IP Library › Granted Patent US 10,890,698
Granted Patent B2
US 10,890,698 · App. 16/154,789 · Granted Jan 12, 2021

Diffraction optical element, optical system, and imaging apparatus

Inventor: Mikio Kobayashi (Utsunomiya, JP)
Assignee: CANON KABUSHIKI KAISHA
G02B5/1871G02B5/1823
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Quick Facts
Patent No.
US 10,890,698
App. No.
16/154,789
Granted
Jan 12, 2021
Kind
B2
Abstract

A diffraction optical element includes a first diffraction grating having a first grating surface and a first grating wall surface, a second diffraction grating having a second grating surface and a second grating wall surface, and a thin film configured to contact the first grating wall surface and the second grating wall surface. The predetermined conditions are satisfied.

Claims (46)

1. A diffraction optical element comprising:

a first diffraction grating having a first grating surface and a first grating wall surface;

a second diffraction grating having a second grating surface and a second grating wall surface; and

a plurality of thin films configured to contact the first grating wall surface and the second grating wall surface,

wherein the following conditional expressions are satisfied:

n2<n1<nha,

−0.500<Pe/Pmax<0.700, and

0.013<Pma<0.035

where n1 and n2 are refractive indexes for a designed wavelength of the first diffraction grating and the second diffraction grating, nha is a refractive index for the designed wavelength of each of the plurality of thin films in an effective diameter, Pmax is a maximum value of a phase difference for the designed wavelength between the first diffraction grating and the plurality of thin films in the effective diameter, Pe is a phase difference for the designed wavelength between the first diffraction grating and an outermost thin film among the plurality of thin films in the effective diameter, and Pma is a phase difference for the designed wavelength between the first diffraction grating and a thin film other than the outermost thin film among the plurality of thin films in the effective diameter.

2. The diffraction optical element according to claim 1 , wherein the following conditional expression is satisfied:

0.013<Pcnt <0.035

where Pcnt is an average value of a phase difference for the designed wavelength between the thin film and the first diffraction grating in an annular zone ranging from 20% to 60% of the effective diameter.

3. The diffraction optical element according to claim 1 , wherein the following conditional expression is satisfied:

−0.015<Pe<0.018.

4. The diffraction optical element according to claim 1 , wherein the following conditional expression is satisfied:

−0.005<Pedg<0.021

where Pedg is an average value of a phase difference for the designed wavelength between the thin film and the first diffraction grating in an annular zone ranging from 80% to 100% of the effective diameter.

5. The diffraction optical element according to claim 1 , wherein the following conditional expression is satisfied:

0.000<de/dmax<0.700

where dmax is a maximum thickness of the thin film, and de is a thickness of the thin film with the effective diameter.

6. The diffraction optical element according to claim 1 , wherein the following conditional expression is satisfied:

−0.500<ΔNe/ΔNmax<0.700

where ΔNmax is a maximum difference between the refractive index of the thin film and the refractive index of the first diffraction grating, and ΔNe is a difference between the refractive index of the thin film with the effective diameter and the refractive index of the first diffraction grating.

7. An optical system comprising:

a diffraction optical element according to claim 1 ; and

a holder configured to hold the diffraction optical element.

8. The optical system according to claim 7 , wherein the following conditional expression is satisfied:

0.300<E0/Ld<2.000

where Ld is a distance from an optical surface closest to an object in the optical system to a diffraction surface of the diffractive optical element, and E0 is an effective diameter of the optical surface.

9. The optical system according to claim 7 , wherein a maximum effective diameter of the diffraction optical element with respect to a maximum image height light beam is smaller than a maximum effective diameter of the diffraction optical element with respect to an on-axis light beam.

10. The optical system according to claim 7 , further comprising a diaphragm disposed on an image side of the diffraction optical element.

11. An imaging apparatus comprising:

an optical system that includes a diffraction optical element according to claim 1 ; and

an image sensor configured to receive an image formed by the optical system.

12. The imaging apparatus according to claim 11 , wherein he following conditional expression is satisfied:

0.300<E0/Ld<2.000

where Ld is a distance from an optical surface closest to an object in the optical system to a diffraction surface of the diffractive optical element, and EO is an effective diameter of the optical surface.

13. A diffraction optical element comprising:

a first diffraction grating having a first grating surface and a first grating wall surface;

a second diffraction grating having a second grating surface and a second grating wall surface; and

a plurality of thin films configured to contact the first grating wall surface and the second grating wall surface,

wherein the following conditional expressions are satisfied:

n2<n1<nha,

−0.500<Pe/Pmax<0.700, and

−0.500<ΔNe/ΔNmax<0.700

where n1 and n2 are refractive indexes for a designed wavelength of the first diffraction grating and the second diffraction grating, nha is a refractive index for the designed wavelength of each of the plurality of thin films in an effective diameter, Pmax is a maximum value of a phase difference for the designed wavelength between the first diffraction grating and the plurality of thin films in the effective diameter, Pe is a phase difference for the designed wavelength between the first diffraction grating and an outermost thin film among the plurality of thin films in the effective diameter, ΔNmax is a maximum difference between the refractive indexes of the plurality of thin films and the refractive index of the first diffraction grating, and ΔNe is a difference between the refractive index of the first diffraction grating and the refractive index of the outermost thin film.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 10, 2019
From: KOBAYASHI, MIKIO
To: CANON KABUSHIKI KAISHA
Reel/Frame 048042/0488 →
Priority Claims (1)
JP 2017-198312 · Oct 12, 2017 · national
Continuity (1)
Related Publication 20190113663A1 · Apr 18, 2019
Cited By (3)
US 12,276,863 US 12,392,998 US 12,730,331