Plasma processing apparatus
A plasma processing apparatus for performing a plasma process on a workpiece inside a processing container by radiating microwaves from an antenna into the processing container through a top plate of the processing container to generate plasma, which includes: a pressing member having grooves formed in a surface facing the top plate, and configured to press the antenna against the top plate; and elastic members respectively disposed in the grooves and deformed while being sandwiched between the pressing member and the antenna, and configured to apply a pressing force to the antenna toward the processing container. The grooves and the elastic members are respectively provided in concentric annular regions each having a center coinciding with a predetermined axis perpendicular to the top plate, and the elastic members are disposed only in a portion of the annular regions.
1. A plasma processing apparatus for performing a plasma process on a workpiece inside a processing container by radiating microwaves from an antenna into the processing container through a top plate of the processing container to generate plasma, the apparatus comprising:
a pressing member having a plurality of grooves formed in a surface facing the top plate of the processing container, and configured to press the antenna against the top plate of the processing container; and
a plurality of elastic members respectively disposed in the plurality of grooves and deformed while being sandwiched between the pressing member and the antenna, the plurality of elastic members being configured to apply a pressing force to the antenna toward the processing container,
wherein the plurality of grooves and the plurality of elastic members are respectively provided in a plurality of concentric annular regions each having a center coinciding with a predetermined axis perpendicular to the top plate so as to have a circular arc shape or an annular shape around the predetermined axis, and
wherein the pressing member is divided into two semicircular members in a plan view, and
wherein each of the plurality of elastic members is disposed only in a portion of each of the plurality of annular regions except for fan-shaped regions including a center of each of the two semicircular members and an apex of each of the two semicircular members, to compensate for non-uniformity of plasma intensity at the ends of the two semicircular plate members, and wherein the center of each of the two semicircular plate members coincides with the center of the plurality of the concentric annular regions.
2. The apparatus of claim 1 , wherein each of the plurality of grooves is formed only in a portion of each of the plurality of annular regions except the fan-shaped region.
3. The apparatus of claim 1 , wherein each of the plurality of grooves is formed in the entirety of each of the plurality of annular regions.