Chip on package structure and method
A system and method for packaging semiconductor device is provided. An embodiment comprises forming vias over a carrier wafer and attaching a first die over the carrier wafer and between a first two of the vias. A second die is attached over the carrier wafer and between a second two of the vias. The first die and the second die are encapsulated to form a first package, and at least one third die is connected to the first die or the second die. A second package is connected to the first package over the at least one third die.
1. A method of manufacturing a semiconductor device, the method comprising:
encapsulating a first semiconductor device, a second semiconductor device, and a via with an encapsulant;
planarizing the encapsulant to expose the first semiconductor device and the via; and
electrically connecting a third semiconductor device to the second semiconductor device through the first semiconductor device and a redistribution layer, the redistribution layer being located on an opposite side of the first semiconductor device than the third semiconductor device, wherein the first semiconductor device comprises through vias electrically connecting the third semiconductor device to the redistribution layer; and
electrically connecting a fourth semiconductor die located over the second semiconductor device, wherein the fourth semiconductor die comprises a memory with a data transfer rate less than the third semiconductor device.
2. The method of claim 1 , wherein the first semiconductor device is a 28 nm node device and the second semiconductor device is a 16 nm node device.
3. The method of claim 1 , wherein the third semiconductor device is a memory device.
4. The method of claim 3 , wherein the memory device has a data transfer rate of between about 0.2 Gb/s and about 3.2 Gb/s.
5. The method of claim 3 , wherein the memory device is a cache memory for the second semiconductor device.
6. The method of claim 1 , wherein the fourth semiconductor die has a bandwith of between about 6.4 GB/s and about 25.6 GB/s.
7. The method of claim 1 , wherein the third semiconductor device is a LPDDRn memory device.
8. The method of claim 1 , wherein the second semiconductor device has a hybrid configuration.
9. A method of manufacturing a semiconductor device, the method comprising:
forming at least one via over a substrate;
placing a first semiconductor device adjacent to the at least one via;
placing second semiconductor device adjacent to the first semiconductor device;
placing an encapsulant around the at leasst one via, the first semiconductor device, and the second semiconductor device;
exposing the at least one via and the first semiconductor device;
electrically connecting the at least one via, the first semiconductor device, and the second semiconductor device with a redistribution layer; and
physically attaching a third semiconductor device to the first semiconductor device, wherein the third semiconductor device is electrically connected to the redistribution layer through second vias, the second vias extending through the first semiconductor device.
10. The method of claim 9 , wherein the second semiconductor device has a first operating speed, the first semiconductor device has a second operating speed, and the first operating speed is larger than the second operating speed.
11. The method of claim 9 , wherein the third semiconductor device is an LPDDRn memory device.
12. The method of claim 9 , further comprising connecting a fourth semiconductor device to the at least one via.
13. The method of claim 12 , wherein the fourth semiconductor device is an LPDDR memory device.
14. The method of claim 13 , wherein the LPDDR memory device has a bandwidth of between about 6.4 GB/s and about 25.6 GB/s.
15. The method of claim 9 , further comprising:
connecting a fourth semiconductor device to the at least one via; and
connecting a fifth semiconductor device to the fourth semiconductor device and the at least one via.
16. The method of claim 15 , wherein both of the fourth semiconductor device and the fifth semiconductor device has a capacity larger than the third semiconductor device.
17. A method of manufacturing a semiconductor device, the method comprising:
forming an integrated fan out package, the integrated fan out package comprising a first semiconductor device, a second semiconductor device, and a via, the via having a first height at least as large as a second height of the first semiconductor device;
attaching a third semiconductor device to the integrated fan out package, wherein the third semiconductor device is onnected to the second semiconductor device by though vias located within the first semiconductor device; and
attaching a fourth semiconductor device to the integrated fan out package, the fourth semiconductor device having a first bandwidth, wherein the third semiconductor device has a second bandwidth greater than the first bandwidth.
18. The method of claim 17 , wherein the first semiconductor device has a hybrid configuration.
19. The method of claim 18 , wherein the hybrid configuration comprises an analog region and a digital region.
20. The method of claim 17 , wherein the second bandwidth is about 51.2 GB/s and the first bandwidth is between about 6.4 GB/s and about 25.6 GB/s.