IP Library › Granted Patent US 10,922,805
Granted Patent B2
US 10,922,805 · App. 16/283,841 · Granted Feb 16, 2021

Microneedle array imaging device, microneedle array imaging method, microneedle array inspection device, and microneedle array inspection method

Inventors: Takashi Murooka (Kanagawa, JP); Kazuo Onishi (Kanagawa, JP)
Assignee: FUJIFILM Corporation
G06T7/0002A61M37/00A61M37/0015G01N21/8806G01N21/95G01N21/958H04N5/2256A61M2037/0023A61M2037/0061G01N2021/8841
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Quick Facts
Patent No.
US 10,922,805
App. No.
16/283,841
Granted
Feb 16, 2021
Kind
B2
Abstract

Provided are a microneedle array imaging device, a microneedle array imaging method, a microneedle array inspection device, and a microneedle array inspection method which enable inspection of a microneedle array with high accuracy based on an obtained image. A microneedle array 1 is imaged from a side of a surface on which microneedles 2 are arranged by irradiating a surface on a side opposite to the surface on which the microneedles 2 are arranged with parallel light as illumination light. At this time, the surface is irradiated with the illumination light under conditions in which an incident angle α of light onto a bottom surface 2 a of the microneedle 2 is 90−θ° or greater and an incident angle β of light onto a side surface 2 b of the microneedle 2 is less than a critical angle γ. In this manner, a state in which almost no light is emitted from a tip portion of the microneedle 2 can be generated. As the result, an image in which only the tip portion of the microneedle 2 is dark and other portions, in other words, a base portion of the microneedle 2 and a portion of a sheet 3 are bright can be imaged.

Claims (44)

1. A microneedle array imaging device comprising:

a light source which irradiates a surface on a side opposite to a surface on which a plurality of microneedles whose inclination angle of a side surface with respect to a bottom surface is θ° are arranged on a sheet to form a microneedle array, with parallel light as illumination light; and

a camera which images the microneedle array from a side of the surface on which the microneedles are arranged,

wherein the illumination unit irradiates the surface with the illumination light under conditions in which an incident angle of light onto the bottom surface of the microneedle is 90-θ° or greater and an incident angle of light onto the side surface of the microneedle is less than a critical angle, wherein the critical angle is a smallest angle at which a total reflection occurs on the side surface of the microneedle and is between a direction of the incident angle of light and a normal line drawn on the side surface of the microneedle.

2. The microneedle array imaging device according to claim 1 ,

wherein the light source irradiates the surface with the illumination light under conditions in which an incident angle of light onto the bottom surface of the microneedle is 90-θ° or greater and an incident angle of light onto the side surface of the microneedle is less than 46°.

3. The microneedle array imaging device according to claim 1 ,

wherein the camera images the microneedle array under conditions in which a direction in which the microneedle array is imaged becomes parallel to a direction in which the surface is irradiated with the illumination light.

4. The microneedle array imaging device according to claim 1 ,

wherein the light source comprises:

a light source which emits parallel light from a side of the surface on which the microneedles are arranged toward the microneedle array; and

a reflection plate which reflects the light transmitted through the microneedle array and irradiates the surface on the side opposite to the surface on which the microneedles are arranged with the illumination light.

5. A microneedle array imaging device comprising:

a light source which irradiates a surface on a side opposite to a surface on which a plurality of microneedles whose inclination angle of a side surface with respect to a bottom surface is θ° are arranged on a sheet to form a microneedle array, with illumination light; and

a camera which images the microneedle array from a side of the surface on which the microneedles are arranged,

wherein, the illumination unit irradiates the surface with the illumination light under conditions in which the intensity of light incident on the bottom surface of the reference microneedle at an incident angle of less than 90-θ° is 1/10 or less of the entire intensity of the light incident on the bottom surface of the reference microneedle and the intensity of light incident on the side surface of the reference microneedle at an incident angle greater than or equal to a critical angle is 1/10 or less of the entire intensity of the light incident on the bottom surface of the reference microneedle, wherein the critical angle is a smallest angle at which a total reflection occurs on the side surface of the microneedle and is between a direction of the incident angle of light and a normal line drawn on the side surface of the microneedle.

6. The microneedle array imaging device according to claim 5 ,

wherein the light source irradiates the surface with diffused light as illumination light.

7. The microneedle array imaging device according to claim 6 ,

wherein the emission surface is disposed perpendicularly to the sheet.

8. The microneedle array imaging device according to claim 6 ,

wherein the camera images the microneedle array in a direction inclined with respect to the sheet.

9. The microneedle array imaging device according to claim 6 ,

wherein the light source comprises:

a light source which emits light from a side of the surface on which the microneedles are arranged toward the microneedle array; and

a diffusion reflection plate which diffuses and reflects the light transmitted through the microneedle array and irradiates the surface on the side opposite to the surface on which the microneedles are arranged with the illumination light.

10. A microneedle array inspection device comprising:

the microneedle array imaging device according to claim 1 ; and

a hardware processor configured to acquire an image captured by the camera, and analyzes the obtained image to inspect the microneedle array.

11. A microneedle array inspection device comprising:

the microneedle array imaging device according to claim 6 ; and

a hardware processor configured to acquire an image captured by the microneedle array imaging device, and analyzes the obtained image to inspect the microneedle array.

12. A microneedle array imaging method comprising:

irradiating a surface on a side opposite to a surface on which a plurality of microneedles whose inclination angle of a side surface with respect to a bottom surface is θ° are arranged on a sheet to form a microneedle array, with parallel light as illumination light; and

imaging the microneedle array from a side of the surface on which the microneedles are arranged,

wherein the surface is irradiated with the illumination light under conditions in which an incident angle of light onto the bottom surface of the microneedle is 90-θ° or greater and an incident angle of light onto the side surface of the microneedle is less than a critical angle, wherein the critical angle is a smallest angle at which a total reflection occurs on the side surface of the microneedle and is between a direction of the incident angle of light and a normal line drawn on the side surface of the microneedle.

13. A microneedle array imaging method comprising:

irradiating a surface on a side opposite to a surface on which a plurality of microneedles whose inclination angle of a side surface with respect to a bottom surface is θ° are arranged on a sheet to form a microneedle array, with illumination light; and

imaging the microneedle array from a side of the surface on which the microneedles are arranged,

wherein, the surface is irradiated with the illumination light under conditions in which the intensity of light incident on the bottom surface of the reference microneedle at an incident angle of less than 90-θ° is 1/10 or less of the entire intensity of the light incident on the bottom surface of the reference microneedle and the intensity of light incident on the side surface of the reference microneedle at an incident angle greater than or equal to a critical angle is 1/10 or less of the entire intensity of the light incident on the bottom surface of the reference microneedle, wherein the critical angle is a smallest angle at which a total reflection occurs on the side surface of the microneedle and is between a direction of the incident angle of light and a normal line drawn on the side surface of the microneedle.

14. A microneedle array inspection method comprising:

acquiring an image captured using the microneedle array imaging method according to claim 12 , and analyzing the obtained image to inspect the microneedle array.

15. A microneedle array inspection method comprising:

acquiring an image captured using the microneedle array imaging method according to claim 13 , and analyzing the obtained image to inspect the microneedle array.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 6, 2019
From: MUROOKA, TAKASHI; ONISHI, KAZUO
To: FUJIFILM CORPORATION
Reel/Frame 048511/0645 →
Priority Claims (1)
JP 2016-173484 · Sep 6, 2016 · national
Continuity (2)
Continuation PCTJP2017029528 · Aug 17, 2017
Related Publication 20190188844A1 · Jun 20, 2019