IP Library Granted Patent US 10,892,597
Granted Patent B2
US 10,892,597 · App. 16/316,602 · Granted Jan 12, 2021

Nitride semiconductor laser and nitride semiconductor laser device

Inventors: Hiroyuki Hagino (Osaka, JP); Osamu Imafuji (Osaka, JP); Shinichiro Nozaki (Osaka, JP)
Assignee: PANASONIC CORPORATION
H01S5/0281H01S5/0421H01S5/04254H01S5/22H01S5/2205H01S5/343H01S5/0224H01S5/02276H01S5/04257H01S5/34333
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Quick Facts
Patent No.
US 10,892,597
App. No.
16/316,602
Granted
Jan 12, 2021
Kind
B2
Abstract

A nitride semiconductor laser includes: a first nitride semiconductor layer; a light-emitting layer formed on the first nitride semiconductor layer and including a nitride semiconductor; a second nitride semiconductor layer formed on the light-emitting layer and having a ridge portion; an electrode component formed on the second nitride semiconductor layer, and which is wider than the ridge portion; and a dielectric layer formed on side surfaces of the ridge portion and including SiO 2 . A space is present between the electrode component and the dielectric layer, and the electrode component is prevented from being in contact with the dielectric layer by the space, and is in contact with the upper surface of the ridge portion.

Claims (18)

1. A nitride semiconductor laser, comprising:

a first nitride semiconductor layer;

a light-emitting layer on the first nitride semiconductor layer, the light-emitting layer including a nitride semiconductor;

a second nitride semiconductor layer on the light-emitting layer, the second nitride semiconductor layer having a flat portion and a ridge portion extending from the flat portion;

an electrode on the second nitride semiconductor layer, the electrode being wider than the ridge portion; and

a dielectric layer on side surfaces of the ridge portion, the dielectric layer including SiO 2 , wherein:

the electrode includes an ohmic electrode which is in contact with an upper surface of the ridge portion, and a pad electrode on the ohmic electrode,

the pad electrode is in contact with a top surface of the ohmic electrode and a part of the flat portion,

a space is present between the electrode and the dielectric layer, and

the pad electrode has an opening communicating with the space as seen from above.

2. The nitride semiconductor laser according to claim 1 , wherein

the ridge portion has a width of at least 10 μm and at most 50 μm.

3. A nitride semiconductor laser device, comprising:

the nitride semiconductor laser according to claim 1 ; and

a submount holding the nitride semiconductor laser.

4. The nitride semiconductor laser according to claim 1 , wherein:

the second nitride semiconductor layer includes a contact layer as a top layer of the ridge portion, and

the ohmic electrode is in contact with an upper surface of the contact layer which is the upper surface of the ridge portion.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 18, 2019
From: HAGINO, HIROYUKI; IMAFUJI, OSAMU; NOZAKI, SHINICHIRO
To: PANASONIC CORPORATION
Reel/Frame 048933/0638 →
Priority Claims (1)
JP 2016-139787 · Jul 14, 2016 · national
Continuity (1)
Related Publication 20190245322A1 · Aug 8, 2019
Cited By (1)
US 12,292,626