Antenna and plasma deposition apparatus

1. An antenna, comprising

a first waveguide configured to guide VHF radio frequency waves; and

a second waveguide configured to guide the VHF radio frequency waves supplied from the lint waveguide, the second waveguide having a pair of metal reflective plates therein facing each other across a longitudinal distance along the second waveguide,

wherein a tip end of the first waveguide is coupled to the second waveguide at a sideways point thereof between the metal reflective plates, and

wherein a distance between the metal reflective plates is λg/4+λg·n/2, λg being a wavelength of the VHF radio frequency waves in the second waveguide, and n being an integer greater than or equal to zero.

2. The antenna as claimed in claim 1 , wherein the second waveguide is configured such that the VHF radio frequency waves resonate between the metal reflective plates.

3. The antenna as claimed in claim 1 , wherein the first waveguide includes a feed rod, and the metal reflective plates and a tip end of the feed rod are a ring shape, and

wherein the second waveguide includes an inner conductor disposed therein, the inner conductor penetrating the metal reflective plates and the tip end of the feed rod.

4. The antenna as claimed in claim 1 , wherein either a dielectric material or void space, or both, are situated between the metal reflective plates.

5. The antenna as claimed in claim 4 , wherein a void space is provided immediately next to, and on an inner side of, one of the metal reflective plates, and the one of the metal reflective plates has a ring-shaped gap from a third metal reflective plate disposed radially inside the one of the metal reflective plates, a length of the ring-shaped gap in a radial direction being smaller than a distance between an inner conductor and an outer conductor of the second waveguide in the void space.

6. The antenna as claimed in claim 1 , wherein the second waveguide includes an is conductor, a middle conductor, and an outer conductor that are formed in a concentric shape, and

wherein the outer conductor and the middle conductor are configured to allow the VHF radio frequency waves supplied from the first waveguide to propagate therebetween, and the middle conductor and the inner conductor are configured to allow LF and/or HF radio frequency waves to propagate therebetween.

7. The antenna as claimed in claim 6 , wherein the inner conductor is a hollow structure configured to allow gas to flow therethrough.

8. The antenna as claimed in claim 1 , wherein the second waveguide includes a hollow inner conductor and an outer conductor that serve as a coaxial waveguide, and

wherein the VHF radio frequency waves supplied from the first waveguide propagate between the outer conductor and the hollow inner conductor, and the hollow inner conductor is configured to allow gas to flow therethrough.

9. The antenna as claimed in claim 1 , wherein the second waveguide includes an inner conductor, a middle conductor, and an outer conductor that are formed in a concentric shape, and

wherein the outer conductor and the middle conductor are configured to allow the VHF radio frequency waves supplied from the first waveguide to propagate therebetween, and wherein a source different from a source of the VHF radio frequency waves provides second VHF radio frequency waves, and the middle conductor and the inner conductor are configured to allow the second VHF radio frequency waves to propagate therebetween.

10. A plasma deposition apparatus, comprising:

an antenna configured to provide VHF radio frequency waves; and

a process chamber in which plasma is generated based on the VHF radio frequency waves to perform a deposition process,

wherein the antenna includes;

a first waveguide configured to guide the VHF radio frequency waves; and

a second waveguide configured to guide the VHF radio frequency waves supplied from the first waveguide, the second waveguide having a pair of metal reflective plates therein facing each other across a longitudinal distance along the second waveguide,

wherein a tip end of the first waveguide is coupled to the second waveguide at a sideways point thereof between the metal reflective plates, and

wherein a distance between the metal reflective plates is λg/4+λg·n/2, λg being a wavelength of the VHF radio frequency waves in the second waveguide, and n being an integer greater than or equal to zero.

11. The plasma deposition apparatus as claimed in claim 10 , further comprising a gas showerhead provided at a ceiling part of the process chamber, wherein the second waveguide is coupled to the gas showerhead.