IP Library › Granted Patent US 10,957,374
Granted Patent B2
US 10,957,374 · App. 16/878,882 · Granted Mar 23, 2021

Memory cells and arrays of memory cells

Inventor: Yasushi Matsubara (Kanagawa, JP)
Assignee: Micron Technology, Inc.
G11C11/221G11C11/2257G11C11/2259G11C11/2273G11C11/5657H01L27/11502H01L27/11514
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Quick Facts
Patent No.
US 10,957,374
App. No.
16/878,882
Granted
Mar 23, 2021
Kind
B2
Abstract

A memory cell comprises first, second, third, and fourth transistors individually comprising a transistor gate. First and second ferroelectric capacitors individually have one capacitor electrode elevationally between the transistor gates of the first, second, third, and fourth transistors. Other memory cells are disclosed, as are arrays of memory cells.

Claims (14)

1. A memory cell comprising:

first, second, third, and fourth transistors; and

first and second ferroelectric capacitors individually having one capacitor electrode at two elevationally-spaced levels, a ferroelectric capacitor insulator being between the one capacitor electrode and another capacitor electrode in one of the two elevationally-spaced levels and no ferroelectric capacitor insulator being between the one and the another capacitor electrodes in the other of the two elevationally-spaced levels.

2. The memory cell of claim 1 wherein the first, second, third, and fourth transistors individually comprise a transistor gate, one of the gates being elevationally between the two elevationally-spaced levels.

3. The memory cell of claim 2 wherein another one of the gates is not elevationally between the two elevationally-spaced levels.

4. The memory cell of claim 2 wherein multiple of the transistor gates are elevationally between the two elevationally-spaced levels.

5. The memory cell of claim 4 wherein two and only two of the transistor gates are elevationally between the two elevationally-spaced levels.

6. The memory cell of claim 1 wherein two of the first, second, third, and fourth transistors are shorting transistors that are directly electrically coupled to and between different ones of the respective one capacitor electrode and different ones of the respective another capacitor electrodes.

7. An array comprising the memory cell of claim 1 as one memory cell of a plurality of memory cells of like-construction relative one another, wherein the one capacitor electrode is the one capacitor electrode of, and that is common to, all of the ferroelectric capacitors of the plurality of the memory cells.

8. An array comprising the memory cell of claim 1 as one memory cell of a plurality of memory cells of like-construction relative one another, wherein,

the one capacitor electrodes of the first and second ferroelectric capacitors in individual of the memory cells are electrically isolated from one another; and

the another capacitor electrodes of the first and second ferroelectric capacitors in the individual memory cells are electrically isolated from one another.

9. The memory cell of claim 1 wherein the first, second, third, and fourth transistors individually are elevationally-extending to be vertical or within 10° of vertical.

10. The memory cell of claim 1 wherein the memory cell is 4T-2FC.

Continuity (3)
Division 16050141 · Jul 31, 2018
Provisional Application 62548799 · Aug 22, 2017
Related Publication 20200286539A1 · Sep 10, 2020