Photodetector and light detection and ranging
A photodetector includes: a silicon layer of a first conductivity type; a first semiconductor layer that is provided in the silicon layer, of a first conductivity type, and having an impurity concentration higher than a carrier concentration of the silicon layer; a second semiconductor layer provided on the first semiconductor layer, of a second conductivity type, and forming a pn boundary with the first semiconductor layer; a third semiconductor layer provided in the silicon layer, of a first conductivity type, having an impurity concentration higher than that of the silicon layer, and separated from the first semiconductor layer; a first electrode connected to the silicon layer; and a second electrode connected to the second semiconductor layer.
1. A photodetector, comprising:
a silicon layer provided on a first main surface of a semiconductor substrate and of a first conductivity type;
a first semiconductor layer provided in the silicon layer, of a first conductivity type, and having an impurity concentration higher than an impurity concentration of the silicon layer;
a second semiconductor layer provided on the first semiconductor layer, of a second conductivity type, and forming a pn boundary with the first semiconductor layer;
a third semiconductor layer provided in the silicon layer, of a first conductivity type, having an impurity concentration higher than that of the silicon layer, and separated from the first semiconductor layer;
a first electrode provided under a second main surface of the semiconductor substrate, and electrically connected to the silicon layer; and
a second electrode provided above the second semiconductor layer, electrically connected to the second semiconductor layer, and not electrically connected to the third semiconductor layer,
wherein the silicon layer, the first semiconductor layer, the second semiconductor layer, the third semiconductor layer, the first electrode and the second electrode constitute a silicon photomultiplier (SiPM) element, and
the silicon photomultiplier (SiPM) element produces an electric field by the voltage applied between the first electrode and the second electrode.
2. The photodetector according to claim 1 , wherein the third semiconductor layer is located under the first semiconductor layer in a direction perpendicular to a boundary surface of the pn boundary.
3. The photodetector according to claim 2 , wherein a part of the third semiconductor layer overlaps with a part of the first semiconductor layer when viewed in a plan view in a direction perpendicular to the boundary surface of the pn boundary.
4. The photodetector according to claim 3 , wherein an effective region capable of capturing photons is generated and diffused under the third semiconductor layer by applying the voltage between the first electrode and the second electrode.
5. The photodetector according to claim 2 , wherein an effective region capable of capturing photons is generated and diffused under the third semiconductor layer by applying the voltage between the first electrode and the second electrode.
6. The photodetector according to claim 1 , wherein a part of the third semiconductor layer overlaps with a part of the first semiconductor layer in a direction perpendicular to a boundary surface of the pn boundary.
7. The photodetector according to claim 6 , wherein an effective region capable of capturing photons is generated and diffused under the third semiconductor layer by applying the voltage between the first electrode and the second electrode.
8. The photodetector according to claim 1 , wherein the third semiconductor layer surrounds the first semiconductor layer when viewed in a plan view in a direction perpendicular to the boundary surface of the pn boundary.
9. The photodetector according to claim 8 , wherein an effective region capable of capturing photons is generated and diffused under the third semiconductor layer by applying the voltage between the first electrode and the second electrode.
10. The photodetector according to claim 1 , wherein the impurity concentration of the third semiconductor layer is at least 10 times higher than the impurity concentration of the silicon layer.
11. The photodetector according to claim 10 , wherein an effective region capable of capturing photons is generated and diffused under the third semiconductor layer by applying the voltage between the first electrode and the second electrode.
12. A light detection and ranging device, in which a laser oscillator oscillates an infrared laser and a scanner scans the infrared laser and irradiates the photodetector with the scanned infrared laser, comprising:
the photodetector according to claim 1 .
13. The photodetector according to claim 1 , wherein an effective region capable of capturing photons is generated and diffused under the third semiconductor layer by applying the voltage between the first electrode and the second electrode.