Slurry distribution device for chemical mechanical polishing

1. An apparatus for chemical mechanical polishing, comprising:

a rotatable platen having a surface to support a polishing pad;

a motor to rotate the platen;

a carrier head to hold a substrate in contact with the polishing pad; and

a polishing liquid distribution system, the polishing liquid distribution system including

a dispenser positioned to deliver a polishing liquid at a dispensing position onto a polishing surface of the polishing pad such that when the motor rotates the platen the polishing liquid is carried on the polishing surface from the dispensing position in a direction of rotation of the platen across a first region to a second region below the carrier head, and

a first barrier comprising a first solid body positioned relative to the dispensing position in a direction opposite to the direction of rotation of the platen such that the first solid body is before the dispensing position and configured to block used polishing liquid from the second region below the carrier head from reaching the dispensing position when being carried by rotation of the platen.

2. The apparatus of claim 1 , wherein the first barrier is configured to contact the polishing surface in operation.

3. The apparatus of claim 1 , wherein the first barrier comprises a first wiper blade.

4. The apparatus of claim 1 , wherein a surface of a leading edge of the first solid body is oriented at an acute angle relative to the polishing surface.

5. The apparatus of claim 1 , wherein a surface of a leading edge of the first solid body is oriented at a right angle relative to the polishing surface.

6. The apparatus of claim 1 , comprising a first actuator configured to adjust a height of the first barrier relative to and/or a pressure of the first barrier on the polishing surface.

7. The apparatus of claim 1 , comprising a second barrier comprising a second solid body positioned after the dispenser and configured to spread fresh polishing liquid delivered by the dispenser to a portion of the polishing surface.

8. The apparatus of claim 7 , wherein the second barrier is configured to contact the polishing surface in operation.

9. The apparatus of claim 7 , wherein the second barrier comprises a second wiper blade.

10. The apparatus of claim 7 , wherein a surface of a leading edge of the second solid body is oriented at an acute angle relative to the polishing surface.

11. The apparatus of claim 7 , comprising a second actuator configured to adjust a height and/or a pressure of the second barrier on the polishing surface.

12. The apparatus of claim 7 , wherein the first barrier extends to an edge of the platen and the second barrier is spaced from the edge of the platen.

13. The apparatus of claim 7 , wherein the second barrier is positioned higher than or presses with lower pressure on the polishing pad than the first barrier.

14. The apparatus of claim 7 , comprising a first actuator configured to adjust a height of the first barrier relative to and/or a pressure of the first barrier on the polishing surface, and a second actuator configured to independently adjust a height of the second barrier relative to and/or a pressure of the second barrier on the polishing surface.

15. The apparatus of claim 7 , comprising an actuator configured to sweep the first barrier and/or the second barrier laterally across the polishing pad.

16. The apparatus of claim 1 , wherein the first solid body comprises an arcuate barrier.

17. The apparatus of claim 16 , wherein the arcuate barrier is curved about an axis perpendicular to the polishing surface.