IP Library › Granted Patent US 10,975,470
Granted Patent B2
US 10,975,470 · App. 16/242,852 · Granted Apr 13, 2021

Apparatus for detecting or monitoring for a chemical precursor in a high temperature environment

Inventors: John Shugrue (Phoenix, AZ); Carl White (Gilbert, AZ)
Assignee: ASM IP Holding B.V.
C23C16/45536C23C16/45544C23C16/505G01J3/443G01N21/68H01J37/3244H01J37/32972G01N21/15G01N2201/08H01J2237/24485H01J2237/24507
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Quick Facts
Patent No.
US 10,975,470
App. No.
16/242,852
Granted
Apr 13, 2021
Kind
B2
Abstract

An apparatus and method are disclosed for monitoring and/or detecting concentrations of a chemical precursor in a reaction chamber. The apparatus and method have an advantage of operating in a high temperature environment. An optical emissions spectrometer (OES) is coupled to a gas source, such as a solid source vessel, in order to monitor or detect an output of the chemical precursor to the reaction chamber. Alternatively, a small sample of precursor can be periodically monitored flowing into the OES and into a vacuum pump, thus bypassing the reaction chamber.

Claims (21)

1. A device configured for determining a concentration of a gas source comprising:

a solid source vessel, the solid source vessel comprising a solid precursor configured to be converted to a first gas precursor;

a gas line coupled to the solid source vessel, the gas line configured to move a first portion of the first gas precursor into a reaction chamber and move a second portion of the first gas precursor into a sampling port;

a RF source coupled to the sampling port, the RF source ionizing the first gas precursor;

an optical emissions spectrometer coupled to the RF source, the optical emissions spectrometer configured to obtain a light spectrum of the ionized first gas precursor; and

an exhaust pump coupled to the RF source and configured to exhaust the ionized first gas precursor;

wherein a concentration of the ionized first gas precursor is determined based on the light spectrum.

2. The device of claim 1 , further comprising a heater to heat a part of the gas line connected to the RF source.

3. The device of claim 1 , further comprising a plurality of valves to control a flow of the first gas precursor from the solid source vessel.

4. The device of claim 1 , wherein the RF source comprises at least one of: an inductively coupled plasma source; a capacitively coupled plasma source; a microwave source; or a hot filament gas ionizer.

5. The device of claim 1 , further comprising a flow restrictor disposed between the RF source and the exhaust pump.

6. The device of claim 1 , further comprising an optical fiber coupling the RF source to the optical emissions spectrometer.

7. The device of claim 6 , wherein the optical fiber comprises:

a light transmission section;

a purge gas channel;

an outer sheath;

a wide view fiber optic attached to the light transmission section; and

a purge nozzle attached to the outer sheath.

8. The device of claim 1 , further comprising a heated vacuum enclosure to hold at least the solid source vessel.

9. The device of claim 8 , further comprising a flow restrictor within the heated vacuum enclosure.

10. The device of claim 1 , further comprising an inert gas source configured to provide an inert carrier gas for the first gas precursor.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 31, 2019
From: SHUGRUE, JOHN KEVIN; WHITE, CARL LOUIS
To: ASM IP HOLDING B.V.
Reel/Frame 048203/0202 →
Continuity (2)
Provisional Application 62634793 · Feb 23, 2018
Related Publication 20190264324A1 · Aug 29, 2019