Chemical and topological surface modification to enhance coating adhesion and compatibility

1. A process of coating a substrate containing silicon with an environmental barrier coating, comprising:

mechanical removal of material comprising at least one of creating divots in said surface, creating lines in said surface, wherein the divots and the lines are arranged in patterns;

altering a surface of said substrate, by modifying a texture of said surface through a physical addition of material wherein said texture modification results in a surface topology wherein said surface topology is created by embedding particles into said surface by directional deposition;

exposing said surface to a plasma; and

applying an environmental barrier layer to said surface of said substrate.

2. The process of claim 1 , wherein said substrate comprises a ceramic matrix composite material.

3. The process of claim 1 , wherein said altering step comprises a physical process.

4. The process of claim 1 , further comprising: at least one of altering a chemical structure of said surface and altering a chemical function of said surface.

5. The process of claim 1 , wherein the surface has organic contaminants, further comprising: removing the organic contaminants.

6. The process of claim 1 , wherein said substrate comprises at least one of a turbine vane and a turbine blade.

7. The process of claim 1 , further comprising:

applying a protective layer on said environmental barrier layer.

8. The process of claim 1 , further comprising:

utilizing a contact mask for isolating a predetermined area for adhesion of said environmental barrier coating.

9. The process of claim 1 , further comprising:

utilizing a contact mask for isolating a predetermined area for promoting chemical vapor infiltration growth during coating.

10. The process of claim 1 , wherein said surface topology comprises characteristics that enhance bonding.

11. The process of claim 10 , wherein said characteristics that enhance bonding are selected from the group consisting of a chemical uniformity, OH or Cr—Si group activity and a surface tortuosity, roughness and angularity.

12. The process of claim 11 , wherein said surface tortuosity comprises at least one of a roughness and angularity.

13. The process of claim 1 , wherein said surface topology is pre-determined in particular patterns.

14. The process of claim 1 , wherein said environmental barrier layer comprises an oxidant getter phase, said oxidant getter phase being selected from the group consisting of silicon oxycarbide and elemental silicon.

15. The process of claim 1 , wherein said environmental barrier layer comprises at least one of (rare earth) RE-monosilicates, disilicates and (alkaline earth) AE alumino silicates, silicates of Hafnium and zirconium, and oxides of Hafnium or zirconium.

16. The process of claim 1 , wherein said environmental barrier layer comprises an oxide matrix and an oxidant getter phase interspersed throughout the oxide matrix, the oxide matrix contains a self-healing phase that contains at least one of doped silicates, compatible metals/metal alloys, non-oxide glasses, silica, and glass/glass ceramics comprising BAS, BMAS, LAS, SAS.