Wavelength-variable laser
A distributed feedback (DFB) laser outputting a predetermined wavelength of laser light includes a quantum well active layer positioned between a p-type cladding layer and an n-type cladding layer in thickness direction. The DFB laser includes a separate confinement heterostructure layer positioned between the quantum well active layer and then-type cladding layer. The DFB laser includes an electric-field-distribution-control layer positioned between the separate confinement heterostructure layer and then-type cladding layer and configured by at least two semiconductor layers having band gap energy greater than band gap energy of a barrier layer constituting the quantum well active layer. The DFB laser has a function to select a specific wavelength by returning a specific wavelength in the wavelength-variable laser.
1. A distributed feedback (DFB) laser outputting a predetermined wavelength of laser light comprising:
a quantum well active layer positioned between a p-type cladding layer and an n-type cladding layer in thickness direction;
a separate confinement heterostructure layer positioned between the quantum well active layer and the n-type cladding layer; and
an electric-field-distribution-control layer positioned between the separate confinement heterostructure layer and the n-type cladding layer and configured by at least two semiconductor layers having a band gap energy greater than a band gap energy of a barrier layer constituting the quantum well active layer, wherein the DFB laser has a function to select a specific wavelength by returning a specific wavelength in the DFB laser.
2. The DFB laser according to claim 1 , further comprising a current constriction structure positioned at both sides of a width direction of the quantum well active layer, wherein the electric-field-distribution-control layer is formed to overlap with the current constriction structure in the thickness direction.
3. The DFB laser according to claim 1 , wherein the semiconductor layers constituting the electric-field-distribution-control layer are constituted by a first semiconductor layer made from semiconductor material having a band gap energy that is the same as the n-type cladding layer and a second semiconductor layer made from semiconductor material having a band gap energy greater than the barrier layer constituting the quantum well active layer.
4. The DFB laser according to claim 3 , wherein the first semiconductor layer is made from InP, and the second semiconductor layer is made from a III-V group compound semiconductor including an As atom and a P atom as composition.
5. The DFB laser according to claim 4 , wherein the second semiconductor layer is made from GaInAsP, and a sum of layer thicknesses of the second semiconductor layer constituting the electric-field-distribution-control layer is equal to or smaller than 1 μm.
6. The DFB laser according to claim 5 , wherein a band gap composition wavelength of the GaInAsP constituting the second semiconductor layer is equal to or greater than 1 μm.