IP Library › Granted Patent US 10,889,054
Granted Patent B2
US 10,889,054 · App. 15/823,336 · Granted Jan 12, 2021

Sacrificial pyrolysis method for additively manufactured ceramics

Inventors: Scott M. Biesboer (Santa Monica, CA); Jacob M. Hundley (Thousand Oaks, CA); Zak C. Eckel (Thousand Oaks, CA)
Assignee: HRL Laboratories, LLC
B29C64/135B29C64/124B29C64/245B33Y10/00B33Y30/00C08L1/02C08L23/06C08L23/12C08L33/08C08L55/02C08L67/04G03F7/0037G03F7/0384G03F7/70416B29C64/40C08L2207/062C08L2207/066
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Quick Facts
Patent No.
US 10,889,054
App. No.
15/823,336
Granted
Jan 12, 2021
Kind
B2
Abstract

A sacrificial substrate for use in stereolithography, having a first surface configured to be attached to a build platform, and a second surface of the sacrificial substrate configured to be attached to a photopolymer part. The sacrificial substrate physically separates the build platform and the photopolymer part, and serves as the deposition surface for the photopolymer part in place of the build platform. The sacrificial substrate may be separated from the build platform and then separated from the photopolymer part via pyrolysis, oxidation, or etching to thereby yield the free photopolymer part without subjecting the part to excess physical force or damage.

Claims (31)

1. A sacrificial substrate for utilization in stereolithography, the sacrificial substrate comprising a sacrificial substrate polymer, in which a first side of the sacrificial substrate is configured to be attached to a build platform, and a second side of the sacrificial substrate is configured to be attached to a preceramic photopolymer part,

wherein the sacrificial substrate polymer has a melting, pyrolysis, sublimation, combustion, or decomposition temperature lower than the lowest reaction temperature of the preceramic photopolymer part.

2. The sacrificial substrate of claim 1 , wherein the sacrificial substrate polymer comprises an acrylate, methacrylate, epoxy, thiol, or urethane photopolymer, or a mixture thereof; and

the sacrificial substrate is formed directly on the build platform.

3. The sacrificial substrate of claim 2 , wherein the build platform comprises a texturizing feature; and

a portion of the sacrificial substrate polymer is formed inside the texturizing feature.

4. The sacrificial substrate of claim 2 , wherein the sacrificial substrate polymer comprises a first functional group;

the preceramic photopolymer part comprises a second functional group; and

the first functional group and the second functional group form a bond.

5. The sacrificial substrate of claim 4 , wherein the first functional group and the second functional group are acrylates.

6. The sacrificial substrate of claim 4 , wherein the first functional group and the second functional group are thiols.

7. The sacrificial substrate of claim 1 , wherein the sacrificial substrate polymer comprises polylactic acid (PLA), polyethylene terephthalate (PET), biaxially oriented polyethylene terephthalate (BOPET), cellulose, polypropylene, high density or low density polyethylene (HDPE, LDPE), acrylonitrile butadiene styrene (ABS), or a mixture thereof.

8. The sacrificial substrate of claim 1 , wherein the sacrificial substrate comprises a texturizing feature on the second side of the sacrificial substrate to increase mechanical adhesion to the preceramic photopolymer part.

9. The sacrificial substrate of claim 1 , wherein the first side of the sacrificial substrate is attached to the build platform by an adhesive.

10. The sacrificial substrate of claim 1 , wherein the first side of the sacrificial substrate is attached to the build platform by a hook and loop attachment.

11. The sacrificial substrate of claim 1 , wherein the first side of the sacrificial substrate is attached to the build platform by a reversible mechanical fastener.

12. The sacrificial substrate of claim 1 , wherein the first side of the sacrificial substrate is attached to the build platform by a magnetic force.

13. The sacrificial substrate of claim 1 , wherein the first side of the sacrificial substrate is attached to the build platform by a pressure differential.

14. A stereolithography device, the stereolithography device comprising:

a reservoir for holding a photopolymer resin,

a build platform configured to move vertically with respect to the reservoir,

a light source, and

the sacrificial substrate of claim 1 attached to the build platform and positioned between the build platform and the light source.

15. A method of additively manufacturing a ceramic photopolymer part, the method comprising:

attaching the sacrificial substrate of claim 1 to a build platform;

forming the preceramic photopolymer part on the sacrificial substrate;

separating the sacrificial substrate from the build platform; and

converting the preceramic photopolymer part into the ceramic photopolymer part and removing the sacrificial substrate from the ceramic photopolymer part.

16. The method of claim 15 , wherein the attaching of the sacrificial substrate to the build platform comprises polymerizing a photopolymer resin directly on the build platform.

17. The method of claim 15 , wherein the removing of the sacrificial substrate from the preceramic photopolymer part comprises heating the sacrificial substrate and photopolymer part to the melting, pyrolysis, sublimation, combustion, or decomposition temperature of the sacrificial substrate polymer.

18. The method of claim 17 , wherein the heating of the sacrificial substrate and preceramic photopolymer part comprises heating to a temperature of about 200° C. to about 1000° C.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 27, 2017
From: BIESBOER, SCOTT M.; HUNDLEY, JACOB M.; ECKEL, ZAK C.
To: HRL LABORATORIES, LLC
Reel/Frame 044228/0734 →
Continuity (1)
Related Publication 20190160734A1 · May 30, 2019