementary region of the first conductivity type contacts one or more interface areas of the second sidewall. The one or more interface areas have a combined second length along the first direction, the second length being at most 40% of the first length.
1. A semiconductor device, comprising:
a silicon carbide body comprising a drift structure having a first conductivity type, a body region, and a shielding region, the body region and the shielding region having a second conductivity type and being located between the drift structure and a first surface of the silicon carbide body;
a first and a second trench gate stripe that extend into the silicon carbide body, the body region being in contact with a first sidewall of the first trench gate stripe and the shielding region being in contact with a second sidewall of the second trench gate stripe, the second sidewall having a first length in a first direction parallel to the first surface; and
a supplementary region of the first conductivity type in contact with one or more interface areas of the second sidewall, the one or more interface areas having a combined second length along the first direction, the second length being at most 30% of the first length.
2. The semiconductor device of claim 1 , wherein the silicon carbide body comprises an active region and a termination region surrounding the active region, and wherein the supplementary region is formed in the termination region and is absent in the active region.
3. The semiconductor device of claim 1 , further comprising:
a source region between the first surface and the body region,
wherein the supplementary region and the source region are structurally connected.
4. The semiconductor device of claim 3 , wherein a maximum dopant concentration in the supplementary region differs from a maximum dopant concentration in the source region.
5. The semiconductor device of claim 3 , wherein a maximum vertical extension of the supplementary region is greater than a maximum vertical extension of the source region.
6. The semiconductor device of claim 1 , wherein the semiconductor device comprises a plurality of interface areas, and wherein top portions of the shielding region laterally separate the plurality of interface areas along the first direction.
7. The semiconductor device of claim 1 , wherein the one or more interface areas directly adjoin the first surface.
8. The semiconductor device of claim 1 , wherein a surface portion of the shielding region separates the supplementary region and the first surface.
9. The semiconductor device of claim 1 , further comprising:
a contact portion extending from the first surface into the silicon carbide body,
wherein the contact portion is in contact with the supplementary region.
10. The semiconductor device of claim 1 , wherein a maximum dopant concentration in the shielding region is higher than a maximum dopant concentration in the body region.
11. A semiconductor device, comprising:
a silicon carbide body comprising a drift structure having a first conductivity type, a body region, and a shielding region, the body region and the shielding region having a second conductivity type and being located between the drift structure and a first surface of the silicon carbide body;
a first and a second trench gate stripe that extend into the silicon carbide body, the body region being in contact with a first sidewall of the first trench gate stripe and the shielding region being in contact with a second sidewall of the second trench gate stripe, the second sidewall having a first length in a first direction parallel to the first surface; and
a supplementary region of the first conductivity type in contact with one or more interface areas of the second sidewall,
wherein a surface portion of the shielding region separates the supplementary region and the first surface.
12. The semiconductor device of claim 11 , wherein the one or more interface areas have a combined second length along the first direction, and wherein the second length is at most 40% of the first length.
13. The semiconductor device of claim 11 , wherein the supplementary region extends along the second trench gate stripe in an active region of the silicon carbide body.
14. A semiconductor device, comprising:
a silicon carbide body comprising a drift structure having a first conductivity type, a body region, and a shielding region, the body region and the shielding region having a second conductivity type and being located between the drift structure and a first surface of the silicon carbide body;
a first and a second trench gate stripe extending into the silicon carbide body, the body region being in contact with a first sidewall of the first trench gate stripe and the shielding region being in contact with a second sidewall of the second trench gate stripe, the second sidewall having a first length in a first direction parallel to the first surface; and
a supplementary region of the first conductivity type in contact with one or more interface areas of the second sidewall; and
a contact portion extending from the first surface into the silicon carbide body and contacting the supplementary region,
wherein the one or more interface areas have a combined second length along the first direction,
wherein the second length is at most 30% of the first length.
15. The semiconductor device of claim 14 , wherein the supplementary region extends along the second trench gate stripe in an active region of the silicon carbide body.