Coil electronic component and method of manufacturing the same
A coil electronic component includes a magnetic body that includes a substrate and a coil part. The coil part includes patterned insulating films disposed on a surface of the substrate and a plating layer formed between the patterned insulating films by plating and having a thickness greater than or equal to its width measured parallel to the surface of the substrate. The plating layer may be formed in a single plating operation, and may have a thickness of 200 μm or more.
1. A coil electronic component comprising:
a magnetic body,
wherein the magnetic body includes:
a substrate, and
a coil part including patterned insulating films disposed on a surface of the substrate, a base conductor layer disposed on the substrate between the patterned insulating films and contacting the patterned insulating films, and a plating layer disposed on the base conductor layer between the patterned insulating films to form a plurality of coil windings and having a thickness greater than or equal to its width measured parallel to the surface of the substrate, and an anisotropic plating layer disposed on the plating layer and having a planar surface facing the plating layer and a curved surface opposing the planar surface,
wherein the magnetic body further includes a cover insulating layer disposed on the insulating films, the plating layer, and the curved surface of the anisotropic plating layer opposing the planar surface, and
the cover insulating layer is formed of a material different from that of the insulating films.
2. The coil electronic component of claim 1 , wherein the plating layer is formed of a single plating layer.
3. The coil electronic component of claim 1 , wherein the plating layer has a thickness Tp of 200 μm or more measured orthogonally to a surface of the substrate having the coil part thereon, and a cross section of the plating layer has an aspect ratio Tp/Wp of 1.0 or more relative to the width Wp of the cross section.
4. The coil electronic component of claim 1 , wherein the insulating films have a width of 1 μm to 20 μm between adjacent windings of the plating layer of the coil part.
5. The coil electronic component of claim 1 , wherein the patterned insulating films and the plating layer extend to a same thickness measured from the surface of the substrate.
6. The coil electronic component of claim 1 , wherein the cover insulating layer is disposed on the insulating films and the anisotropic plating layer.
7. The coil electronic component of claim 6 , wherein the cover insulating layer extends between the anisotropic plating layer disposed on adjacent windings of the coil part.
8. The coil electronic component of claim 6 , wherein side surfaces of each of the plurality of coil windings of the plating layer including an innermost winding and an outermost winding are free of the anisotropic plating layer disposed on the upper surface thereof.
9. The coil electronic component of claim 6 , wherein a width of the anisotropic plating layer, on each respective coil winding of the plurality of coil windings including at least one of an innermost winding and an outermost winding, is no greater than a width of the plating layer in the respective winding.
10. The coil electronic component of claim 6 , wherein the plating layer has a rectangular cross-section, and the anisotropic plating layer is further disposed on only an upper surface of the plating layer among surfaces of the plating layer.
11. The coil electronic component of claim 1 , wherein the insulating film has a thickness measured from the surface of the substrate that is equal to or larger than a spacing between adjacent windings of the coil part.
12. The coil electronic component of claim 11 , wherein the insulating film has an aspect ratio Tp/Wi of 10 or more, wherein Tp is the thickness of the insulating film measured from the surface of the substrate and Wi is a width of the insulating film measured parallel to the surface of the substrate.
13. The coil electronic component of claim 12 , wherein the thickness Tp of the insulating film is 200 μm or more and the width Wi of the insulating film is of 1 μm to 20 μm.
14. The coil electronic component of claim 11 , wherein the plating layer has a thickness Tp of 200 μm or more in a single plating layer.
15. The coil electronic component of claim 11 , further comprising:
a conductive via penetrating through the substrate and electrically interconnecting plating layers formed on each of two opposing surfaces of the substrate.
16. The coil electronic component of claim 1 , wherein the patterned insulating films are disposed directly on the surface of the substrate, and the base conductor layer is disposed directly on the surface of the substrate between the patterned insulating films and contacts the patterned insulating films.
17. The coil electronic component of claim 1 , wherein a width of the anisotropic plating layer measured along its planar surface facing the plating layer is equal to widths of the base conductor layer and the plating layer measured parallel to the surface of the substrate.