Semiconductor structure and method for forming the same
A semiconductor structure is provided in the present invention, including a substrate having a device region and an alignment mark region defined thereon, a dielectric layer disposed on the substrate, a conductive via formed in the dielectric layer on the device region, a first trench formed in the dielectric layer on the alignment mark, a plurality of second trenches formed in the dielectric layer directly under the first trench and exposed from a bottom surface of the first trench, and a memory stacked structure disposed on the dielectric layer, directly covering a top surface of the conductive via and filling into the first trench and the second trench.
1. A semiconductor structure, comprising:
a substrate having a device region and an alignment mark region;
a dielectric layer disposed on the substrate;
a conductive via formed in the dielectric layer on the device region;
a first trench formed in the dielectric layer on the alignment mark region;
a plurality of second trenches formed in the dielectric layer under the first trench and exposed from a bottom surface of the first trench; and
a memory stack structure disposed on the dielectric layer, directly covering a top surface of the conductive via and filling into the first trench and the plurality of second trenches, wherein a plurality of layers of the memory stack structure are located in the plurality of second trenches only.
2. The semiconductor structure according to claim 1 , wherein the memory stack structure comprises a magnetoresistive random access memory (MRAM) structure comprising:
a bottom electrode layer;
a magnetic tunneling junction (MTJ) layer;
a cap layer; and
a top electrode layer.
3. The semiconductor structure according to claim 1 , wherein the second trenches form an alignment mark feature, wherein the memory stack structure is patterned by a patterning process aligned to the alignment mark feature.
4. The semiconductor structure according to claim 1 , wherein the dielectric layer is not penetrated by the first trench and the second trenches.
5. The semiconductor structure according to claim 1 , wherein the bottom surface of the first trench is lower than a bottom surface of the conductive via.
6. The semiconductor structure according to claim 1 , wherein the second trenches have a same dimension.
7. The semiconductor structure according to claim 1 , wherein some of the second trenches extend along a first direction and arranged in parallel along a second direction, the other second trenches extend along the first direction and arranged in parallel along the second direction, wherein the first direction and the second direction are different.
8. The semiconductor structure according to claim 1 , wherein the dielectric layer comprises a first dielectric layer and a second dielectric layer disposed on the first dielectric layer, wherein the first trench penetrates through the whole thickness of the second dielectric layer and an upper portion of the thickness of the first dielectric layer, the second trenches are formed completely in the first dielectric layer directly under the first trench.
9. The semiconductor structure according to claim 8 , further comprising an interconnecting structure formed in the first dielectric layer on the device region, wherein the conductive via is in the second dielectric layer vertically over the interconnecting structure and directly contacts the interconnecting structure.
10. The semiconductor structure according to claim 8 , wherein the first dielectric layer and the second dielectric layer comprise different dielectric materials.