Optical filter
A bandpass filter may include a set of layers. The set of layers may include a first subset of layers. The first subset of layers may include hydrogenated germanium (Ge:H) with a first refractive index. The set of layers may include a second subset of layers. The second subset of layers may include a material with a second refractive index. The second refractive index may be less than the first refractive index.
1. An optical filter comprising:
an optical filtering coating portion,
the optical filtering coating portion including:
a first set of layers, and
a second set of layers,
the first set of layers including a hydrogenated germanium based material, and
the second set of layers including at least one of:
a silicon dioxide (SiO 2 ) material,
an aluminum oxide (Al 2 O 3 ) material,
a titanium dioxide (TiO 2 ) material,
a niobium pentoxide (Nb 2 O 5 ) material,
a tantalum pentoxide (Ta 2 O 5 ) material, or
a magnesium fluoride (MgF 2 ) material; and
a substrate.
2. The optical filter of claim 1 , wherein the hydrogenated germanium based material includes hydrogenated germanium or annealed hydrogenated germanium.
3. The optical filter of claim 1 ,
wherein the first set of layers is associated with a first refractive index,
wherein the second set of layers is associated with a second refractive index, and
wherein the second refractive index is different from the first refractive index.
4. The optical filter of claim 3 , wherein the second refractive index is less than the first refractive index.
5. The optical filter of claim 1 , wherein the first set of layers is associated with a refractive index that is greater than 2.0 over a spectral range.
6. The optical filter of claim 1 , wherein the first set of layers is associated with a refractive index that is approximately 4.2 at a wavelength of approximately 1550 nanometers (nm).
7. The optical filter of claim 1 , wherein the first set of layers is associated with an extinction coefficient of less than approximately 0.1.
8. The optical filter of claim 7 , wherein the first set of layers is associated with the extinction coefficient at approximately 1550 nanometers (nm).
9. The optical filter of claim 1 , wherein the second set of layers is associated with a refractive index of less than 3 over a spectral range.
10. The optical filter of claim 9 , wherein the spectral range is approximately 1100 nanometers (nm) to approximately 2000 nm.
11. An optical filter comprising:
a first set of layers including a hydrogenated germanium based material, and
a second set of layers including at least one of:
a silicon dioxide (SiO 2 ) material,
an aluminum oxide (Al 2 O 3 ) material,
a titanium dioxide (TiO 2 ) material,
a niobium pentoxide (Nb 2 O 5 ) material,
a tantalum pentoxide (Ta 2 O 5 ) material, or
a magnesium fluoride (MgF 2 ) material.
12. The optical filter of claim 11 ,
where the first set of layers are high refractive index layers (H) and the second set of layers are low refractive index layers (L), and
wherein the first set of layers and the second set of layers are arranged in one of:
an (H-L) m order,
an (H-L) m -H order,
an (L-H) m order, or
an L-(H-L) m order,
where m is a quantity of alternating H and L layers.
13. The optical filter of claim 11 ,
where the first set of layers are high refractive index layers (H) and the second set of layers are low refractive index layers (L), and
wherein the first set of layers and the second set of layers include approximately 20 layers of alternating H layers and L layers.
14. The optical filter of claim 11 , wherein a layer, of the first set of layers, is associated with a thickness of between approximately 5 nanometers (nm) and approximately 2000 nm.
15. The optical filter of claim 11 ,
wherein the first set of layers is associated with a first thickness, and
wherein the second set of layers is associated with a second thickness.
16. The optical filter of claim 11 ,
wherein the first set of layers includes a first subset of layers and a second subset of layers,
wherein the first subset of layers is associated with a first thickness, and
wherein the second subset of layers is associated with a second thickness.
17. The optical filter of claim 11 , wherein the first set of layers and the second set of layers are fabricated using a pulsed-magnetron based sputtering procedure.
18. The optical filter of claim 11 , wherein the optical filter is annealed.
19. The optical filter of claim 11 , wherein the second set of layers includes the silicon dioxide (SiO 2 ) material.
20. The optical filter of claim 11 ,
wherein the optical filter is associated with a thickness of approximately 5.6 μm, and
wherein the optical filter is associated with a bandpass centered at approximately 1550 nanometers (nm) for an angle of incidence of 0 degrees.